CA1332817C - Procede d'electrodeposition - Google Patents
Procede d'electrodepositionInfo
- Publication number
- CA1332817C CA1332817C CA000571292A CA571292A CA1332817C CA 1332817 C CA1332817 C CA 1332817C CA 000571292 A CA000571292 A CA 000571292A CA 571292 A CA571292 A CA 571292A CA 1332817 C CA1332817 C CA 1332817C
- Authority
- CA
- Canada
- Prior art keywords
- solution
- metal
- copper
- sulfide
- plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/188—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by direct electroplating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/54—Electroplating of non-metallic surfaces
- C25D5/56—Electroplating of non-metallic surfaces of plastics
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/42—Plated through-holes or plated via connections
- H05K3/423—Plated through-holes or plated via connections characterised by electroplating method
- H05K3/424—Plated through-holes or plated via connections characterised by electroplating method by direct electroplating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0703—Plating
- H05K2203/0716—Metallic plating catalysts, e.g. for direct electroplating of through holes; Sensitising or activating metallic plating catalysts
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/42—Plated through-holes or plated via connections
- H05K3/425—Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern
- H05K3/427—Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern initial plating of through-holes in metal-clad substrates
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Chemically Coating (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US7186587A | 1987-07-10 | 1987-07-10 | |
US071,865 | 1987-07-10 | ||
US07/153,357 US5007990A (en) | 1987-07-10 | 1988-02-08 | Electroplating process |
US153,357 | 1988-02-08 |
Publications (1)
Publication Number | Publication Date |
---|---|
CA1332817C true CA1332817C (fr) | 1994-11-01 |
Family
ID=26752752
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA000571292A Expired - Fee Related CA1332817C (fr) | 1987-07-10 | 1988-07-06 | Procede d'electrodeposition |
Country Status (6)
Country | Link |
---|---|
US (1) | US5007990A (fr) |
EP (1) | EP0298298B1 (fr) |
JP (1) | JP2660002B2 (fr) |
BR (1) | BR8803437A (fr) |
CA (1) | CA1332817C (fr) |
DE (1) | DE3889155T2 (fr) |
Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4919768A (en) * | 1989-09-22 | 1990-04-24 | Shipley Company Inc. | Electroplating process |
US5342501A (en) * | 1989-11-21 | 1994-08-30 | Eric F. Harnden | Method for electroplating metal onto a non-conductive substrate treated with basic accelerating solutions for metal plating |
US5071517A (en) * | 1989-11-21 | 1991-12-10 | Solution Technology Systems | Method for directly electroplating a dielectric substrate and plated substrate so produced |
US5207888A (en) * | 1991-06-24 | 1993-05-04 | Shipley Company Inc. | Electroplating process and composition |
US5238550A (en) * | 1991-11-27 | 1993-08-24 | Shipley Company Inc. | Electroplating process |
US5262042A (en) * | 1991-12-12 | 1993-11-16 | Eric F. Harnden | Simplified method for direct electroplating of dielectric substrates |
DE4206680C1 (de) * | 1992-02-28 | 1994-01-27 | Schering Ag | Verfahren zur Metallisierung von Nichtleiteroberflächen und die Verwendung von Hydroxymethansulfinsäure im Verfahren |
US5681441A (en) * | 1992-12-22 | 1997-10-28 | Elf Technologies, Inc. | Method for electroplating a substrate containing an electroplateable pattern |
DE4412463C3 (de) * | 1994-04-08 | 2000-02-10 | Atotech Deutschland Gmbh | Verfahren zur Herstellung einer Palladium-Kolloid-Lösung und ihre Verwendung |
US5425873A (en) * | 1994-04-11 | 1995-06-20 | Shipley Company Llc | Electroplating process |
EP0905285B1 (fr) * | 1997-02-03 | 2000-12-27 | Okuno Chemical Industries Co., Ltd. | Procede pour metalliser par voie electrolytique un materiau non conducteur |
DE19740431C1 (de) * | 1997-09-11 | 1998-11-12 | Atotech Deutschland Gmbh | Verfahren zum Metallisieren eines elektrisch nichtleitende Oberflächenbereiche aufweisenden Substrats |
US6365033B1 (en) * | 1999-05-03 | 2002-04-02 | Semitoof, Inc. | Methods for controlling and/or measuring additive concentration in an electroplating bath |
USRE38931E1 (en) | 1998-05-01 | 2006-01-10 | Semitool, Inc. | Methods for controlling and/or measuring additive concentration in an electroplating bath |
US6899805B2 (en) * | 1998-05-01 | 2005-05-31 | Semitool, Inc. | Automated chemical management system executing improved electrolyte analysis method |
US6814855B2 (en) * | 1998-05-01 | 2004-11-09 | Semitool, Inc. | Automated chemical management system having improved analysis unit |
US20020182385A1 (en) * | 2001-05-29 | 2002-12-05 | Rensselaer Polytechnic Institute | Atomic layer passivation |
US6592736B2 (en) | 2001-07-09 | 2003-07-15 | Semitool, Inc. | Methods and apparatus for controlling an amount of a chemical constituent of an electrochemical bath |
GB0118870D0 (en) * | 2001-08-02 | 2001-09-26 | Shipley Co Llc | A combined adhesion promotion and direct metallization process |
US8465469B2 (en) * | 2002-09-12 | 2013-06-18 | Medtronic Vascular, Inc. | Reinforced catheter and methods of making |
DE602005022650D1 (de) * | 2004-04-26 | 2010-09-16 | Rohm & Haas Elect Mat | Verbessertes Plattierungsverfahren |
WO2007029545A1 (fr) * | 2005-09-02 | 2007-03-15 | Ebara-Udylite Co., Ltd. | Agent améliorant l’attachement d’un catalyseur |
KR101329989B1 (ko) | 2006-11-06 | 2013-11-15 | 우에무라 고교 가부시키가이샤 | 다이렉트 플레이팅 방법 및 팔라듐 도전체층 형성 용액 |
EP1988192B1 (fr) | 2007-05-03 | 2012-12-05 | Atotech Deutschland GmbH | Procédé d'application d'un revêtement métallique sur un substrat non conducteur |
US7887693B2 (en) * | 2007-06-22 | 2011-02-15 | Maria Nikolova | Acid copper electroplating bath composition |
EP2305856A1 (fr) | 2009-09-28 | 2011-04-06 | ATOTECH Deutschland GmbH | Processus d'application d'un revêtement métallique sur un substrat non conducteur |
PL2360294T3 (pl) * | 2010-02-12 | 2013-09-30 | Atotech Deutschland Gmbh | Sposób metalizowania przedmiotów wykazujących na powierzchni co najmniej dwa różne tworzywa sztuczne |
EP2511236B1 (fr) | 2011-04-14 | 2015-07-01 | Rohm and Haas Company | Sulfure de zinc multispectral de qualité améliorée |
JP2012240192A (ja) | 2011-05-24 | 2012-12-10 | Rohm & Haas Co | 向上した品質の多スペクトル硫化亜鉛 |
JP2014525517A (ja) * | 2011-09-08 | 2014-09-29 | クリア メタルズ インコーポレイテッド | 平らな導電性表面への酸化物層の形成 |
WO2015183304A1 (fr) | 2014-05-30 | 2015-12-03 | Uab Rekin International | Pré-traitement d'adhérence sans chrome pour des matières plastiques |
US9699914B2 (en) * | 2014-10-20 | 2017-07-04 | Averatek Corporation | Patterning of electroless metals by selective deactivation of catalysts |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US844304A (en) * | 1901-10-15 | 1907-02-12 | John Andrew Daly | Method of coating lace with metal. |
US3011920A (en) * | 1959-06-08 | 1961-12-05 | Shipley Co | Method of electroless deposition on a substrate and catalyst solution therefor |
US3099608A (en) * | 1959-12-30 | 1963-07-30 | Ibm | Method of electroplating on a dielectric base |
US3523875A (en) * | 1967-03-15 | 1970-08-11 | Hooker Chemical Corp | Process for metal coating substrate pretreated with alkali metal sulfide and resultant product |
US3533918A (en) * | 1967-04-18 | 1970-10-13 | John C Smith | Method of making electrodes for fuel cells |
US3874882A (en) * | 1972-02-09 | 1975-04-01 | Shipley Co | Catalyst solution for electroless deposition of metal on substrate |
US3993491A (en) * | 1973-12-07 | 1976-11-23 | Surface Technology, Inc. | Electroless plating |
US3993799A (en) * | 1974-10-04 | 1976-11-23 | Surface Technology, Inc. | Electroless plating process employing non-noble metal hydrous oxide catalyst |
DE2829919A1 (de) * | 1977-08-19 | 1979-03-01 | Ibm | Verfahren zum stromlosen aufbringen eines katalytisch wirkenden materials an der oberflaeche eines traegers fuer gedruckte schaltungen |
US4166012A (en) * | 1978-01-03 | 1979-08-28 | Hooker Chemicals & Plastics Corp. | Method of preparation of electrooptical elements |
DE2847298A1 (de) * | 1978-10-27 | 1980-05-08 | Schering Ag | Verfahren zur herstellung von metallmustern auf einem isolierenden traegerstoff |
DE3323476A1 (de) * | 1982-07-01 | 1984-01-05 | Kollmorgen Technologies Corp., 75201 Dallas, Tex. | Verbessertes verfahren zur galvanischen metallabscheidung auf nichtmetallischen oberflaechen |
US4683036A (en) * | 1983-06-10 | 1987-07-28 | Kollmorgen Technologies Corporation | Method for electroplating non-metallic surfaces |
US4652311A (en) * | 1984-05-07 | 1987-03-24 | Shipley Company Inc. | Catalytic metal of reduced particle size |
JPS60258494A (ja) * | 1984-06-01 | 1985-12-20 | Nippon Sanmou Senshoku Kk | 導電性高分子材料 |
US4810333A (en) * | 1987-12-14 | 1989-03-07 | Shipley Company Inc. | Electroplating process |
-
1988
- 1988-02-08 US US07/153,357 patent/US5007990A/en not_active Expired - Lifetime
- 1988-06-21 EP EP88109859A patent/EP0298298B1/fr not_active Expired - Lifetime
- 1988-06-21 DE DE3889155T patent/DE3889155T2/de not_active Expired - Lifetime
- 1988-07-06 CA CA000571292A patent/CA1332817C/fr not_active Expired - Fee Related
- 1988-07-08 BR BR8803437A patent/BR8803437A/pt unknown
- 1988-07-11 JP JP63172495A patent/JP2660002B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE3889155T2 (de) | 1994-08-04 |
EP0298298A2 (fr) | 1989-01-11 |
DE3889155D1 (de) | 1994-05-26 |
BR8803437A (pt) | 1989-01-24 |
US5007990A (en) | 1991-04-16 |
JPS6465292A (en) | 1989-03-10 |
EP0298298A3 (en) | 1989-07-05 |
JP2660002B2 (ja) | 1997-10-08 |
EP0298298B1 (fr) | 1994-04-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MKLA | Lapsed |