CA1059683A - Photopolymerizable resin composition for original plate - Google Patents

Photopolymerizable resin composition for original plate

Info

Publication number
CA1059683A
CA1059683A CA227,841A CA227841A CA1059683A CA 1059683 A CA1059683 A CA 1059683A CA 227841 A CA227841 A CA 227841A CA 1059683 A CA1059683 A CA 1059683A
Authority
CA
Canada
Prior art keywords
resin composition
weight
photopolymerizable resin
glycol
component
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA227,841A
Other languages
English (en)
French (fr)
Other versions
CA227841S (en
Inventor
Takezo Sano
Tadanori Inoue
Yukikazu Uemura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Application granted granted Critical
Publication of CA1059683A publication Critical patent/CA1059683A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/66—Polyesters containing oxygen in the form of ether groups
    • C08G63/668—Polyesters containing oxygen in the form of ether groups derived from polycarboxylic acids and polyhydroxy compounds
    • C08G63/676—Polyesters containing oxygen in the form of ether groups derived from polycarboxylic acids and polyhydroxy compounds in which at least one of the two components contains aliphatic unsaturation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/04—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyesters
    • C08F299/0407—Processes of polymerisation
    • C08F299/0421—Polymerisation initiated by wave energy or particle radiation
    • C08F299/0428—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F299/0435—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Polyesters Or Polycarbonates (AREA)
CA227,841A 1974-06-06 1975-05-27 Photopolymerizable resin composition for original plate Expired CA1059683A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6469874A JPS5242084B2 (OSRAM) 1974-06-06 1974-06-06

Publications (1)

Publication Number Publication Date
CA1059683A true CA1059683A (en) 1979-07-31

Family

ID=13265618

Family Applications (1)

Application Number Title Priority Date Filing Date
CA227,841A Expired CA1059683A (en) 1974-06-06 1975-05-27 Photopolymerizable resin composition for original plate

Country Status (8)

Country Link
JP (1) JPS5242084B2 (OSRAM)
CA (1) CA1059683A (OSRAM)
DE (1) DE2525297A1 (OSRAM)
FR (1) FR2273827A1 (OSRAM)
GB (1) GB1500607A (OSRAM)
IT (1) IT1036182B (OSRAM)
NL (1) NL7506773A (OSRAM)
SU (1) SU917712A3 (OSRAM)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6099123A (en) * 1997-09-04 2000-08-08 Signet Armorlite, Inc. Production of photopolymerized polyester high index ophthalmic lenses

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5176381A (ja) * 1974-12-27 1976-07-01 Toyo Boseki Taishokuseifuhowahoriesuterujushi
CA1069638A (en) * 1976-05-14 1980-01-08 Earl E. Parker Low smoke density fire-retardant unsaturated aliphatic polyester resins containing alumina hydrate
JPS58182631A (ja) * 1982-04-20 1983-10-25 Nippon Synthetic Chem Ind Co Ltd:The 画像形成用組成物
CA2244324A1 (en) * 1997-08-04 1999-02-04 Hsm Holographic Systems Munchen Gmbh A method and an apparatus for fabricating a surface structure, particularly a holographic surface structure, on a substrate
US20170297106A1 (en) 2016-04-14 2017-10-19 Desktop Metal, Inc. System for fabricating an interface layer to separate binder jetted objects from support structures

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6099123A (en) * 1997-09-04 2000-08-08 Signet Armorlite, Inc. Production of photopolymerized polyester high index ophthalmic lenses

Also Published As

Publication number Publication date
NL7506773A (nl) 1975-12-09
IT1036182B (it) 1979-10-30
JPS50155303A (OSRAM) 1975-12-15
FR2273827A1 (fr) 1976-01-02
JPS5242084B2 (OSRAM) 1977-10-22
FR2273827B1 (OSRAM) 1979-01-05
GB1500607A (en) 1978-02-08
SU917712A3 (ru) 1982-03-30
DE2525297A1 (de) 1975-12-18

Similar Documents

Publication Publication Date Title
US4023973A (en) Photosensitive composition using maleic anhydride adduct of a 1,2 polybutadiene
US4442302A (en) Photopolymer compositions for printing plates
US3794494A (en) Photosensitive compositions for relief structures
EP0081964B1 (en) Photosensitive polymer composition
US3858510A (en) Relief structures prepared from photosensitive compositions
JPS63229451A (ja) 高められた可撓性を有する感光性記録材料
US5773518A (en) Esterified styrene/maleic anhydride polymer
US4042386A (en) Photosensitive compositions
EP0162570B1 (en) A conjugated diene copolymer, a process for producing the copolymer, and a photosensitive composition comprising the copolymer
JP2792890B2 (ja) 感光性、光重合可能の印刷板
US3149975A (en) Photopolymerizable compositions and elements
CA1059683A (en) Photopolymerizable resin composition for original plate
CA2166177C (en) Polymers and use in photoimageable compositions
CA1255412A (en) Photosensitive resin composition
US2892716A (en) Photopolymerizable composition comprising an unsaturated vinyl polymer and a sheet support coated therewith
US4247621A (en) Original pattern plate obtained by use of photo-sensitive resin composition
US3202513A (en) Photopolymerizable compositions containing stannous salts of acids and elements produced therefrom
US4340686A (en) Carbamated poly(vinyl alcohol) useful as a binder in elastomeric photopolymer compositions
US4643963A (en) Photopolymerizable recording materials containing cyclic pentadienes for the production of printing plates, and the production of printing plates using these recording materials
EP0295944A2 (en) Photosensitive resin composition and printing plate prepared therefrom
JP2002023349A (ja) 感光性樹脂凸版材
JPS6195349A (ja) 感光性樹脂組成物
US4518677A (en) Process for making printing plates
US5034306A (en) Photocurable elastomeric mixture and recording material, obtained therefrom, for the production of relief printing plates
CA2081426A1 (en) Photosensitive elastomer polymer composition for flexographic printing plates processible in aqueous solutions