CA2090039A1 - Couche de finition et bouche-pores catalyses par un acide - Google Patents
Couche de finition et bouche-pores catalyses par un acideInfo
- Publication number
- CA2090039A1 CA2090039A1 CA 2090039 CA2090039A CA2090039A1 CA 2090039 A1 CA2090039 A1 CA 2090039A1 CA 2090039 CA2090039 CA 2090039 CA 2090039 A CA2090039 A CA 2090039A CA 2090039 A1 CA2090039 A1 CA 2090039A1
- Authority
- CA
- Canada
- Prior art keywords
- acid
- polymeric film
- resist
- film forming
- protective topcoat
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US58727390A | 1990-09-18 | 1990-09-18 | |
US587,273 | 1990-09-18 |
Publications (1)
Publication Number | Publication Date |
---|---|
CA2090039A1 true CA2090039A1 (fr) | 1992-03-19 |
Family
ID=24349129
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA 2090039 Abandoned CA2090039A1 (fr) | 1990-09-18 | 1990-12-21 | Couche de finition et bouche-pores catalyses par un acide |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP0556177A1 (fr) |
JP (1) | JPH05507154A (fr) |
CA (1) | CA2090039A1 (fr) |
WO (1) | WO1992005474A1 (fr) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5506090A (en) * | 1994-09-23 | 1996-04-09 | Minnesota Mining And Manufacturing Company | Process for making shoot and run printing plates |
US6984482B2 (en) | 1999-06-03 | 2006-01-10 | Hynix Semiconductor Inc. | Top-coating composition for photoresist and process for forming fine pattern using the same |
KR100401116B1 (ko) * | 1999-06-03 | 2003-10-10 | 주식회사 하이닉스반도체 | 아민오염방지 물질 및 이를 이용한 미세패턴 형성방법 |
DE102004030861A1 (de) * | 2004-06-25 | 2006-01-19 | Infineon Technologies Ag | Verfahren zum Strukturieren eines Halbleitersubstrats unter Verwendung einer Schutzschicht, die das Ausgasen während der Belichtung verringert oder verhindert |
CN101080674B (zh) | 2004-12-03 | 2013-09-18 | 捷时雅株式会社 | 形成抗反射薄膜的组合物,层状产品,和抗蚀剂图案的形成方法 |
JP4595606B2 (ja) | 2005-03-17 | 2010-12-08 | Jsr株式会社 | 反射防止膜形成用組成物、積層体およびレジストパターンの形成方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50152803A (fr) * | 1974-05-29 | 1975-12-09 | ||
JPS57183030A (en) * | 1981-05-07 | 1982-11-11 | Toshiba Corp | Manufacture of semiconductor device |
DE3715790A1 (de) * | 1987-05-12 | 1988-11-24 | Hoechst Ag | Strahlungsempfindliches aufzeichnungsmaterial |
-
1990
- 1990-12-21 WO PCT/US1990/007618 patent/WO1992005474A1/fr not_active Application Discontinuation
- 1990-12-21 JP JP91507106A patent/JPH05507154A/ja active Pending
- 1990-12-21 EP EP19910906782 patent/EP0556177A1/fr not_active Withdrawn
- 1990-12-21 CA CA 2090039 patent/CA2090039A1/fr not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
WO1992005474A1 (fr) | 1992-04-02 |
EP0556177A1 (fr) | 1993-08-25 |
JPH05507154A (ja) | 1993-10-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EEER | Examination request | ||
FZDE | Dead |