CA2354784A1 - Systeme d'imagerie photosensible a support unique - Google Patents

Systeme d'imagerie photosensible a support unique Download PDF

Info

Publication number
CA2354784A1
CA2354784A1 CA002354784A CA2354784A CA2354784A1 CA 2354784 A1 CA2354784 A1 CA 2354784A1 CA 002354784 A CA002354784 A CA 002354784A CA 2354784 A CA2354784 A CA 2354784A CA 2354784 A1 CA2354784 A1 CA 2354784A1
Authority
CA
Canada
Prior art keywords
photosensitive material
protective coating
photosensitive
alkyl
water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
CA002354784A
Other languages
English (en)
Inventor
Tetsuya Higuchi
Takahiro Uchibori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
CYCOLOR SYSTEM CO., LTD.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2000277266A external-priority patent/JP2002055445A/ja
Application filed by CYCOLOR SYSTEM CO., LTD. filed Critical CYCOLOR SYSTEM CO., LTD.
Publication of CA2354784A1 publication Critical patent/CA2354784A1/fr
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/002—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
CA002354784A 2000-08-10 2001-08-07 Systeme d'imagerie photosensible a support unique Abandoned CA2354784A1 (fr)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2000-277266 2000-08-10
JP2000277266A JP2002055445A (ja) 2000-08-10 2000-08-10 自己発色型感光性感圧記録材料及びその製造方法並びにその画像形成方法
US09/761,014 2001-01-16
US09/761,014 US6635399B2 (en) 2000-08-10 2001-01-16 One base photosensitive imaging system

Publications (1)

Publication Number Publication Date
CA2354784A1 true CA2354784A1 (fr) 2002-02-10

Family

ID=26599804

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002354784A Abandoned CA2354784A1 (fr) 2000-08-10 2001-08-07 Systeme d'imagerie photosensible a support unique

Country Status (5)

Country Link
CN (1) CN1355445A (fr)
CA (1) CA2354784A1 (fr)
DE (1) DE10138440A1 (fr)
GB (1) GB2365985B (fr)
HK (1) HK1046169B (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024116077A1 (fr) * 2022-12-02 2024-06-06 Polaroid Ip B.V. Réduction de diaphonie d'un système d'imagerie à microcapsules

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6964836B2 (en) * 2002-03-15 2005-11-15 Eastman Kodak Company Photosensitive microcapsules containing a synthetic viscosity modifier in the continuous phase
US6899996B2 (en) * 2003-05-20 2005-05-31 Eastman Kodak Company Method of preparing imaging member with microgel protective layer
US6838226B2 (en) * 2003-05-20 2005-01-04 Eastman Kodak Company Imaging member with microgel protective layer
CN102004391A (zh) * 2010-10-25 2011-04-06 中国乐凯胶片集团公司 一种双面成像用涂塑纸基

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4766050A (en) * 1987-03-27 1988-08-23 The Mead Corporation Imaging system with integral cover sheet
JPH01176583A (ja) * 1988-01-06 1989-07-12 Fuji Photo Film Co Ltd 感熱記録材料
ATE205307T1 (de) * 1994-06-10 2001-09-15 Cycolor Inc Selbstenthaltene bildzusammenbau und verfahren zur bildherstellung damit
US6030740A (en) * 1998-03-12 2000-02-29 Cycolor, Inc. Two-sided imaging material
US6127084A (en) * 1998-10-23 2000-10-03 Cycolor, Inc. Photosensitive material employing microcapsules containing a hygroscopic polymer in the internal phase
US6080520A (en) * 1999-05-26 2000-06-27 Cycolor, Inc. Imaging system having opaque support

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024116077A1 (fr) * 2022-12-02 2024-06-06 Polaroid Ip B.V. Réduction de diaphonie d'un système d'imagerie à microcapsules

Also Published As

Publication number Publication date
GB0118886D0 (en) 2001-09-26
GB2365985A (en) 2002-02-27
HK1046169A1 (en) 2002-12-27
CN1355445A (zh) 2002-06-26
GB2365985B (en) 2004-05-26
HK1046169B (zh) 2004-11-26
DE10138440A1 (de) 2002-03-07

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Legal Events

Date Code Title Description
FZDE Dead