CA2082834A1 - Melanges curables par rayonnements - Google Patents
Melanges curables par rayonnementsInfo
- Publication number
- CA2082834A1 CA2082834A1 CA 2082834 CA2082834A CA2082834A1 CA 2082834 A1 CA2082834 A1 CA 2082834A1 CA 2082834 CA2082834 CA 2082834 CA 2082834 A CA2082834 A CA 2082834A CA 2082834 A1 CA2082834 A1 CA 2082834A1
- Authority
- CA
- Canada
- Prior art keywords
- radiation curable
- curable compositions
- compositions
- nitrobenzyl tosylate
- tosylate derivatives
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 title abstract 3
- 230000005855 radiation Effects 0.000 title abstract 3
- STOLYTNTPGXYRW-UHFFFAOYSA-N [nitro(phenyl)methyl] 4-methylbenzenesulfonate Chemical class C1=CC(C)=CC=C1S(=O)(=O)OC([N+]([O-])=O)C1=CC=CC=C1 STOLYTNTPGXYRW-UHFFFAOYSA-N 0.000 abstract 2
- 239000003054 catalyst Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 125000005375 organosiloxane group Chemical group 0.000 abstract 1
- 238000000016 photochemical curing Methods 0.000 abstract 1
- -1 siloxanes Chemical class 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Silicon Polymers (AREA)
- Polymerisation Methods In General (AREA)
- Paints Or Removers (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB919124422A GB9124422D0 (en) | 1991-11-14 | 1991-11-14 | Radiation curable compositions |
| GB9124422.8 | 1991-11-14 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CA2082834A1 true CA2082834A1 (fr) | 1993-05-15 |
| CA2082834C CA2082834C (fr) | 1999-12-07 |
Family
ID=10704787
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA 2082834 Expired - Fee Related CA2082834C (fr) | 1991-11-14 | 1992-11-13 | Melanges curables par rayonnements |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP0542485B1 (fr) |
| JP (1) | JPH05262812A (fr) |
| CA (1) | CA2082834C (fr) |
| DE (1) | DE69220327T2 (fr) |
| FI (1) | FI925175A (fr) |
| GB (1) | GB9124422D0 (fr) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA2327034C (fr) * | 1999-12-01 | 2007-07-17 | Canon Kabushiki Kaisha | Methode pour refaire la surface d'un element, element a la surface refaite, methode de production d'elements a la surface refaite, liquide de traitement de surface pour obtenir une surface refaite et methode de production du liquide de traitement de surfaces |
| US6796645B2 (en) * | 1999-12-06 | 2004-09-28 | Canon Kabushiki Kaisha | Surface reformed fiber body, liquid container using fiber absorber, and method of producing fiber absorber for use in liquid ejection |
| WO2018159356A1 (fr) * | 2017-03-02 | 2018-09-07 | Jsr株式会社 | Composition pour formation de film contenant du silicium, film contenant du silicium, procédé de formation de motif et polysiloxane |
| JP6718048B2 (ja) * | 2017-06-30 | 2020-07-08 | 協立化学産業株式会社 | 新規重合性化合物及び柔軟性樹脂組成物 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2623309B2 (ja) * | 1988-02-22 | 1997-06-25 | ユーシービー ソシエテ アノニム | レジストパターンを得る方法 |
-
1991
- 1991-11-14 GB GB919124422A patent/GB9124422D0/en active Pending
-
1992
- 1992-11-05 DE DE1992620327 patent/DE69220327T2/de not_active Expired - Fee Related
- 1992-11-05 EP EP19920310164 patent/EP0542485B1/fr not_active Expired - Lifetime
- 1992-11-11 JP JP4300992A patent/JPH05262812A/ja active Pending
- 1992-11-13 CA CA 2082834 patent/CA2082834C/fr not_active Expired - Fee Related
- 1992-11-13 FI FI925175A patent/FI925175A/fi unknown
Also Published As
| Publication number | Publication date |
|---|---|
| FI925175A (fi) | 1993-05-15 |
| EP0542485A1 (fr) | 1993-05-19 |
| FI925175A0 (fi) | 1992-11-13 |
| GB9124422D0 (en) | 1992-01-08 |
| DE69220327T2 (de) | 1997-10-23 |
| CA2082834C (fr) | 1999-12-07 |
| JPH05262812A (ja) | 1993-10-12 |
| EP0542485B1 (fr) | 1997-06-11 |
| DE69220327D1 (de) | 1997-07-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EEER | Examination request | ||
| MKLA | Lapsed |