CA2978031A1 - Procede de production de lamines organiques-inorganiques flexibles - Google Patents
Procede de production de lamines organiques-inorganiques flexibles Download PDFInfo
- Publication number
- CA2978031A1 CA2978031A1 CA2978031A CA2978031A CA2978031A1 CA 2978031 A1 CA2978031 A1 CA 2978031A1 CA 2978031 A CA2978031 A CA 2978031A CA 2978031 A CA2978031 A CA 2978031A CA 2978031 A1 CA2978031 A1 CA 2978031A1
- Authority
- CA
- Canada
- Prior art keywords
- layer
- inorganic
- laminate
- barrier film
- organic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45527—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations
- C23C16/45529—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations specially adapted for making a layer stack of alternating different compositions or gradient compositions
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45555—Atomic layer deposition [ALD] applied in non-semiconductor technology
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/30—Organic light-emitting transistors
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Laminated Bodies (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
- Formation Of Insulating Films (AREA)
- Chemical Vapour Deposition (AREA)
- Thin Film Transistor (AREA)
Abstract
La présente invention concerne le domaine des procédés de production de laminés organiques-inorganiques. L'invention concerne, en particulier, un procédé de production d'un laminé comprenant au moins deux fois une séquence comportant : (a) le dépôt d'une couche inorganique par la réalisation de 3 à 150 cycles d'un procédé de dépôt de couches atomiques, et (b) le dépôt d'une couche organique comportant de l'azote par la réalisation de 1 à 3 cycles d'un procédé de dépôt de couches moléculaires.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP15160789 | 2015-03-25 | ||
EP15160789.2 | 2015-03-25 | ||
PCT/EP2016/055534 WO2016150759A1 (fr) | 2015-03-25 | 2016-03-15 | Procédé de production de laminés organiques-inorganiques flexibles |
Publications (1)
Publication Number | Publication Date |
---|---|
CA2978031A1 true CA2978031A1 (fr) | 2016-09-29 |
Family
ID=52779530
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA2978031A Abandoned CA2978031A1 (fr) | 2015-03-25 | 2016-03-15 | Procede de production de lamines organiques-inorganiques flexibles |
Country Status (12)
Country | Link |
---|---|
US (1) | US11286561B2 (fr) |
EP (1) | EP3274487A1 (fr) |
JP (1) | JP6986447B2 (fr) |
KR (1) | KR102596710B1 (fr) |
CN (1) | CN107429390A (fr) |
BR (1) | BR112017020245A2 (fr) |
CA (1) | CA2978031A1 (fr) |
MX (1) | MX2017012134A (fr) |
RU (1) | RU2721247C2 (fr) |
SG (1) | SG11201707265QA (fr) |
TW (1) | TWI782892B (fr) |
WO (1) | WO2016150759A1 (fr) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2016116245A1 (fr) | 2015-01-20 | 2016-07-28 | Basf Coatings Gmbh | Procédé de production de stratifiés organiques-inorganiques souples |
WO2020007900A1 (fr) * | 2018-07-05 | 2020-01-09 | Basf Coatings Gmbh | Film conducteur transparent |
WO2023018308A1 (fr) * | 2021-08-12 | 2023-02-16 | 한양대학교 산학협력단 | Résine photosensible à film moléculaire multicouche ayant une structure à lignes moléculaires et procédé de fabrication de celle-ci |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ES2113366T3 (es) * | 1990-10-03 | 1998-05-01 | Dow Chemical Co | Polieteraminas con funciones hidroxilo como capas de barrera para materiales sensibles al oxigeno. |
US6690044B1 (en) * | 1993-03-19 | 2004-02-10 | Micron Technology, Inc. | Approach to avoid buckling BPSG by using an intermediate barrier layer |
DE4438359C2 (de) * | 1994-10-27 | 2001-10-04 | Schott Glas | Behälter aus Kunststoff mit einer Sperrbeschichtung |
US6926572B2 (en) * | 2002-01-25 | 2005-08-09 | Electronics And Telecommunications Research Institute | Flat panel display device and method of forming passivation film in the flat panel display device |
JP2007090803A (ja) | 2005-09-30 | 2007-04-12 | Fujifilm Corp | ガスバリアフィルム、並びに、これを用いた画像表示素子および有機エレクトロルミネッセンス素子 |
US10092927B2 (en) | 2006-11-13 | 2018-10-09 | The Regents Of The University Of Colorado, A Body Corporate | Molecular layer deposition process for making organic or organic-inorganic polymers |
US9660205B2 (en) * | 2007-06-22 | 2017-05-23 | Regents Of The University Of Colorado | Protective coatings for organic electronic devices made using atomic layer deposition and molecular layer deposition techniques |
US20090169904A1 (en) * | 2007-12-27 | 2009-07-02 | Makoto Yamada | Barrier laminate, gas-barrier film, device and optical component |
JP2009224190A (ja) * | 2008-03-17 | 2009-10-01 | Fujifilm Corp | バリア性積層体とその製造方法、デバイスおよび光学部材 |
US20110171439A1 (en) * | 2008-07-08 | 2011-07-14 | Shahab Jahromi | Laminate and composite layer comprising a substrate and a coating, and a process and apparatus for preparation thereof |
EP2360293A1 (fr) | 2010-02-11 | 2011-08-24 | Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO | Procédé et appareil pour déposer des couches atomiques sur un substrat |
WO2013047365A1 (fr) * | 2011-09-26 | 2013-04-04 | 日本軽金属株式会社 | Corps lié de résine et d'aluminium et son procédé de fabrication |
WO2013062486A1 (fr) * | 2011-10-24 | 2013-05-02 | Tera-Barrier Films Pte Ltd | Empilement barrière d'encapsulation |
KR20140045716A (ko) * | 2012-10-09 | 2014-04-17 | 건국대학교 산학협력단 | 유무기 합금 필름의 제조방법 및 그로부터 제조된 유무기 합금 필름 |
WO2015030297A1 (fr) * | 2013-08-30 | 2015-03-05 | 한양대학교 산학협력단 | Couches minces organiques/inorganiques hybrides et leur procédé de fabrication |
SG11201609703QA (en) | 2014-06-12 | 2016-12-29 | Basf Coatings Gmbh | Process for producing flexible organic-inorganic laminates |
MX2016016452A (es) | 2014-06-13 | 2017-05-08 | Basf Coatings Gmbh | Proceso para producir laminados organicos-inorganicos. |
WO2016116245A1 (fr) | 2015-01-20 | 2016-07-28 | Basf Coatings Gmbh | Procédé de production de stratifiés organiques-inorganiques souples |
-
2016
- 2016-03-15 RU RU2017135503A patent/RU2721247C2/ru active
- 2016-03-15 BR BR112017020245-0A patent/BR112017020245A2/pt not_active Application Discontinuation
- 2016-03-15 US US15/559,497 patent/US11286561B2/en active Active
- 2016-03-15 SG SG11201707265QA patent/SG11201707265QA/en unknown
- 2016-03-15 CN CN201680017247.1A patent/CN107429390A/zh active Pending
- 2016-03-15 JP JP2017550183A patent/JP6986447B2/ja active Active
- 2016-03-15 EP EP16713752.0A patent/EP3274487A1/fr active Pending
- 2016-03-15 MX MX2017012134A patent/MX2017012134A/es unknown
- 2016-03-15 CA CA2978031A patent/CA2978031A1/fr not_active Abandoned
- 2016-03-15 KR KR1020177026460A patent/KR102596710B1/ko active IP Right Grant
- 2016-03-15 WO PCT/EP2016/055534 patent/WO2016150759A1/fr active Application Filing
- 2016-03-23 TW TW105108951A patent/TWI782892B/zh active
Also Published As
Publication number | Publication date |
---|---|
RU2017135503A (ru) | 2019-04-26 |
US20180119279A1 (en) | 2018-05-03 |
KR102596710B1 (ko) | 2023-11-01 |
RU2017135503A3 (fr) | 2019-09-05 |
SG11201707265QA (en) | 2017-10-30 |
JP6986447B2 (ja) | 2021-12-22 |
US11286561B2 (en) | 2022-03-29 |
EP3274487A1 (fr) | 2018-01-31 |
TWI782892B (zh) | 2022-11-11 |
TW201700789A (zh) | 2017-01-01 |
CN107429390A (zh) | 2017-12-01 |
WO2016150759A1 (fr) | 2016-09-29 |
JP2018513271A (ja) | 2018-05-24 |
KR20170130415A (ko) | 2017-11-28 |
BR112017020245A2 (pt) | 2018-06-05 |
RU2721247C2 (ru) | 2020-05-18 |
MX2017012134A (es) | 2018-02-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CA2950012C (fr) | Procede de production de stratifies organiques-inorganiques flexibles | |
CA2971016A1 (fr) | Procede de production de stratifies organiques-inorganiques souples | |
JP6654753B2 (ja) | 基板構造およびその調製方法 | |
CA2949398C (fr) | Procede de production de stratifies organiques-inorganiques | |
CA2978031A1 (fr) | Procede de production de lamines organiques-inorganiques flexibles | |
EP3048185A1 (fr) | Procédé de production de stratifiés organiques-inorganiques flexibles | |
EP3531462A1 (fr) | Film conducteur transparent | |
TWI814855B (zh) | 透明導電膜 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
EEER | Examination request |
Effective date: 20210311 |
|
EEER | Examination request |
Effective date: 20210311 |
|
FZDE | Discontinued |
Effective date: 20230524 |