CA2177987A1 - Procede de fabrication de condensateur et condensateur issu d'un tel procede - Google Patents
Procede de fabrication de condensateur et condensateur issu d'un tel procedeInfo
- Publication number
- CA2177987A1 CA2177987A1 CA002177987A CA2177987A CA2177987A1 CA 2177987 A1 CA2177987 A1 CA 2177987A1 CA 002177987 A CA002177987 A CA 002177987A CA 2177987 A CA2177987 A CA 2177987A CA 2177987 A1 CA2177987 A1 CA 2177987A1
- Authority
- CA
- Canada
- Prior art keywords
- process according
- filaments
- mask
- bands
- deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000000034 method Methods 0.000 title claims abstract description 38
- 239000003990 capacitor Substances 0.000 title claims abstract description 29
- 238000004519 manufacturing process Methods 0.000 title abstract description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 40
- 230000008021 deposition Effects 0.000 claims abstract description 34
- 239000007789 gas Substances 0.000 claims abstract description 27
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 20
- 239000002243 precursor Substances 0.000 claims abstract description 17
- 238000010494 dissociation reaction Methods 0.000 claims abstract description 7
- 230000005593 dissociations Effects 0.000 claims abstract description 7
- 125000000082 organogermanium group Chemical group 0.000 claims abstract description 7
- 238000006116 polymerization reaction Methods 0.000 claims abstract description 5
- 238000000151 deposition Methods 0.000 claims description 36
- 150000002500 ions Chemical class 0.000 claims description 15
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 12
- 239000001301 oxygen Substances 0.000 claims description 12
- 229910052760 oxygen Inorganic materials 0.000 claims description 12
- 238000005520 cutting process Methods 0.000 claims description 8
- 239000000758 substrate Substances 0.000 claims description 8
- 230000005495 cold plasma Effects 0.000 claims description 6
- 150000003961 organosilicon compounds Chemical class 0.000 claims description 6
- 150000004696 coordination complex Chemical class 0.000 claims description 5
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- 229910045601 alloy Inorganic materials 0.000 claims description 4
- 239000000956 alloy Substances 0.000 claims description 4
- -1 siloxanes Chemical class 0.000 claims description 3
- 238000005476 soldering Methods 0.000 claims description 3
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 claims description 2
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims description 2
- FWMUJAIKEJWSSY-UHFFFAOYSA-N sulfur dichloride Chemical compound ClSCl FWMUJAIKEJWSSY-UHFFFAOYSA-N 0.000 claims description 2
- UHUUYVZLXJHWDV-UHFFFAOYSA-N trimethyl(methylsilyloxy)silane Chemical compound C[SiH2]O[Si](C)(C)C UHUUYVZLXJHWDV-UHFFFAOYSA-N 0.000 claims description 2
- 125000005595 acetylacetonate group Chemical group 0.000 claims 1
- 239000002019 doping agent Substances 0.000 description 9
- 239000004020 conductor Substances 0.000 description 8
- 238000002347 injection Methods 0.000 description 8
- 239000007924 injection Substances 0.000 description 8
- 238000010586 diagram Methods 0.000 description 6
- 239000002985 plastic film Substances 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 5
- 239000003989 dielectric material Substances 0.000 description 5
- 229920002457 flexible plastic Polymers 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000008033 biological extinction Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000009432 framing Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000000873 masking effect Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 230000002459 sustained effect Effects 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 239000005864 Sulphur Substances 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- LCKIEQZJEYYRIY-UHFFFAOYSA-N Titanium ion Chemical compound [Ti+4] LCKIEQZJEYYRIY-UHFFFAOYSA-N 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000002322 conducting polymer Substances 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- 239000006071 cream Substances 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 229940087654 iron carbonyl Drugs 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- 210000000056 organ Anatomy 0.000 description 1
- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical group [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- SYOKIDBDQMKNDQ-XWTIBIIYSA-N vildagliptin Chemical compound C1C(O)(C2)CC(C3)CC1CC32NCC(=O)N1CCC[C@H]1C#N SYOKIDBDQMKNDQ-XWTIBIIYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/005—Electrodes
- H01G4/008—Selection of materials
- H01G4/0085—Fried electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F38/00—Adaptations of transformers or inductances for specific applications or functions
- H01F38/20—Instruments transformers
- H01F38/22—Instruments transformers for single phase ac
- H01F38/28—Current transformers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/005—Electrodes
- H01G4/012—Form of non-self-supporting electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/30—Stacked capacitors
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
L'invention concerne un procédé de fabrication de condensateur de type empilé constitué d'une alternance de couches diélectriques et de couches conductrices. Les couches diélectriques et conductrices sont déposées successivement. Les couches diélectriques sont déposées par polymérisation d'éléments issus de la dissociation par plasma différé d'azote d'un gaz organo-silicé ou organo-germané et les couches conductrices sont réalisés par dépôt d'éléments conducteurs issus de la dissociation par plasma différé d'azote d'un gaz précurseur des éléments conducteurs.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR9314519A FR2713388B1 (fr) | 1993-12-03 | 1993-12-03 | Procédé de fabrication de condensateur et condensateur issu d'un tel procédé. |
| FR93/14519 | 1993-12-03 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA2177987A1 true CA2177987A1 (fr) | 1995-06-08 |
Family
ID=9453535
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002177987A Abandoned CA2177987A1 (fr) | 1993-12-03 | 1994-12-01 | Procede de fabrication de condensateur et condensateur issu d'un tel procede |
Country Status (7)
| Country | Link |
|---|---|
| EP (1) | EP0731974A1 (fr) |
| JP (1) | JPH09505943A (fr) |
| KR (1) | KR960706683A (fr) |
| CA (1) | CA2177987A1 (fr) |
| FI (1) | FI962293A (fr) |
| FR (1) | FR2713388B1 (fr) |
| WO (1) | WO1995015570A1 (fr) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5701686A (en) * | 1991-07-08 | 1997-12-30 | Herr; Hugh M. | Shoe and foot prosthesis with bending beam spring structures |
| AUPN363595A0 (en) * | 1995-06-19 | 1995-07-13 | Intag International Limited | Fabrication of capacitors |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59200753A (ja) * | 1983-04-30 | 1984-11-14 | Mitsubishi Electric Corp | 薄膜形成装置 |
| US4599678A (en) * | 1985-03-19 | 1986-07-08 | Wertheimer Michael R | Plasma-deposited capacitor dielectrics |
-
1993
- 1993-12-03 FR FR9314519A patent/FR2713388B1/fr not_active Expired - Fee Related
-
1994
- 1994-12-01 EP EP95902822A patent/EP0731974A1/fr not_active Withdrawn
- 1994-12-01 KR KR1019960702896A patent/KR960706683A/ko not_active Application Discontinuation
- 1994-12-01 CA CA002177987A patent/CA2177987A1/fr not_active Abandoned
- 1994-12-01 WO PCT/FR1994/001404 patent/WO1995015570A1/fr not_active Application Discontinuation
- 1994-12-01 JP JP7515450A patent/JPH09505943A/ja active Pending
-
1996
- 1996-05-31 FI FI962293A patent/FI962293A/fi not_active Application Discontinuation
Also Published As
| Publication number | Publication date |
|---|---|
| FI962293A (fi) | 1996-07-22 |
| EP0731974A1 (fr) | 1996-09-18 |
| JPH09505943A (ja) | 1997-06-10 |
| FR2713388B1 (fr) | 1996-01-26 |
| WO1995015570A1 (fr) | 1995-06-08 |
| KR960706683A (ko) | 1996-12-09 |
| FR2713388A1 (fr) | 1995-06-09 |
| FI962293A0 (fi) | 1996-05-31 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FZDE | Dead |