CA932200A - Solid deformation imaging - Google Patents

Solid deformation imaging

Info

Publication number
CA932200A
CA932200A CA068323A CA68323A CA932200A CA 932200 A CA932200 A CA 932200A CA 068323 A CA068323 A CA 068323A CA 68323 A CA68323 A CA 68323A CA 932200 A CA932200 A CA 932200A
Authority
CA
Canada
Prior art keywords
solid deformation
deformation imaging
imaging
solid
deformation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA068323A
Other languages
English (en)
Inventor
B. Thompson William
W. Jones Rexford
P. Hayes Lester
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Primary Products Ingredients Americas LLC
Original Assignee
Tate and Lyle Ingredients Americas LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tate and Lyle Ingredients Americas LLC filed Critical Tate and Lyle Ingredients Americas LLC
Application granted granted Critical
Publication of CA932200A publication Critical patent/CA932200A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0502—Patterning and lithography
    • H05K2203/0525—Patterning by phototackifying or by photopatterning adhesive
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0562—Details of resist
    • H05K2203/0585—Second resist used as mask for selective stripping of first resist
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/13—Moulding and encapsulation; Deposition techniques; Protective layers
    • H05K2203/1333—Deposition techniques, e.g. coating
    • H05K2203/1355—Powder coating of insulating material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
CA068323A 1969-02-05 1969-11-25 Solid deformation imaging Expired CA932200A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US79684769A 1969-02-05 1969-02-05

Publications (1)

Publication Number Publication Date
CA932200A true CA932200A (en) 1973-08-21

Family

ID=25169217

Family Applications (1)

Application Number Title Priority Date Filing Date
CA068323A Expired CA932200A (en) 1969-02-05 1969-11-25 Solid deformation imaging

Country Status (12)

Country Link
US (1) US3637385A (en:Method)
JP (1) JPS4910699B1 (en:Method)
BE (1) BE738204A (en:Method)
BR (1) BR6911982D0 (en:Method)
CA (1) CA932200A (en:Method)
DE (1) DE1944311C3 (en:Method)
ES (1) ES371051A1 (en:Method)
FR (1) FR2030300A1 (en:Method)
GB (1) GB1296709A (en:Method)
IL (1) IL32856A0 (en:Method)
LU (1) LU59383A1 (en:Method)
NL (1) NL168954C (en:Method)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3928039A (en) * 1970-03-13 1975-12-23 Ciba Geigy Ag Method for modifying vesicular images
US3676145A (en) * 1970-09-21 1972-07-11 Staley Mfg Co A E Predetermined chemical reactions in photographic imagewise configuration
US3676146A (en) * 1970-09-21 1972-07-11 Staley Mfg Co A E Controlling predetermined chemical reactions in photographic image-wise configuration
US3718466A (en) * 1971-07-12 1973-02-27 Staley Mfg Co A E Magnetic development
US4234626A (en) * 1978-02-01 1980-11-18 E. I. Du Pont De Nemours And Company Producing printed circuits by conjoining metal powder images
US4292394A (en) * 1978-11-13 1981-09-29 E. I. Du Pont De Nemours And Company Process for preparing multicolor toned images on a single photosensitive layer
US4304843A (en) * 1978-11-22 1981-12-08 E. I. Du Pont De Nemours And Company Dry toner with improved toning uniformity
US4215193A (en) * 1978-11-22 1980-07-29 E. I. Du Pont De Nemours And Company Dry toner process with improved toning uniformity for color developing an imaged tacky and nontacky surface
EP0022188B1 (en) * 1979-06-18 1984-10-03 EASTMAN KODAK COMPANY (a New Jersey corporation) Co-initiator compositions for photopolymerization containing 3-acyl-substituted coumarins, photopolymerizable composition and photographic element
US4303698A (en) * 1980-02-25 1981-12-01 E. I. Du Pont De Nemours And Company Use of prolonged tack toners for the preparation of electric circuits
US4355055A (en) * 1980-02-25 1982-10-19 E. I. Du Pont De Nemours And Company Use of prolonged tack toners for the preparation of multilayer electric circuits
US4460427A (en) * 1981-09-21 1984-07-17 E. I. Dupont De Nemours And Company Process for the preparation of flexible circuits
US4411980A (en) * 1981-09-21 1983-10-25 E. I. Du Pont De Nemours And Company Process for the preparation of flexible circuits
US4894314A (en) * 1986-11-12 1990-01-16 Morton Thiokol, Inc. Photoinitiator composition containing bis ketocoumarin dialkylamino benzoate, camphorquinone and/or a triphenylimidazolyl dimer
DE3913117A1 (de) * 1989-04-21 1990-10-25 Du Pont Deutschland Verfahren zur herstellung von elektrisch leitfaehigen mustern
US5204210A (en) * 1990-12-07 1993-04-20 Xerox Corporation Method for the direct patterning of diamond films
EP0548413B1 (en) * 1991-12-24 1995-10-25 FENZI S.p.A. Vernici ED ACCESSORI VETRARI Anti-corrosive formulation for metal-coating of mirrors and similar and procedure for the production thereof
IT1254545B (it) * 1992-03-23 1995-09-25 Formulazione per la protezione alla corrosione di pellicole metalliche di specchi e simili e procedimento di produzione della stessa
ID19337A (id) * 1996-12-26 1998-07-02 Ajinomoto Kk Film perekat antar-pelapis untuk papan pembuat kabel cetakan berlapis-banyak dan papan kabel cetakan berlapis-banyak memakai film ini
WO2002024774A1 (fr) * 2000-09-20 2002-03-28 Taiyo Ink Manufacturing Co., Ltd. Resine photosensible carboxylee, composition photodurcissable/thermodurcissable pouvant etre developpee par une solution alcaline et contenant cette resine, et article durci produit a partir de ces elements

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2445948A (en) * 1944-12-04 1948-07-27 Gen Mills Inc Hydroxyphosphatides
US3178283A (en) * 1961-05-04 1965-04-13 Gen Aniline & Film Corp Production of photographic polymeric images by heat development

Also Published As

Publication number Publication date
ES371051A1 (es) 1972-05-01
IL32856A0 (en) 1969-11-12
DE1944311A1 (de) 1970-09-10
BR6911982D0 (pt) 1973-01-18
DE1944311B2 (de) 1975-03-06
NL168954B (nl) 1981-12-16
BE738204A (en:Method) 1970-03-02
US3637385A (en) 1972-01-25
FR2030300A1 (en:Method) 1970-11-13
NL6913291A (en:Method) 1970-08-07
JPS4910699B1 (en:Method) 1974-03-12
LU59383A1 (en:Method) 1970-01-09
GB1296709A (en:Method) 1972-11-15
DE1944311C3 (de) 1975-12-11
NL168954C (nl) 1982-05-17

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