CA2834304C - Installation de traitement micro-onde d'une charge - Google Patents

Installation de traitement micro-onde d'une charge Download PDF

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Publication number
CA2834304C
CA2834304C CA2834304A CA2834304A CA2834304C CA 2834304 C CA2834304 C CA 2834304C CA 2834304 A CA2834304 A CA 2834304A CA 2834304 A CA2834304 A CA 2834304A CA 2834304 C CA2834304 C CA 2834304C
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CA
Canada
Prior art keywords
power
frequency
generator
application
application device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CA2834304A
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English (en)
French (fr)
Other versions
CA2834304A1 (fr
Inventor
Adrien Grandemenge
Jean-Marie Jacomino
Marilena Radoiu
Louis LATRASSE
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sairem Pour L'application Industrielle de la Recherche En Eleconique Et Micro Ondes Ste
Original Assignee
Sairem Pour L'application Industrielle de la Recherche En Eleconique Et Micro Ondes Ste
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sairem Pour L'application Industrielle de la Recherche En Eleconique Et Micro Ondes Ste filed Critical Sairem Pour L'application Industrielle de la Recherche En Eleconique Et Micro Ondes Ste
Publication of CA2834304A1 publication Critical patent/CA2834304A1/fr
Application granted granted Critical
Publication of CA2834304C publication Critical patent/CA2834304C/fr
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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00—Heating by electric, magnetic or electromagnetic fields
    • H05B6/64—Heating using microwaves
    • H05B6/6447—Method of operation or details of the microwave heating apparatus related to the use of detectors or sensors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32201—Generating means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/32229—Waveguides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32266—Means for controlling power transmitted to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32302—Plural frequencies
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32311—Circuits specially adapted for controlling the microwave discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H01J37/32678—Electron cyclotron resonance
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00—Heating by electric, magnetic or electromagnetic fields
    • H05B6/64—Heating using microwaves
    • H05B6/66—Circuits
    • H05B6/664—Aspects related to the power supply of the microwave heating apparatus
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00—Heating by electric, magnetic or electromagnetic fields
    • H05B6/64—Heating using microwaves
    • H05B6/74—Mode transformers or mode stirrers

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Power Engineering (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
  • Control Of High-Frequency Heating Circuits (AREA)
  • Radiation-Therapy Devices (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
CA2834304A 2011-04-27 2012-04-25 Installation de traitement micro-onde d'une charge Active CA2834304C (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR1153587A FR2974701B1 (fr) 2011-04-27 2011-04-27 Installation de production d'un plasma micro-onde
FR11/53587 2011-04-27
PCT/FR2012/050903 WO2012146870A1 (fr) 2011-04-27 2012-04-25 Installation de traitement micro-onde d'une charge

Publications (2)

Publication Number Publication Date
CA2834304A1 CA2834304A1 (fr) 2012-11-01
CA2834304C true CA2834304C (fr) 2019-12-03

Family

ID=46177448

Family Applications (1)

Application Number Title Priority Date Filing Date
CA2834304A Active CA2834304C (fr) 2011-04-27 2012-04-25 Installation de traitement micro-onde d'une charge

Country Status (11)

Country Link
US (1) US9860941B2 (e)
EP (1) EP2702604B1 (e)
JP (1) JP6162101B2 (e)
KR (1) KR101915646B1 (e)
CN (1) CN103608892B (e)
CA (1) CA2834304C (e)
ES (1) ES2626012T3 (e)
FR (1) FR2974701B1 (e)
IL (1) IL229076B (e)
SG (1) SG194647A1 (e)
WO (1) WO2012146870A1 (e)

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FR3035881B1 (fr) * 2015-05-04 2019-09-27 Sidel Participations Installation pour le traitement de recipients par plasma micro-ondes, comprenant un generateur a etat solide
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US10071521B2 (en) 2015-12-22 2018-09-11 Mks Instruments, Inc. Method and apparatus for processing dielectric materials using microwave energy
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US10707058B2 (en) 2017-04-11 2020-07-07 Applied Materials, Inc. Symmetric and irregular shaped plasmas using modular microwave sources
US11037764B2 (en) * 2017-05-06 2021-06-15 Applied Materials, Inc. Modular microwave source with local Lorentz force
CN107249247A (zh) * 2017-06-08 2017-10-13 宏基领先科技有限公司 过热氢交联反应的原子激发装置
WO2019055476A2 (en) 2017-09-14 2019-03-21 Cellencor, Inc. HIGH POWER SEMICONDUCTOR MICROWAVE GENERATOR FOR RADIO FREQUENCY ENERGY APPLICATIONS
US11749504B2 (en) * 2018-02-28 2023-09-05 Applied Materials, Inc. Methods and apparatus for common excitation of frequency generators
US10504699B2 (en) 2018-04-20 2019-12-10 Applied Materials, Inc. Phased array modular high-frequency source
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JP6850912B2 (ja) * 2019-03-06 2021-03-31 株式会社日立ハイテク プラズマ処理装置およびプラズマ処理方法、ｅｃｒ高さモニタ
US20220396880A1 (en) * 2019-10-31 2022-12-15 Indian Institute Of Science Microwave-assisted apparatus, system and method for deposition of films on substrates
CN112969248B (zh) * 2019-12-13 2022-12-16 青岛海尔电冰箱有限公司 用于加热装置的控制方法及加热装置
CN213783673U (zh) * 2020-03-18 2021-07-23 苏州迈微能等离子科技有限公司 微波功率源、微波等离子体装置
CN114521033A (zh) * 2020-11-20 2022-05-20 青岛海尔特种电冰箱有限公司 用于加热装置的控制方法及加热装置
TW202233887A (zh) * 2021-02-03 2022-09-01 美商Ｍｋｓ儀器公司 利用微波輻射能量對原子層沉積製程進行微波輔助表面化學退火的微波系統
CN113612012B (zh) * 2021-07-28 2023-09-29 中国科学院合肥物质科学研究院 一种可移动栅格式表面波离子回旋天线结构
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Also Published As

Publication number Publication date
KR101915646B1 (ko) 2018-11-06
FR2974701A1 (fr) 2012-11-02
KR20140038433A (ko) 2014-03-28
IL229076B (en) 2018-10-31
US20140197761A1 (en) 2014-07-17
FR2974701B1 (fr) 2014-03-21
EP2702604A1 (fr) 2014-03-05
SG194647A1 (en) 2013-12-30
EP2702604B1 (fr) 2017-02-22
CN103608892A (zh) 2014-02-26
ES2626012T3 (es) 2017-07-21
WO2012146870A1 (fr) 2012-11-01
CN103608892B (zh) 2018-02-06
CA2834304A1 (fr) 2012-11-01
JP6162101B2 (ja) 2017-07-12
IL229076A0 (en) 2013-12-31
US9860941B2 (en) 2018-01-02
JP2014515869A (ja) 2014-07-03

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Effective date: 20170315