HK1046169B - 自給自足的照像配件 - Google Patents

自給自足的照像配件

Info

Publication number
HK1046169B
HK1046169B HK02105931.9A HK02105931A HK1046169B HK 1046169 B HK1046169 B HK 1046169B HK 02105931 A HK02105931 A HK 02105931A HK 1046169 B HK1046169 B HK 1046169B
Authority
HK
Hong Kong
Prior art keywords
self
photosensitive material
contained photosensitive
contained
photosensitive
Prior art date
Application number
HK02105931.9A
Other languages
English (en)
Other versions
HK1046169A1 (en
Inventor
Higuchi Tetsuya
Uchibori Takahiro
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2000277266A external-priority patent/JP2002055445A/ja
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of HK1046169A1 publication Critical patent/HK1046169A1/xx
Publication of HK1046169B publication Critical patent/HK1046169B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/002—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
HK02105931.9A 2000-08-10 2002-08-13 自給自足的照像配件 HK1046169B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000277266A JP2002055445A (ja) 2000-08-10 2000-08-10 自己発色型感光性感圧記録材料及びその製造方法並びにその画像形成方法
US09/761,014 US6635399B2 (en) 2000-08-10 2001-01-16 One base photosensitive imaging system

Publications (2)

Publication Number Publication Date
HK1046169A1 HK1046169A1 (en) 2002-12-27
HK1046169B true HK1046169B (zh) 2004-11-26

Family

ID=26599804

Family Applications (1)

Application Number Title Priority Date Filing Date
HK02105931.9A HK1046169B (zh) 2000-08-10 2002-08-13 自給自足的照像配件

Country Status (5)

Country Link
CN (1) CN1355445A (zh)
CA (1) CA2354784A1 (zh)
DE (1) DE10138440A1 (zh)
GB (1) GB2365985B (zh)
HK (1) HK1046169B (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6964836B2 (en) * 2002-03-15 2005-11-15 Eastman Kodak Company Photosensitive microcapsules containing a synthetic viscosity modifier in the continuous phase
US6838226B2 (en) * 2003-05-20 2005-01-04 Eastman Kodak Company Imaging member with microgel protective layer
US6899996B2 (en) 2003-05-20 2005-05-31 Eastman Kodak Company Method of preparing imaging member with microgel protective layer
CN102004391A (zh) * 2010-10-25 2011-04-06 中国乐凯胶片集团公司 一种双面成像用涂塑纸基
US20240184198A1 (en) * 2022-12-02 2024-06-06 Polaroid Ip B.V. Crosstalk reduction of microcapsule imaging system

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4766050A (en) * 1987-03-27 1988-08-23 The Mead Corporation Imaging system with integral cover sheet
JPH01176583A (ja) * 1988-01-06 1989-07-12 Fuji Photo Film Co Ltd 感熱記録材料
EP0765493B1 (en) * 1994-06-10 2001-09-05 Cycolor, Inc. Self-contained imaging assembly and method for forming images therein
US6030740A (en) * 1998-03-12 2000-02-29 Cycolor, Inc. Two-sided imaging material
US6127084A (en) * 1998-10-23 2000-10-03 Cycolor, Inc. Photosensitive material employing microcapsules containing a hygroscopic polymer in the internal phase
US6080520A (en) * 1999-05-26 2000-06-27 Cycolor, Inc. Imaging system having opaque support

Also Published As

Publication number Publication date
GB0118886D0 (en) 2001-09-26
DE10138440A1 (de) 2002-03-07
HK1046169A1 (en) 2002-12-27
GB2365985A (en) 2002-02-27
CA2354784A1 (en) 2002-02-10
CN1355445A (zh) 2002-06-26
GB2365985B (en) 2004-05-26

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Legal Events

Date Code Title Description
PF Patent in force
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20080802