CA1215480A - Method of manufacturing a high-voltage bipolar transistor - Google Patents

Method of manufacturing a high-voltage bipolar transistor

Info

Publication number
CA1215480A
CA1215480A CA000450844A CA450844A CA1215480A CA 1215480 A CA1215480 A CA 1215480A CA 000450844 A CA000450844 A CA 000450844A CA 450844 A CA450844 A CA 450844A CA 1215480 A CA1215480 A CA 1215480A
Authority
CA
Canada
Prior art keywords
epitaxial layer
layer
separation walls
isolating
conductivity type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA000450844A
Other languages
English (en)
French (fr)
Inventor
Bernard Vertongen
Jean L. Vite
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Application granted granted Critical
Publication of CA1215480A publication Critical patent/CA1215480A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/74Making of localized buried regions, e.g. buried collector layers, internal connections substrate contacts
    • H01L21/743Making of internal connections, substrate contacts
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76Making of isolation regions between components
    • H01L21/761PN junctions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D10/00Bipolar junction transistors [BJT]
    • H10D10/40Vertical BJTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/60Impurity distributions or concentrations
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/60Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
    • H10D84/67Complementary BJTs
    • H10D84/673Vertical complementary BJTs

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Element Separation (AREA)
  • Bipolar Transistors (AREA)
CA000450844A 1983-03-30 1984-03-29 Method of manufacturing a high-voltage bipolar transistor Expired CA1215480A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR8305246A FR2543739B1 (fr) 1983-03-30 1983-03-30 Procede de realisation d'un transistor bipolaire haute tension
FR8305246 1983-03-30

Publications (1)

Publication Number Publication Date
CA1215480A true CA1215480A (en) 1986-12-16

Family

ID=9287390

Family Applications (1)

Application Number Title Priority Date Filing Date
CA000450844A Expired CA1215480A (en) 1983-03-30 1984-03-29 Method of manufacturing a high-voltage bipolar transistor

Country Status (5)

Country Link
EP (1) EP0126499B1 (enrdf_load_stackoverflow)
JP (1) JPS59182565A (enrdf_load_stackoverflow)
CA (1) CA1215480A (enrdf_load_stackoverflow)
DE (1) DE3468781D1 (enrdf_load_stackoverflow)
FR (1) FR2543739B1 (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8500218A (nl) * 1985-01-28 1986-08-18 Philips Nv Halfgeleiderinrichting met tweedimensionaal ladingsdragergas.
US5023194A (en) * 1988-02-11 1991-06-11 Exar Corporation Method of making a multicollector vertical pnp transistor
DE69331052T2 (de) * 1993-07-01 2002-06-06 Consorzio Per La Ricerca Sulla Microelettronica Nel Mezzogiorno, Catania Integrierte Randstruktur für Hochspannung-Halbleiteranordnungen und dazugehöriger Herstellungsprozess
GB0119215D0 (en) 2001-08-07 2001-09-26 Koninkl Philips Electronics Nv Trench bipolar transistor
JP2003078032A (ja) * 2001-09-05 2003-03-14 Mitsubishi Electric Corp 半導体装置およびその製造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50278B1 (enrdf_load_stackoverflow) * 1970-07-16 1975-01-07
JPS5724659B2 (enrdf_load_stackoverflow) * 1974-10-31 1982-05-25
JPS5247319A (en) * 1975-10-13 1977-04-15 Victor Co Of Japan Ltd Recording/reproducing system of color video signal
JPS59978B2 (ja) * 1976-04-22 1984-01-10 ソニー株式会社 半導体集積回路の製造方法
CA1131801A (en) * 1978-01-18 1982-09-14 Johannes A. Appels Semiconductor device
JPS55132068A (en) * 1979-03-30 1980-10-14 Ibm Pnp bipolar transistor
DE3215652A1 (de) * 1982-04-27 1983-10-27 Siemens AG, 1000 Berlin und 8000 München Integrierbarer bipolarer transistor

Also Published As

Publication number Publication date
JPS59182565A (ja) 1984-10-17
FR2543739A1 (fr) 1984-10-05
JPH0523054B2 (enrdf_load_stackoverflow) 1993-03-31
EP0126499B1 (fr) 1988-01-13
FR2543739B1 (fr) 1986-04-18
EP0126499A1 (fr) 1984-11-28
DE3468781D1 (en) 1988-02-18

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Legal Events

Date Code Title Description
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