CA2005620C - High intensity radiation apparatus and fluid recirculating system therefor - Google Patents

High intensity radiation apparatus and fluid recirculating system therefor

Info

Publication number
CA2005620C
CA2005620C CA002005620A CA2005620A CA2005620C CA 2005620 C CA2005620 C CA 2005620C CA 002005620 A CA002005620 A CA 002005620A CA 2005620 A CA2005620 A CA 2005620A CA 2005620 C CA2005620 C CA 2005620C
Authority
CA
Canada
Prior art keywords
liquid
gas
arc chamber
duct
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CA002005620A
Other languages
English (en)
French (fr)
Other versions
CA2005620A1 (en
Inventor
David Malcolm Camm
Arne Kjorvel
Anthony John Derek Housden
Nicholas Peter Halpin
Dean Allister Parfeniuk
Andy Joseph Frenz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mattson Technology Canada Inc
Original Assignee
Vortek Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vortek Industries Ltd filed Critical Vortek Industries Ltd
Publication of CA2005620A1 publication Critical patent/CA2005620A1/en
Application granted granted Critical
Publication of CA2005620C publication Critical patent/CA2005620C/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/52—Cooling arrangements; Heating arrangements; Means for circulating gas or vapour within the discharge space
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/24—Means for obtaining or maintaining the desired pressure within the vessel
    • H01J61/28—Means for producing, introducing, or replenishing gas or vapour during operation of the lamp

Landscapes

  • Plasma Technology (AREA)
  • Discharge Lamps And Accessories Thereof (AREA)
  • Separation By Low-Temperature Treatments (AREA)
  • Jet Pumps And Other Pumps (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
CA002005620A 1988-12-19 1989-12-15 High intensity radiation apparatus and fluid recirculating system therefor Expired - Lifetime CA2005620C (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/286,127 1988-12-19
US07/286,127 US4937490A (en) 1988-12-19 1988-12-19 High intensity radiation apparatus and fluid recirculating system therefor

Publications (2)

Publication Number Publication Date
CA2005620A1 CA2005620A1 (en) 1990-06-19
CA2005620C true CA2005620C (en) 1995-05-09

Family

ID=23097202

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002005620A Expired - Lifetime CA2005620C (en) 1988-12-19 1989-12-15 High intensity radiation apparatus and fluid recirculating system therefor

Country Status (6)

Country Link
US (1) US4937490A (enExample)
EP (1) EP0375338B1 (enExample)
JP (1) JPH02216753A (enExample)
CN (1) CN1043822A (enExample)
CA (1) CA2005620C (enExample)
DE (1) DE68927991T2 (enExample)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5561735A (en) * 1994-08-30 1996-10-01 Vortek Industries Ltd. Rapid thermal processing apparatus and method
US5556791A (en) * 1995-01-03 1996-09-17 Texas Instruments Incorporated Method of making optically fused semiconductor powder for solar cells
GB9506010D0 (en) * 1995-03-23 1995-08-23 Anderson John E Electromagnetic energy directing method and apparatus
US6174388B1 (en) 1999-03-15 2001-01-16 Lockheed Martin Energy Research Corp. Rapid infrared heating of a surface
US6303411B1 (en) 1999-05-03 2001-10-16 Vortek Industries Ltd. Spatially resolved temperature measurement and irradiance control
US6912356B2 (en) * 1999-06-07 2005-06-28 Diversified Industries Ltd. Method and apparatus for fracturing brittle materials by thermal stressing
CA2310883A1 (en) 1999-06-07 2000-12-07 Norman L. Arrison Method and apparatus for fracturing brittle materials by thermal stressing
US6621199B1 (en) 2000-01-21 2003-09-16 Vortek Industries Ltd. High intensity electromagnetic radiation apparatus and method
CN101324470B (zh) 2001-12-26 2011-03-30 加拿大马特森技术有限公司 测量温度和热处理的方法及系统
KR101163682B1 (ko) 2002-12-20 2012-07-09 맷슨 테크날러지 캐나다 인코퍼레이티드 피가공물 지지 장치
JP5630935B2 (ja) 2003-12-19 2014-11-26 マトソン テクノロジー、インコーポレイテッド 工作物の熱誘起運動を抑制する機器及び装置
US7781947B2 (en) * 2004-02-12 2010-08-24 Mattson Technology Canada, Inc. Apparatus and methods for producing electromagnetic radiation
US20050180141A1 (en) * 2004-02-13 2005-08-18 Norman Arrison Protection device for high intensity radiation sources
KR100595826B1 (ko) 2004-03-15 2006-07-03 찰리 정 전기 아크 방사광 장치
CN1330881C (zh) * 2004-03-19 2007-08-08 六盘水神驰生物科技有限公司 整流式喷射泵
US7220936B2 (en) * 2004-07-30 2007-05-22 Ut-Battelle, Llc Pulse thermal processing of functional materials using directed plasma arc
WO2008058397A1 (en) 2006-11-15 2008-05-22 Mattson Technology Canada, Inc. Systems and methods for supporting a workpiece during heat-treating
WO2009137940A1 (en) 2008-05-16 2009-11-19 Mattson Technology Canada, Inc. Workpiece breakage prevention method and apparatus
US8778724B2 (en) * 2010-09-24 2014-07-15 Ut-Battelle, Llc High volume method of making low-cost, lightweight solar materials
US9196760B2 (en) 2011-04-08 2015-11-24 Ut-Battelle, Llc Methods for producing complex films, and films produced thereby
CA2864929C (en) * 2012-02-24 2015-12-22 Mattson Technology, Inc. Apparatus and methods for generating electromagnetic radiation
US9059079B1 (en) 2012-09-26 2015-06-16 Ut-Battelle, Llc Processing of insulators and semiconductors

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3292028A (en) * 1962-06-20 1966-12-13 Giannini Scient Corp Gas vortex-stabilized light source
US3405305A (en) * 1964-12-28 1968-10-08 Giannini Scient Corp Vortex-stabilized radiation source with a hollowed-out electrode
US3366815A (en) * 1965-12-29 1968-01-30 Union Carbide Corp High pressure arc cooled by a thin film of liquid on the wall of the envelope
DE1932172A1 (de) * 1968-06-29 1970-05-27 Sony Corp Kuehlvorrichtung
US4027185A (en) * 1974-06-13 1977-05-31 Canadian Patents And Development Limited High intensity radiation source
CA1239437A (en) * 1984-12-24 1988-07-19 Vortek Industries Ltd. High intensity radiation method and apparatus having improved liquid vortex flow

Also Published As

Publication number Publication date
US4937490A (en) 1990-06-26
JPH02216753A (ja) 1990-08-29
JPH0546051B2 (enExample) 1993-07-12
DE68927991D1 (de) 1997-05-28
DE68927991T2 (de) 1997-12-04
EP0375338A3 (en) 1990-12-12
EP0375338A2 (en) 1990-06-27
EP0375338B1 (en) 1997-04-23
CN1043822A (zh) 1990-07-11
CA2005620A1 (en) 1990-06-19

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Legal Events

Date Code Title Description
EEER Examination request
MKLA Lapsed
MKEC Expiry (correction)

Effective date: 20121202