CA2384608C - Electron beam apparatus having a low loss beam path - Google Patents
Electron beam apparatus having a low loss beam path Download PDFInfo
- Publication number
- CA2384608C CA2384608C CA002384608A CA2384608A CA2384608C CA 2384608 C CA2384608 C CA 2384608C CA 002384608 A CA002384608 A CA 002384608A CA 2384608 A CA2384608 A CA 2384608A CA 2384608 C CA2384608 C CA 2384608C
- Authority
- CA
- Canada
- Prior art keywords
- electron beam
- window
- dose
- polyimide
- gap
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000010894 electron beam technology Methods 0.000 title claims abstract description 197
- 239000000758 substrate Substances 0.000 claims abstract description 75
- 230000005855 radiation Effects 0.000 claims abstract description 34
- 238000000034 method Methods 0.000 claims abstract description 24
- 230000001678 irradiating effect Effects 0.000 claims abstract description 10
- 239000000463 material Substances 0.000 claims description 157
- 238000000576 coating method Methods 0.000 claims description 69
- 239000011248 coating agent Substances 0.000 claims description 60
- 239000010410 layer Substances 0.000 claims description 48
- 230000001070 adhesive effect Effects 0.000 claims description 34
- 239000000853 adhesive Substances 0.000 claims description 31
- 239000011247 coating layer Substances 0.000 claims description 17
- 239000011241 protective layer Substances 0.000 claims description 13
- 229910052751 metal Inorganic materials 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 9
- 239000004820 Pressure-sensitive adhesive Substances 0.000 claims description 8
- 125000006850 spacer group Chemical group 0.000 claims description 8
- 230000000593 degrading effect Effects 0.000 claims description 5
- 230000015556 catabolic process Effects 0.000 abstract description 33
- 238000006731 degradation reaction Methods 0.000 abstract description 33
- 238000012986 modification Methods 0.000 abstract description 10
- 230000004048 modification Effects 0.000 abstract description 10
- 239000008199 coating composition Substances 0.000 abstract 1
- 229920001721 polyimide Polymers 0.000 description 168
- 239000004642 Polyimide Substances 0.000 description 163
- 239000010936 titanium Substances 0.000 description 57
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 43
- 229910052719 titanium Inorganic materials 0.000 description 43
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 27
- 238000012360 testing method Methods 0.000 description 26
- 238000010521 absorption reaction Methods 0.000 description 19
- 239000012790 adhesive layer Substances 0.000 description 15
- 229910052782 aluminium Inorganic materials 0.000 description 14
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 14
- 229910052757 nitrogen Inorganic materials 0.000 description 13
- 239000011253 protective coating Substances 0.000 description 11
- 230000035515 penetration Effects 0.000 description 10
- 150000003254 radicals Chemical class 0.000 description 9
- 239000002390 adhesive tape Substances 0.000 description 8
- 238000004364 calculation method Methods 0.000 description 8
- 238000010276 construction Methods 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- 239000012298 atmosphere Substances 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 230000007423 decrease Effects 0.000 description 6
- 230000003247 decreasing effect Effects 0.000 description 6
- 229920000642 polymer Polymers 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 229910052582 BN Inorganic materials 0.000 description 5
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 5
- 238000004132 cross linking Methods 0.000 description 5
- 230000000873 masking effect Effects 0.000 description 5
- 230000003647 oxidation Effects 0.000 description 5
- 238000007254 oxidation reaction Methods 0.000 description 5
- -1 Polyethylene Polymers 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 238000004980 dosimetry Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 230000009467 reduction Effects 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000011888 foil Substances 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 238000004088 simulation Methods 0.000 description 3
- 239000012855 volatile organic compound Substances 0.000 description 3
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 2
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 2
- 238000000342 Monte Carlo simulation Methods 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 229910052790 beryllium Inorganic materials 0.000 description 2
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 230000002596 correlated effect Effects 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 150000003949 imides Chemical class 0.000 description 2
- 229920001778 nylon Polymers 0.000 description 2
- 238000006068 polycondensation reaction Methods 0.000 description 2
- 229920006254 polymer film Polymers 0.000 description 2
- 230000000379 polymerizing effect Effects 0.000 description 2
- 230000002829 reductive effect Effects 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 238000012935 Averaging Methods 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 241000282376 Panthera tigris Species 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 238000002835 absorbance Methods 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 125000000746 allylic group Chemical group 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 150000008430 aromatic amides Chemical class 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 230000004941 influx Effects 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 239000000976 ink Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000002829 nitrogen Chemical class 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical compound FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J33/00—Discharge tubes with provision for emergence of electrons or ions from the vessel; Lenard tubes
- H01J33/02—Details
- H01J33/04—Windows
Landscapes
- Treatments Of Macromolecular Shaped Articles (AREA)
- Laminated Bodies (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Apparatus For Disinfection Or Sterilisation (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US38673599A | 1999-08-31 | 1999-08-31 | |
| US09/386,735 | 1999-08-31 | ||
| PCT/US2000/020905 WO2001016991A1 (en) | 1999-08-31 | 2000-08-01 | Electron beam apparatus having a low loss beam path |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CA2384608A1 CA2384608A1 (en) | 2001-03-08 |
| CA2384608C true CA2384608C (en) | 2009-05-19 |
Family
ID=23526836
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002384608A Expired - Fee Related CA2384608C (en) | 1999-08-31 | 2000-08-01 | Electron beam apparatus having a low loss beam path |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6749903B2 (enExample) |
| EP (1) | EP1208581A1 (enExample) |
| JP (1) | JP4851037B2 (enExample) |
| AU (1) | AU6892000A (enExample) |
| CA (1) | CA2384608C (enExample) |
| WO (1) | WO2001016991A1 (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SE526700C2 (sv) * | 2003-06-19 | 2005-10-25 | Tetra Laval Holdings & Finance | Anordning och förfarande för sterilisering av en materialbana med elektronbestrålning |
| EP1670017A1 (en) * | 2004-12-03 | 2006-06-14 | Mbda Uk Limited | Electron beam window, window assembly, and electron gun |
| US8300905B2 (en) * | 2005-11-18 | 2012-10-30 | General Electric Company | Adaptive image processing and display for digital and computed radiography images |
| WO2009086347A1 (en) * | 2007-12-27 | 2009-07-09 | 3M Innovative Properties Company | Method for making a functionalized membrane |
| SE0802101A2 (sv) * | 2008-10-07 | 2010-07-20 | Tetra Laval Holdings & Finance | Omkopplingsbar anordning för elektronstrålesterilisering |
| US9299465B1 (en) | 2014-09-30 | 2016-03-29 | Pct Engineered Systems, Llc | Electron beam system |
| JP2018529094A (ja) * | 2015-08-26 | 2018-10-04 | エナジー サイエンシーズ，インコーポレイティド | 調節可能な空隙を有する電子線装置 |
| US10991540B2 (en) * | 2018-07-06 | 2021-04-27 | Moxtek, Inc. | Liquid crystal polymer for mounting x-ray window |
| JP2023547755A (ja) * | 2020-10-21 | 2023-11-14 | テトラ ラバル ホールディングス アンド ファイナンス エス エイ | 電子ビームエミッタ用電子射出窓箔 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB301719A (en) * | 1928-02-29 | 1928-12-06 | Hermann Plauson | Improvements in cathode ray tubes |
| DE529237C (de) * | 1928-04-01 | 1931-07-10 | Strahlungschemie G M B H Ges | Strahlenaustrittsfenster fuer Kathoden- oder Roentgenstrahlenroehren |
| US3418155A (en) * | 1965-09-30 | 1968-12-24 | Ford Motor Co | Electron discharge control |
| US3916204A (en) * | 1974-05-03 | 1975-10-28 | Western Electric Co | Irradiating elongated material |
| US4140129A (en) | 1977-04-13 | 1979-02-20 | Applied Radiation Corporation | Beam defining system in an electron accelerator |
| US4193043A (en) | 1977-09-12 | 1980-03-11 | The United States Of America As Represented By The United States Department Of Energy | Microwave accelerator E-beam pumped laser |
| US4246297A (en) | 1978-09-06 | 1981-01-20 | Energy Sciences Inc. | Process and apparatus for the curing of coatings on sensitive substrates by electron irradiation |
| US4362965A (en) * | 1980-12-29 | 1982-12-07 | The United States Of America As Represented By The Secretary Of The Army | Composite/laminated window for electron-beam guns |
| US4631444A (en) | 1982-09-29 | 1986-12-23 | Tetra Pak Developpement Sa | Readily attachable and detachable electron-beam permeable window assembly |
| US4494036A (en) | 1982-11-22 | 1985-01-15 | Hewlett-Packard Company | Electron beam window |
| JPS60231323A (ja) * | 1984-04-27 | 1985-11-16 | Mitsubishi Electric Corp | 電子ビ−ム描画装置 |
| JPH0252200A (ja) * | 1988-08-15 | 1990-02-21 | Nippon Steel Corp | 成型炭の製造方法 |
| JPH0252200U (enExample) * | 1988-10-05 | 1990-04-13 | ||
| US5266400A (en) * | 1990-04-20 | 1993-11-30 | Minnesota Mining And Manufacturing Company | Low voltage electron beam radiation cured elastomer-based pressure sensitive adhesive tape |
| AU637208B2 (en) * | 1990-04-20 | 1993-05-20 | Minnesota Mining And Manufacturing Company | Low voltage electron beam radiation cured elastomer-based pressure sensitive adhesive tape |
| US5416440A (en) * | 1990-08-17 | 1995-05-16 | Raychem Corporation | Transmission window for particle accelerator |
| US5147711A (en) * | 1990-10-10 | 1992-09-15 | The United States Of America As Represented By The United States Department Of Energy | Vacuum barrier for excimer lasers |
-
2000
- 2000-08-01 CA CA002384608A patent/CA2384608C/en not_active Expired - Fee Related
- 2000-08-01 JP JP2001520444A patent/JP4851037B2/ja not_active Expired - Fee Related
- 2000-08-01 WO PCT/US2000/020905 patent/WO2001016991A1/en not_active Ceased
- 2000-08-01 EP EP00957276A patent/EP1208581A1/en not_active Withdrawn
- 2000-08-01 AU AU68920/00A patent/AU6892000A/en not_active Abandoned
-
2002
- 2002-09-17 US US10/245,208 patent/US6749903B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| AU6892000A (en) | 2001-03-26 |
| CA2384608A1 (en) | 2001-03-08 |
| US6749903B2 (en) | 2004-06-15 |
| JP2003508760A (ja) | 2003-03-04 |
| JP4851037B2 (ja) | 2012-01-11 |
| WO2001016991A1 (en) | 2001-03-08 |
| US20030094582A1 (en) | 2003-05-22 |
| EP1208581A1 (en) | 2002-05-29 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EEER | Examination request | ||
| MKLA | Lapsed |
Effective date: 20190801 |