CA1093589A - Si.sub.3n.sub.4 formed by nitridation of sintered silicon compact - Google Patents
Si.sub.3n.sub.4 formed by nitridation of sintered silicon compactInfo
- Publication number
- CA1093589A CA1093589A CA269,251A CA269251A CA1093589A CA 1093589 A CA1093589 A CA 1093589A CA 269251 A CA269251 A CA 269251A CA 1093589 A CA1093589 A CA 1093589A
- Authority
- CA
- Canada
- Prior art keywords
- silicon
- silicon nitride
- ranging
- density
- sintered
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 153
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 114
- 239000010703 silicon Substances 0.000 title claims abstract description 114
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims abstract description 84
- 229910052581 Si3N4 Inorganic materials 0.000 claims abstract description 63
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 55
- 239000011148 porous material Substances 0.000 claims abstract description 41
- 239000011863 silicon-based powder Substances 0.000 claims abstract description 39
- 238000005245 sintering Methods 0.000 claims abstract description 39
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims abstract description 32
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 24
- 238000007493 shaping process Methods 0.000 claims abstract description 7
- 238000000034 method Methods 0.000 claims description 23
- 239000002245 particle Substances 0.000 claims description 21
- 238000002844 melting Methods 0.000 claims description 16
- 230000008018 melting Effects 0.000 claims description 16
- 239000012298 atmosphere Substances 0.000 claims description 14
- 238000005121 nitriding Methods 0.000 claims description 14
- 239000007790 solid phase Substances 0.000 claims description 13
- 230000008569 process Effects 0.000 claims description 12
- 239000000203 mixture Substances 0.000 claims description 10
- 239000012299 nitrogen atmosphere Substances 0.000 claims description 6
- 238000006243 chemical reaction Methods 0.000 description 22
- 239000000843 powder Substances 0.000 description 16
- 239000012071 phase Substances 0.000 description 15
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 14
- 150000004767 nitrides Chemical class 0.000 description 12
- 229910052786 argon Inorganic materials 0.000 description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 7
- 229910001873 dinitrogen Inorganic materials 0.000 description 7
- 239000001301 oxygen Substances 0.000 description 7
- 229910052760 oxygen Inorganic materials 0.000 description 7
- 239000007789 gas Substances 0.000 description 6
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 5
- 239000012535 impurity Substances 0.000 description 5
- 238000002441 X-ray diffraction Methods 0.000 description 4
- 238000000354 decomposition reaction Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229910000077 silane Inorganic materials 0.000 description 4
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 229910052796 boron Inorganic materials 0.000 description 3
- 229910021419 crystalline silicon Inorganic materials 0.000 description 3
- 238000000280 densification Methods 0.000 description 3
- 230000002542 deteriorative effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000035515 penetration Effects 0.000 description 3
- 241000894007 species Species 0.000 description 3
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000005755 formation reaction Methods 0.000 description 2
- 239000008246 gaseous mixture Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 238000002386 leaching Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 2
- 239000005049 silicon tetrachloride Substances 0.000 description 2
- 239000002210 silicon-based material Substances 0.000 description 2
- 239000011856 silicon-based particle Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 2
- 239000005052 trichlorosilane Substances 0.000 description 2
- 241000490229 Eucephalus Species 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 241000357437 Mola Species 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical class O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 241000519995 Stachys sylvatica Species 0.000 description 1
- 101100162169 Xenopus laevis adrm1-a gene Proteins 0.000 description 1
- 229910017878 a-Si3N4 Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- QZPSXPBJTPJTSZ-UHFFFAOYSA-N aqua regia Chemical compound Cl.O[N+]([O-])=O QZPSXPBJTPJTSZ-UHFFFAOYSA-N 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 238000005056 compaction Methods 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002939 deleterious effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- BUMGIEFFCMBQDG-UHFFFAOYSA-N dichlorosilicon Chemical compound Cl[Si]Cl BUMGIEFFCMBQDG-UHFFFAOYSA-N 0.000 description 1
- 238000004455 differential thermal analysis Methods 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000005088 metallography Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000012120 mounting media Substances 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 239000000615 nonconductor Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000009700 powder processing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000004626 scanning electron microscopy Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000000779 smoke Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000029305 taxis Effects 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
- C04B35/58—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides
- C04B35/584—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on silicon nitride
- C04B35/591—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on silicon nitride obtained by reaction sintering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Structural Engineering (AREA)
- Organic Chemistry (AREA)
- Ceramic Products (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US64676476A | 1976-01-06 | 1976-01-06 | |
| US646,764 | 1976-01-06 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1093589A true CA1093589A (en) | 1981-01-13 |
Family
ID=24594371
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA269,251A Expired CA1093589A (en) | 1976-01-06 | 1977-01-06 | Si.sub.3n.sub.4 formed by nitridation of sintered silicon compact |
Country Status (8)
| Country | Link |
|---|---|
| JP (1) | JPS52121613A (OSRAM) |
| BE (1) | BE850106A (OSRAM) |
| CA (1) | CA1093589A (OSRAM) |
| DE (1) | DE2700208A1 (OSRAM) |
| FR (1) | FR2337702A1 (OSRAM) |
| GB (1) | GB1546928A (OSRAM) |
| NL (1) | NL7700044A (OSRAM) |
| NO (1) | NO145432C (OSRAM) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2854208C2 (de) * | 1978-12-15 | 1980-09-18 | Mtu Motoren- Und Turbinen-Union Muenchen Gmbh, 8000 Muenchen | Verfahren zum'Nitrieren von Siliziumkörpern |
| SE438849B (sv) * | 1981-05-25 | 1985-05-13 | Svenska Silikatforskning | Forfarande vid framstellning av formkroppar av kiselnitridbaserade material |
| CH654564A5 (en) * | 1983-09-14 | 1986-02-28 | Ver Drahtwerke Ag | Process for making a shaped object from nitride of elements selected from groups III, IV, V or VI of the Periodic Table, in particular from silicon nitride |
| DE3337025A1 (de) * | 1983-10-12 | 1985-05-02 | Feldmühle AG, 4000 Düsseldorf | Verfahren zur herstellung eines siliziumnitridbauteils |
| DE3514284A1 (de) * | 1985-04-19 | 1986-10-23 | Elektroschmelzwerk Kempten GmbH, 8000 München | Verfahren zur herstellung von formkoerpern aus reaktionsgebundenem siliciumnitrid durch nitridierung unter hohem stickstoffgasdruck |
| US5275985A (en) * | 1987-10-22 | 1994-01-04 | Cooper Industries, Inc. | Production of a sintered reaction bonded silicon nitride insulator |
| DE58905468D1 (de) * | 1989-01-04 | 1993-10-07 | Htm Ag | Verfahren zur Herstellung von Siliziumnitrid-Formkörpern. |
| DE4102628A1 (de) * | 1991-01-30 | 1992-08-06 | Bayer Ag | Verfahren zur herstellung eines werkstoffes auf si(pfeil abwaerts)3(pfeil abwaerts)n(pfeil abwaerts)4(pfeil abwaerts)-basis, so hergestellte werkstoffe sowie deren verwendung |
| JP4574044B2 (ja) * | 2001-03-26 | 2010-11-04 | 日本碍子株式会社 | 窒化珪素多孔体及びその製造方法 |
| JP4473463B2 (ja) | 2001-03-26 | 2010-06-02 | 日本碍子株式会社 | 窒化珪素多孔体及びその製造方法 |
| EP1498400A3 (en) | 2003-07-17 | 2006-06-07 | Asahi Glass Co., Ltd. | Method for producing a silicon nitride filter |
| CN100343198C (zh) | 2003-07-29 | 2007-10-17 | 旭硝子株式会社 | 氮化硅质蜂窝式过滤器及其制造方法 |
| CN105503200A (zh) * | 2016-01-12 | 2016-04-20 | 中钢集团洛阳耐火材料研究院有限公司 | 一种氮化硅纤维过滤材料的制备方法 |
| JP7143960B1 (ja) * | 2022-02-25 | 2022-09-29 | 日立金属株式会社 | 窒化珪素基板およびその製造方法 |
| JP7760934B2 (ja) * | 2022-02-25 | 2025-10-28 | 株式会社プロテリアル | 窒化珪素基板およびその製造方法 |
| JP7188633B1 (ja) * | 2022-03-11 | 2022-12-13 | 日立金属株式会社 | 窒化珪素基板およびその製造方法 |
-
1976
- 1976-09-28 GB GB40230/76A patent/GB1546928A/en not_active Expired
- 1976-12-29 FR FR7639365A patent/FR2337702A1/fr active Granted
-
1977
- 1977-01-04 NL NL7700044A patent/NL7700044A/xx not_active Application Discontinuation
- 1977-01-05 BE BE173853A patent/BE850106A/xx not_active IP Right Cessation
- 1977-01-05 DE DE19772700208 patent/DE2700208A1/de not_active Withdrawn
- 1977-01-05 NO NO770025A patent/NO145432C/no unknown
- 1977-01-06 JP JP25077A patent/JPS52121613A/ja active Pending
- 1977-01-06 CA CA269,251A patent/CA1093589A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS52121613A (en) | 1977-10-13 |
| FR2337702B1 (OSRAM) | 1982-05-14 |
| NO145432B (no) | 1981-12-14 |
| NL7700044A (nl) | 1977-07-08 |
| NO770025L (no) | 1977-07-07 |
| DE2700208A1 (de) | 1977-07-14 |
| GB1546928A (en) | 1979-05-31 |
| NO145432C (no) | 1982-03-24 |
| FR2337702A1 (fr) | 1977-08-05 |
| BE850106A (fr) | 1977-07-05 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MKEX | Expiry |