CA1020798A - Photosensitive element with integral support - Google Patents

Photosensitive element with integral support

Info

Publication number
CA1020798A
CA1020798A CA189,794A CA189794A CA1020798A CA 1020798 A CA1020798 A CA 1020798A CA 189794 A CA189794 A CA 189794A CA 1020798 A CA1020798 A CA 1020798A
Authority
CA
Canada
Prior art keywords
photosensitive element
integral support
integral
support
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA189,794A
Other languages
English (en)
Other versions
CA189794S (en
Inventor
Robert B. Heiart
John T. Freeman
Ernst Leberzammer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Application granted granted Critical
Publication of CA1020798A publication Critical patent/CA1020798A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C70/00—Shaping composites, i.e. plastics material comprising reinforcements, fillers or preformed parts, e.g. inserts
    • B29C70/04—Shaping composites, i.e. plastics material comprising reinforcements, fillers or preformed parts, e.g. inserts comprising reinforcements only, e.g. self-reinforcing plastics
    • B29C70/28—Shaping operations therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C3/00—Reproduction or duplicating of printing formes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Composite Materials (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
CA189,794A 1973-01-11 1974-01-09 Photosensitive element with integral support Expired CA1020798A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US322902A US3865589A (en) 1973-01-11 1973-01-11 Photohardenable layer with integral support of fabric or mesh

Publications (1)

Publication Number Publication Date
CA1020798A true CA1020798A (en) 1977-11-15

Family

ID=23256939

Family Applications (1)

Application Number Title Priority Date Filing Date
CA189,794A Expired CA1020798A (en) 1973-01-11 1974-01-09 Photosensitive element with integral support

Country Status (8)

Country Link
US (1) US3865589A (fr)
JP (1) JPS49109106A (fr)
CA (1) CA1020798A (fr)
DE (1) DE2400781C3 (fr)
FR (1) FR2214136B1 (fr)
GB (1) GB1414103A (fr)
IT (1) IT1003358B (fr)
NL (1) NL168629C (fr)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4142464A (en) * 1976-11-15 1979-03-06 Georg Rauch Screen printing and stencil articles, apparatus and methods
JPS5511266A (en) * 1978-07-12 1980-01-26 Sumitomo Chem Co Ltd Production of photo molding material for making stencil
NL8003895A (nl) * 1980-07-04 1982-02-01 Stork Screens Bv Huls voor een drukcilinder alsmede werkwijze en inrichting voor het vervaardigen van een dergelijke huls.
AU560406B2 (en) * 1983-08-31 1987-04-02 Indagraf S.A. Manufacture of relief printing plates
GB2194642B (en) * 1986-08-30 1990-09-12 Donald Fort Sullivan Photoprinting patterns of polymerized photopolymer layers. i
US5260173A (en) * 1990-04-19 1993-11-09 Birkholm James G Process for laminated electromagnetic radiation imaged polymerized material with a integral membrane
US5015556A (en) * 1990-07-26 1991-05-14 Minnesota Mining And Manufacturing Company Flexographic printing plate process
NL9400057A (nl) * 1994-01-13 1995-08-01 J M J Houtstra Holding B V Bevestigingsmiddel.
US6085653A (en) * 1995-01-13 2000-07-11 Winkle Holding, B.V. Method for producing printed matter and printing form attachment means for use in the method
JPH09193249A (ja) * 1995-08-15 1997-07-29 Dainippon Ink & Chem Inc ディスクの貼り合わせ方法及び装置
CN2907504Y (zh) * 2006-05-15 2007-06-06 毛昱峰 慢炖锅覆膜外壳
US7798063B2 (en) * 2006-11-13 2010-09-21 Esko-Graphics Imaging Gmbh Reducing back-reflection during ablative imaging

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL87862C (fr) * 1951-08-20
US2848327A (en) * 1953-02-19 1958-08-19 Screen Engineering Co Glass fabric resin impregnated base coated with a light sensitive layer
BE601856A (fr) * 1960-04-28

Also Published As

Publication number Publication date
FR2214136B1 (fr) 1981-04-10
DE2400781B2 (de) 1979-02-01
US3865589A (en) 1975-02-11
DE2400781A1 (de) 1974-07-18
FR2214136A1 (fr) 1974-08-09
DE2400781C3 (de) 1979-10-04
JPS49109106A (fr) 1974-10-17
NL168629C (nl) 1982-04-16
NL168629B (nl) 1981-11-16
IT1003358B (it) 1976-06-10
GB1414103A (en) 1975-11-19
NL7400339A (fr) 1974-07-15

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