CA903650A - Preferential etching of silicon - Google Patents

Preferential etching of silicon

Info

Publication number
CA903650A
CA903650A CA903650A CA903650DA CA903650A CA 903650 A CA903650 A CA 903650A CA 903650 A CA903650 A CA 903650A CA 903650D A CA903650D A CA 903650DA CA 903650 A CA903650 A CA 903650A
Authority
CA
Canada
Prior art keywords
silicon
preferential etching
preferential
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA903650A
Inventor
Lawrence John
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nortel Networks Technology Corp
Original Assignee
Bell Canada Northern Electric Research Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bell Canada Northern Electric Research Ltd filed Critical Bell Canada Northern Electric Research Ltd
Application granted granted Critical
Publication of CA903650A publication Critical patent/CA903650A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/30604Chemical etching
CA903650A 1971-10-26 1971-10-26 Preferential etching of silicon Expired CA903650A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CA126158 1971-10-26

Publications (1)

Publication Number Publication Date
CA903650A true CA903650A (en) 1972-06-27

Family

ID=4091292

Family Applications (1)

Application Number Title Priority Date Filing Date
CA903650A Expired CA903650A (en) 1971-10-26 1971-10-26 Preferential etching of silicon

Country Status (1)

Country Link
CA (1) CA903650A (en)

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