CA2978031A1 - Procede de production de lamines organiques-inorganiques flexibles - Google Patents

Procede de production de lamines organiques-inorganiques flexibles Download PDF

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Publication number
CA2978031A1
CA2978031A1 CA2978031A CA2978031A CA2978031A1 CA 2978031 A1 CA2978031 A1 CA 2978031A1 CA 2978031 A CA2978031 A CA 2978031A CA 2978031 A CA2978031 A CA 2978031A CA 2978031 A1 CA2978031 A1 CA 2978031A1
Authority
CA
Canada
Prior art keywords
layer
inorganic
laminate
barrier film
organic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
CA2978031A
Other languages
English (en)
Inventor
Maraike Ahlf
Juergen Frank
Torben ADERMANN
Stephan KLOTZ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Coatings GmbH
Original Assignee
BASF Coatings GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BASF Coatings GmbH filed Critical BASF Coatings GmbH
Publication of CA2978031A1 publication Critical patent/CA2978031A1/fr
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45527—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations
    • C23C16/45529—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations specially adapted for making a layer stack of alternating different compositions or gradient compositions
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45555—Atomic layer deposition [ALD] applied in non-semiconductor technology
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/30—Organic light-emitting transistors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Laminated Bodies (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
  • Formation Of Insulating Films (AREA)
  • Chemical Vapour Deposition (AREA)
  • Thin Film Transistor (AREA)

Abstract

La présente invention concerne le domaine des procédés de production de laminés organiques-inorganiques. L'invention concerne, en particulier, un procédé de production d'un laminé comprenant au moins deux fois une séquence comportant : (a) le dépôt d'une couche inorganique par la réalisation de 3 à 150 cycles d'un procédé de dépôt de couches atomiques, et (b) le dépôt d'une couche organique comportant de l'azote par la réalisation de 1 à 3 cycles d'un procédé de dépôt de couches moléculaires.
CA2978031A 2015-03-25 2016-03-15 Procede de production de lamines organiques-inorganiques flexibles Abandoned CA2978031A1 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP15160789 2015-03-25
EP15160789.2 2015-03-25
PCT/EP2016/055534 WO2016150759A1 (fr) 2015-03-25 2016-03-15 Procédé de production de laminés organiques-inorganiques flexibles

Publications (1)

Publication Number Publication Date
CA2978031A1 true CA2978031A1 (fr) 2016-09-29

Family

ID=52779530

Family Applications (1)

Application Number Title Priority Date Filing Date
CA2978031A Abandoned CA2978031A1 (fr) 2015-03-25 2016-03-15 Procede de production de lamines organiques-inorganiques flexibles

Country Status (12)

Country Link
US (1) US11286561B2 (fr)
EP (1) EP3274487A1 (fr)
JP (1) JP6986447B2 (fr)
KR (1) KR102596710B1 (fr)
CN (1) CN107429390A (fr)
BR (1) BR112017020245A2 (fr)
CA (1) CA2978031A1 (fr)
MX (1) MX2017012134A (fr)
RU (1) RU2721247C2 (fr)
SG (1) SG11201707265QA (fr)
TW (1) TWI782892B (fr)
WO (1) WO2016150759A1 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016116245A1 (fr) 2015-01-20 2016-07-28 Basf Coatings Gmbh Procédé de production de stratifiés organiques-inorganiques souples
WO2020007900A1 (fr) * 2018-07-05 2020-01-09 Basf Coatings Gmbh Film conducteur transparent
WO2023018308A1 (fr) * 2021-08-12 2023-02-16 한양대학교 산학협력단 Résine photosensible à film moléculaire multicouche ayant une structure à lignes moléculaires et procédé de fabrication de celle-ci

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2113366T3 (es) * 1990-10-03 1998-05-01 Dow Chemical Co Polieteraminas con funciones hidroxilo como capas de barrera para materiales sensibles al oxigeno.
US6690044B1 (en) * 1993-03-19 2004-02-10 Micron Technology, Inc. Approach to avoid buckling BPSG by using an intermediate barrier layer
DE4438359C2 (de) * 1994-10-27 2001-10-04 Schott Glas Behälter aus Kunststoff mit einer Sperrbeschichtung
US6926572B2 (en) * 2002-01-25 2005-08-09 Electronics And Telecommunications Research Institute Flat panel display device and method of forming passivation film in the flat panel display device
JP2007090803A (ja) 2005-09-30 2007-04-12 Fujifilm Corp ガスバリアフィルム、並びに、これを用いた画像表示素子および有機エレクトロルミネッセンス素子
US10092927B2 (en) 2006-11-13 2018-10-09 The Regents Of The University Of Colorado, A Body Corporate Molecular layer deposition process for making organic or organic-inorganic polymers
US9660205B2 (en) * 2007-06-22 2017-05-23 Regents Of The University Of Colorado Protective coatings for organic electronic devices made using atomic layer deposition and molecular layer deposition techniques
US20090169904A1 (en) * 2007-12-27 2009-07-02 Makoto Yamada Barrier laminate, gas-barrier film, device and optical component
JP2009224190A (ja) * 2008-03-17 2009-10-01 Fujifilm Corp バリア性積層体とその製造方法、デバイスおよび光学部材
US20110171439A1 (en) * 2008-07-08 2011-07-14 Shahab Jahromi Laminate and composite layer comprising a substrate and a coating, and a process and apparatus for preparation thereof
EP2360293A1 (fr) 2010-02-11 2011-08-24 Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO Procédé et appareil pour déposer des couches atomiques sur un substrat
WO2013047365A1 (fr) * 2011-09-26 2013-04-04 日本軽金属株式会社 Corps lié de résine et d'aluminium et son procédé de fabrication
WO2013062486A1 (fr) * 2011-10-24 2013-05-02 Tera-Barrier Films Pte Ltd Empilement barrière d'encapsulation
KR20140045716A (ko) * 2012-10-09 2014-04-17 건국대학교 산학협력단 유무기 합금 필름의 제조방법 및 그로부터 제조된 유무기 합금 필름
WO2015030297A1 (fr) * 2013-08-30 2015-03-05 한양대학교 산학협력단 Couches minces organiques/inorganiques hybrides et leur procédé de fabrication
SG11201609703QA (en) 2014-06-12 2016-12-29 Basf Coatings Gmbh Process for producing flexible organic-inorganic laminates
MX2016016452A (es) 2014-06-13 2017-05-08 Basf Coatings Gmbh Proceso para producir laminados organicos-inorganicos.
WO2016116245A1 (fr) 2015-01-20 2016-07-28 Basf Coatings Gmbh Procédé de production de stratifiés organiques-inorganiques souples

Also Published As

Publication number Publication date
RU2017135503A (ru) 2019-04-26
US20180119279A1 (en) 2018-05-03
KR102596710B1 (ko) 2023-11-01
RU2017135503A3 (fr) 2019-09-05
SG11201707265QA (en) 2017-10-30
JP6986447B2 (ja) 2021-12-22
US11286561B2 (en) 2022-03-29
EP3274487A1 (fr) 2018-01-31
TWI782892B (zh) 2022-11-11
TW201700789A (zh) 2017-01-01
CN107429390A (zh) 2017-12-01
WO2016150759A1 (fr) 2016-09-29
JP2018513271A (ja) 2018-05-24
KR20170130415A (ko) 2017-11-28
BR112017020245A2 (pt) 2018-06-05
RU2721247C2 (ru) 2020-05-18
MX2017012134A (es) 2018-02-09

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Legal Events

Date Code Title Description
EEER Examination request

Effective date: 20210311

EEER Examination request

Effective date: 20210311

FZDE Discontinued

Effective date: 20230524