CA2090039A1 - Couche de finition et bouche-pores catalyses par un acide - Google Patents

Couche de finition et bouche-pores catalyses par un acide

Info

Publication number
CA2090039A1
CA2090039A1 CA 2090039 CA2090039A CA2090039A1 CA 2090039 A1 CA2090039 A1 CA 2090039A1 CA 2090039 CA2090039 CA 2090039 CA 2090039 A CA2090039 A CA 2090039A CA 2090039 A1 CA2090039 A1 CA 2090039A1
Authority
CA
Canada
Prior art keywords
acid
polymeric film
resist
film forming
protective topcoat
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
CA 2090039
Other languages
English (en)
Inventor
Willard Earl Conley
Ranee Wai-Ling Kwong
Richard Joseph Kvitek
Robert Neil Lang
Christopher Francis Lyons
Steve Seiichi Miura
Wayne Martin Moreau
Harbans Singh Sachdev
Robert Lavin Wood
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of CA2090039A1 publication Critical patent/CA2090039A1/fr
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
CA 2090039 1990-09-18 1990-12-21 Couche de finition et bouche-pores catalyses par un acide Abandoned CA2090039A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US58727390A 1990-09-18 1990-09-18
US587,273 1990-09-18

Publications (1)

Publication Number Publication Date
CA2090039A1 true CA2090039A1 (fr) 1992-03-19

Family

ID=24349129

Family Applications (1)

Application Number Title Priority Date Filing Date
CA 2090039 Abandoned CA2090039A1 (fr) 1990-09-18 1990-12-21 Couche de finition et bouche-pores catalyses par un acide

Country Status (4)

Country Link
EP (1) EP0556177A1 (fr)
JP (1) JPH05507154A (fr)
CA (1) CA2090039A1 (fr)
WO (1) WO1992005474A1 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5506090A (en) * 1994-09-23 1996-04-09 Minnesota Mining And Manufacturing Company Process for making shoot and run printing plates
KR100401116B1 (ko) * 1999-06-03 2003-10-10 주식회사 하이닉스반도체 아민오염방지 물질 및 이를 이용한 미세패턴 형성방법
US6984482B2 (en) 1999-06-03 2006-01-10 Hynix Semiconductor Inc. Top-coating composition for photoresist and process for forming fine pattern using the same
DE102004030861A1 (de) * 2004-06-25 2006-01-19 Infineon Technologies Ag Verfahren zum Strukturieren eines Halbleitersubstrats unter Verwendung einer Schutzschicht, die das Ausgasen während der Belichtung verringert oder verhindert
DE602005027888D1 (de) 2004-12-03 2011-06-16 Jsr Corp Zusammensetzung zur bildung eines antireflexionsfilms, beschichtetes produkt und verfahren zur herstellung einer resiststruktur
JP4595606B2 (ja) 2005-03-17 2010-12-08 Ｊｓｒ株式会社 反射防止膜形成用組成物、積層体およびレジストパターンの形成方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50152803A (fr) * 1974-05-29 1975-12-09
JPS57183030A (en) * 1981-05-07 1982-11-11 Toshiba Corp Manufacture of semiconductor device
DE3715790A1 (de) * 1987-05-12 1988-11-24 Hoechst Ag Strahlungsempfindliches aufzeichnungsmaterial

Also Published As

Publication number Publication date
JPH05507154A (ja) 1993-10-14
EP0556177A1 (fr) 1993-08-25
WO1992005474A1 (fr) 1992-04-02

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Legal Events

Date Code Title Description
EEER Examination request
FZDE Dead