CA2281787C - Masque de phase presentant une efficacite de diffraction variable dans l'espace - Google Patents

Masque de phase presentant une efficacite de diffraction variable dans l'espace Download PDF

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Publication number
CA2281787C
CA2281787C CA002281787A CA2281787A CA2281787C CA 2281787 C CA2281787 C CA 2281787C CA 002281787 A CA002281787 A CA 002281787A CA 2281787 A CA2281787 A CA 2281787A CA 2281787 C CA2281787 C CA 2281787C
Authority
CA
Canada
Prior art keywords
thin film
film layer
phase mask
grating
variable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CA002281787A
Other languages
English (en)
Other versions
CA2281787A1 (fr
Inventor
Peter Ehbets
Michel Poirier
Zhihong Xu
Nadia Capolla
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Institut National dOptique
Coherent International LLC
Original Assignee
Institut National dOptique
StockerYale Canada Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from CA002197706A external-priority patent/CA2197706A1/fr
Application filed by Institut National dOptique, StockerYale Canada Inc filed Critical Institut National dOptique
Priority to CA002281787A priority Critical patent/CA2281787C/fr
Publication of CA2281787A1 publication Critical patent/CA2281787A1/fr
Application granted granted Critical
Publication of CA2281787C publication Critical patent/CA2281787C/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/02—Optical fibres with cladding with or without a coating
    • G02B6/02057—Optical fibres with cladding with or without a coating comprising gratings
    • G02B6/02076—Refractive index modulation gratings, e.g. Bragg gratings
    • G02B6/02123—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating
    • G02B6/02133—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating using beam interference
    • G02B6/02138—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating using beam interference based on illuminating a phase mask
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/02—Optical fibres with cladding with or without a coating
    • G02B6/02057—Optical fibres with cladding with or without a coating comprising gratings
    • G02B6/02076—Refractive index modulation gratings, e.g. Bragg gratings
    • G02B6/0208—Refractive index modulation gratings, e.g. Bragg gratings characterised by their structure, wavelength response
    • G02B6/02085—Refractive index modulation gratings, e.g. Bragg gratings characterised by their structure, wavelength response characterised by the grating profile, e.g. chirped, apodised, tilted, helical
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/34—Phase-edge PSM, e.g. chromeless PSM; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

Masque de phase (15) servant à moduler un faisceau lumineux collimaté qui le traverse et qui est diffracté afin de photo-induire un profil d'indice de réfraction dans un milieu optique photosensible, et comprenant un substrat (17) possédant une surface extérieure pourvue d'une pluralité de cannelures (19) de réseau de diffraction. Ces cannelures (19) présentent une profondeur non uniforme de relief à travers la surface extérieure, de manière à photo-induire un profil d'indice de réfraction non uniforme dans le milieu optique photosensible. La profondeur non uniforme de relief est définie par une couche mince variable (21) d'épaisseur variable recouvrant le substrat (17). Les cannelures (19) du réseau de diffraction peuvent être gravées par attaque chimique soit dans la couche mince (21) elle-même, soit dans le substrat (17), la couche mince variable (21) étant déposé sur le substrat après gravure. L'invention concerne également des procédés servant à fabriquer ces masques de phase.
CA002281787A 1997-02-14 1998-02-11 Masque de phase presentant une efficacite de diffraction variable dans l'espace Expired - Fee Related CA2281787C (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CA002281787A CA2281787C (fr) 1997-02-14 1998-02-11 Masque de phase presentant une efficacite de diffraction variable dans l'espace

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
CA2,197,706 1997-02-14
CA002197706A CA2197706A1 (fr) 1997-02-14 1997-02-14 Methode de fabrication de masque de phase apodise
CA002281787A CA2281787C (fr) 1997-02-14 1998-02-11 Masque de phase presentant une efficacite de diffraction variable dans l'espace
PCT/CA1998/000112 WO1998036297A1 (fr) 1997-02-14 1998-02-11 Sources de curietherapie de faible energie encapsulees

Publications (2)

Publication Number Publication Date
CA2281787A1 CA2281787A1 (fr) 1998-08-20
CA2281787C true CA2281787C (fr) 2004-08-10

Family

ID=31716366

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002281787A Expired - Fee Related CA2281787C (fr) 1997-02-14 1998-02-11 Masque de phase presentant une efficacite de diffraction variable dans l'espace

Country Status (1)

Country Link
CA (1) CA2281787C (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060056028A1 (en) * 2004-09-13 2006-03-16 Wildnauer Kenneth R Apodized diffraction grating with improved dynamic range

Also Published As

Publication number Publication date
CA2281787A1 (fr) 1998-08-20

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Effective date: 20140211