CA2053342A1 - Procede d'electrodeposition de nickel limitant l'accumulation d'ions de nickel - Google Patents

Procede d'electrodeposition de nickel limitant l'accumulation d'ions de nickel

Info

Publication number
CA2053342A1
CA2053342A1 CA002053342A CA2053342A CA2053342A1 CA 2053342 A1 CA2053342 A1 CA 2053342A1 CA 002053342 A CA002053342 A CA 002053342A CA 2053342 A CA2053342 A CA 2053342A CA 2053342 A1 CA2053342 A1 CA 2053342A1
Authority
CA
Canada
Prior art keywords
anode
nickel
bath
substrate
current
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
CA002053342A
Other languages
English (en)
Inventor
Robert A. Tremmel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MacDermid Enthone Inc
Original Assignee
Robert A. Tremmel
Enthone-Omi, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Robert A. Tremmel, Enthone-Omi, Inc. filed Critical Robert A. Tremmel
Publication of CA2053342A1 publication Critical patent/CA2053342A1/fr
Abandoned legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/12Electroplating: Baths therefor from solutions of nickel or cobalt
CA002053342A 1990-10-22 1991-10-11 Procede d'electrodeposition de nickel limitant l'accumulation d'ions de nickel Abandoned CA2053342A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US60886990A 1990-10-22 1990-10-22
US07/608,869 1990-10-22

Publications (1)

Publication Number Publication Date
CA2053342A1 true CA2053342A1 (fr) 1992-04-23

Family

ID=24438391

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002053342A Abandoned CA2053342A1 (fr) 1990-10-22 1991-10-11 Procede d'electrodeposition de nickel limitant l'accumulation d'ions de nickel

Country Status (8)

Country Link
JP (1) JPH04333600A (fr)
CA (1) CA2053342A1 (fr)
DE (1) DE4134656C2 (fr)
ES (1) ES2034897B1 (fr)
FR (1) FR2668173A1 (fr)
GB (1) GB2249107A (fr)
IT (1) IT1249854B (fr)
SE (1) SE9103061L (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4229917C1 (en) * 1992-09-08 1993-07-15 Lpw-Anlagen Gmbh, 4040 Neuss, De Electrolytic bath for meter coating - has sec. anode contg. alkaline or ammonium soln. with acid added to electrolyte to compensate for pH rise

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2393516A (en) * 1943-08-19 1946-01-22 Indiana Steel & Wire Company Process for electroplating
US2504238A (en) * 1945-07-13 1950-04-18 Int Nickel Co Anode assembly
BE564995A (fr) * 1957-02-20
DE1250712B (de) * 1963-05-22 1967-09-21 International Nickel Limited, London Galvanisches Nickelsulfamatbad und Verfahren zum Abscheiden von Nickeluberzugen
US3374154A (en) * 1965-07-12 1968-03-19 Int Nickel Co Electroforming and electrodeposition of stress-free nickel from the sulfamate bath
US3474011A (en) * 1967-08-03 1969-10-21 American Bank Note Co Electroplating method and apparatus
JPS5135394B2 (fr) * 1972-09-01 1976-10-01
JPS558493A (en) * 1978-07-05 1980-01-22 Mazda Motor Corp Nickel recovery system of nickel plating apparatus
JPS56112500A (en) * 1980-02-09 1981-09-04 Ebara Yuujiraito Kk Method for electroplating
US4466865A (en) * 1982-01-11 1984-08-21 Omi International Corporation Trivalent chromium electroplating process
FR2538815B1 (fr) * 1983-01-03 1990-02-02 Omi Int Corp Procede pour former, par electrolyse, un revetement de cuivre sur un substrat, a partir d'un bain exempt de cyanure, et anode pour la mise en oeuvre de ce procede
US4469569A (en) * 1983-01-03 1984-09-04 Omi International Corporation Cyanide-free copper plating process
JPS63317698A (ja) * 1987-06-20 1988-12-26 Toyota Motor Corp 電気めっき液の金属イオン濃度と水素イオン濃度の制御装置
US4778572A (en) * 1987-09-08 1988-10-18 Eco-Tec Limited Process for electroplating metals
US4933051A (en) * 1989-07-24 1990-06-12 Omi International Corporation Cyanide-free copper plating process

Also Published As

Publication number Publication date
GB2249107A (en) 1992-04-29
DE4134656A1 (de) 1992-04-23
ITTO910789A0 (it) 1991-10-18
ITTO910789A1 (it) 1992-04-23
DE4134656C2 (de) 1994-02-03
ES2034897B1 (es) 1994-04-16
JPH04333600A (ja) 1992-11-20
IT1249854B (it) 1995-03-28
FR2668173A1 (fr) 1992-04-24
SE9103061D0 (sv) 1991-10-21
GB9122383D0 (en) 1991-12-04
ES2034897A1 (es) 1993-04-01
SE9103061L (sv) 1992-04-23

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Legal Events

Date Code Title Description
EEER Examination request
FZDE Discontinued