CA2625161A1 - Photopolymerizable medium comprising siloxane compounds that support cationic polymerization for holographic storage - Google Patents
Photopolymerizable medium comprising siloxane compounds that support cationic polymerization for holographic storage Download PDFInfo
- Publication number
- CA2625161A1 CA2625161A1 CA002625161A CA2625161A CA2625161A1 CA 2625161 A1 CA2625161 A1 CA 2625161A1 CA 002625161 A CA002625161 A CA 002625161A CA 2625161 A CA2625161 A CA 2625161A CA 2625161 A1 CA2625161 A1 CA 2625161A1
- Authority
- CA
- Canada
- Prior art keywords
- optionally substituted
- group
- alkyl
- independently
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0834—Compounds having one or more O-Si linkage
- C07F7/0838—Compounds with one or more Si-O-Si sequences
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/21—Cyclic compounds having at least one ring containing silicon, but no carbon in the ring
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
- G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/004—Recording, reproducing or erasing methods; Read, write or erase circuits therefor
- G11B7/0065—Recording, reproducing or erasing by using optical interference patterns, e.g. holograms
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
- G11B7/245—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing a polymeric component
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
- G11B7/249—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing organometallic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H2001/026—Recording materials or recording processes
- G03H2001/0264—Organic recording material
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2260/00—Recording materials or recording processes
- G03H2260/12—Photopolymer
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
- G11B7/246—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing dyes
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Holo Graphy (AREA)
- Epoxy Resins (AREA)
- Silicon Polymers (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US72894105P | 2005-10-18 | 2005-10-18 | |
| US60/728,941 | 2005-10-18 | ||
| PCT/US2006/040887 WO2007047840A2 (en) | 2005-10-18 | 2006-10-18 | Photopolymerizable medium comprising siloxane compounds that support cationic polymerization for holographic storage |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA2625161A1 true CA2625161A1 (en) | 2007-04-26 |
Family
ID=37908087
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002625161A Abandoned CA2625161A1 (en) | 2005-10-18 | 2006-10-18 | Photopolymerizable medium comprising siloxane compounds that support cationic polymerization for holographic storage |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20070092804A1 (https=) |
| EP (1) | EP1937694A2 (https=) |
| JP (1) | JP2009511638A (https=) |
| KR (1) | KR20080063499A (https=) |
| CA (1) | CA2625161A1 (https=) |
| WO (1) | WO2007047840A2 (https=) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8233203B2 (en) * | 2006-02-15 | 2012-07-31 | Semiconductor Energy Laboratory Co., Ltd. | Exposure method and method of manufacturing semiconductor device |
| US8222364B2 (en) * | 2006-04-11 | 2012-07-17 | Dow Corning Corporation | Composition including a siloxane and a method of forming the same |
| US8053145B2 (en) * | 2006-05-30 | 2011-11-08 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing holographic recording medium and method for manufacturing semiconductor device |
| DE102009012665A1 (de) * | 2009-03-13 | 2010-09-16 | Momentive Performance Materials Gmbh | Neue Polyorganosiloxane und deren Verwendungen |
| WO2010107784A1 (en) | 2009-03-16 | 2010-09-23 | Stx Aprilis, Inc. | Methods for activation control of photopolymerization for holographic data storage using at least two wavelengths |
| US9874811B2 (en) | 2015-09-10 | 2018-01-23 | Samsung Electronics Co., Ltd. | Photopolymer composition for holographic recording |
| CN107163931B (zh) * | 2017-05-16 | 2020-05-08 | 北京科技大学 | 荧光共轭寡聚物二氧化硅复合纳米粒子在潜指纹显影中的应用方法 |
| CN107177355B (zh) * | 2017-05-16 | 2020-04-10 | 北京科技大学 | 超高荧光量子产率的共轭寡聚物与二氧化硅荧光复合纳米粒子的制备方法 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3899328A (en) * | 1973-05-07 | 1975-08-12 | Xerox Corp | Active matrix and intrinsic photoconductive polymer of a linear polysiloxane |
| JPS61256347A (ja) * | 1985-05-10 | 1986-11-13 | Hitachi Ltd | アルカリ可溶性シロキサン重合体 |
| JP2614453B2 (ja) * | 1987-07-23 | 1997-05-28 | 東レ・ダウコーニング・シリコーン株式会社 | オルガノポリシロキサン系ホットメルト接着剤 |
| JPH03236393A (ja) * | 1990-02-13 | 1991-10-22 | Sumitomo Durez Co Ltd | シリコーン変性フェノール化合物とその製法及びエポキシ誘導体 |
| JPH03275712A (ja) * | 1990-03-26 | 1991-12-06 | Toray Ind Inc | 熱硬化性樹脂組成物 |
| US5233007A (en) * | 1992-04-14 | 1993-08-03 | Allergan, Inc. | Polysiloxanes, methods of making same and high refractive index silicones made from same |
| JPH06256364A (ja) * | 1993-03-05 | 1994-09-13 | Nippon Kayaku Co Ltd | 有機ケイ素化合物、その製法及びそれを含有する樹脂組成物 |
| JP3094819B2 (ja) * | 1994-12-09 | 2000-10-03 | 信越化学工業株式会社 | ポジ型レジスト材料 |
| DE69616813T2 (de) * | 1995-10-06 | 2002-07-18 | Polaroid Corp., Cambridge | Halographisches aufzeichnungsmaterial und verfahren |
| US6489065B1 (en) * | 1996-05-17 | 2002-12-03 | Polaroid Corporation | Holographic medium and process for use thereof |
| US5739370A (en) * | 1997-04-02 | 1998-04-14 | General Electric Company | Process the production of octaphenylcyclotetrasiloxane |
| US20030157414A1 (en) * | 1997-11-13 | 2003-08-21 | Pradeep K. Dhal | Holographic medium and process for use thereof |
| US6512606B1 (en) * | 1999-07-29 | 2003-01-28 | Siros Technologies, Inc. | Optical storage media and method for optical data storage via local changes in reflectivity of a format grating |
| WO2001058856A1 (en) * | 2000-02-10 | 2001-08-16 | Imation Corp. | Non-linear optically active compounds |
| ATE328939T1 (de) * | 2000-08-28 | 2006-06-15 | Aprilis Inc | Holographisches speichermedium, das polyfunktionelle epoxidmonomere enthält, welche zur kationischen polymerisation fähig sind |
| JP2005017354A (ja) * | 2003-06-23 | 2005-01-20 | Fuji Photo Film Co Ltd | ホログラム記録材料用組成物、ホログラム記録材料及びホログラム記録方法。 |
-
2006
- 2006-10-18 JP JP2008536798A patent/JP2009511638A/ja active Pending
- 2006-10-18 EP EP06836396A patent/EP1937694A2/en not_active Withdrawn
- 2006-10-18 US US11/582,834 patent/US20070092804A1/en not_active Abandoned
- 2006-10-18 WO PCT/US2006/040887 patent/WO2007047840A2/en not_active Ceased
- 2006-10-18 KR KR1020087011086A patent/KR20080063499A/ko not_active Withdrawn
- 2006-10-18 CA CA002625161A patent/CA2625161A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| KR20080063499A (ko) | 2008-07-04 |
| JP2009511638A (ja) | 2009-03-19 |
| US20070092804A1 (en) | 2007-04-26 |
| WO2007047840A2 (en) | 2007-04-26 |
| WO2007047840A3 (en) | 2007-08-09 |
| EP1937694A2 (en) | 2008-07-02 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FZDE | Discontinued |