CA1280055C - Dispositif de deposition en phase vapeur - Google Patents

Dispositif de deposition en phase vapeur

Info

Publication number
CA1280055C
CA1280055C CA000520110A CA520110A CA1280055C CA 1280055 C CA1280055 C CA 1280055C CA 000520110 A CA000520110 A CA 000520110A CA 520110 A CA520110 A CA 520110A CA 1280055 C CA1280055 C CA 1280055C
Authority
CA
Canada
Prior art keywords
valves
chamber
aperture
gases
inlet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CA000520110A
Other languages
English (en)
Inventor
Ronald Edward Enstrom
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RCA Corp
Original Assignee
RCA Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB858526241A external-priority patent/GB8526241D0/en
Priority claimed from US06/802,744 external-priority patent/US4703718A/en
Application filed by RCA Corp filed Critical RCA Corp
Application granted granted Critical
Publication of CA1280055C publication Critical patent/CA1280055C/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
CA000520110A 1985-10-24 1986-10-08 Dispositif de deposition en phase vapeur Expired - Fee Related CA1280055C (fr)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
GB858526241A GB8526241D0 (en) 1985-10-24 1985-10-24 Inlet chamber for mocvd reactor
GB8526241 1985-10-24
US06/802,744 US4703718A (en) 1985-11-29 1985-11-29 Vapor deposition apparatus and method of using same
US802,744 1985-11-29

Publications (1)

Publication Number Publication Date
CA1280055C true CA1280055C (fr) 1991-02-12

Family

ID=26289926

Family Applications (1)

Application Number Title Priority Date Filing Date
CA000520110A Expired - Fee Related CA1280055C (fr) 1985-10-24 1986-10-08 Dispositif de deposition en phase vapeur

Country Status (2)

Country Link
CA (1) CA1280055C (fr)
GB (1) GB2182061B (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2177119B (en) * 1985-06-26 1989-04-26 Plessey Co Plc Organometallic chemical vapour deposition
KR960015375B1 (ko) * 1994-06-08 1996-11-11 현대전자산업 주식회사 강유전체 박막 제조장치 및 그를 사용한 강유전체 박막 제조방법

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB859688A (en) * 1958-03-11 1961-01-25 Pilkington Brothers Ltd Improvements in or relating to mixing apparatus
US3152932A (en) * 1962-01-29 1964-10-13 Hughes Aircraft Co Reduction in situ of a dipolar molecular gas adhering to a substrate
GB1022477A (en) * 1962-12-14 1966-03-16 Int Rectifier Corp Improvements in or relating to epitaxial deposition of semiconductor devices
US3424661A (en) * 1966-09-01 1969-01-28 Bell Telephone Labor Inc Method of conducting chemical reactions in a glow discharge
US3472689A (en) * 1967-01-19 1969-10-14 Rca Corp Vapor deposition of silicon-nitrogen insulating coatings
US3887726A (en) * 1973-06-29 1975-06-03 Ibm Method of chemical vapor deposition to provide silicon dioxide films with reduced surface state charge on semiconductor substrates
GB1601699A (en) * 1977-11-03 1981-11-04 Gen Eng Radcliffe Method and apparatus for dispersing a liquid additive throughout a plastics material
CA1245109A (fr) * 1983-10-31 1988-11-22 Hsien-Kun Chu Obtention de pellicules d'halogenosilanes polymeriques amorphes; produits qui en sont derives

Also Published As

Publication number Publication date
GB8625410D0 (en) 1986-11-26
GB2182061B (en) 1990-02-21
GB2182061A (en) 1987-05-07

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Legal Events

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