CA1012820A - Photographic materials having reduced static chargeability and method for their production - Google Patents

Photographic materials having reduced static chargeability and method for their production

Info

Publication number
CA1012820A
CA1012820A CA177,054A CA177054A CA1012820A CA 1012820 A CA1012820 A CA 1012820A CA 177054 A CA177054 A CA 177054A CA 1012820 A CA1012820 A CA 1012820A
Authority
CA
Canada
Prior art keywords
production
photographic materials
reduced static
static chargeability
chargeability
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA177,054A
Other languages
English (en)
Inventor
Elio Cavallo
Fulvio Furlan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Application granted granted Critical
Publication of CA1012820A publication Critical patent/CA1012820A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/85—Photosensitive materials characterised by the base or auxiliary layers characterised by antistatic additives or coatings

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Lubricants (AREA)
CA177,054A 1972-07-24 1973-07-23 Photographic materials having reduced static chargeability and method for their production Expired CA1012820A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT51726/72A IT966734B (it) 1972-07-24 1972-07-24 Metodo per ridurre la caricabilita statica di strati fotografici e di elementi fotografici strati fotografici ed elementi fotografici ottenuti con tale metodo

Publications (1)

Publication Number Publication Date
CA1012820A true CA1012820A (en) 1977-06-28

Family

ID=11275635

Family Applications (1)

Application Number Title Priority Date Filing Date
CA177,054A Expired CA1012820A (en) 1972-07-24 1973-07-23 Photographic materials having reduced static chargeability and method for their production

Country Status (9)

Country Link
US (1) US3884699A (es)
JP (1) JPS5239291B2 (es)
AR (1) AR200731A1 (es)
BE (1) BE802671A (es)
CA (1) CA1012820A (es)
DE (1) DE2337638C2 (es)
FR (1) FR2193993B1 (es)
GB (1) GB1445407A (es)
IT (1) IT966734B (es)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS589408B2 (ja) * 1974-02-13 1983-02-21 富士写真フイルム株式会社 写真感光材料
JPS5729691B2 (es) * 1975-03-15 1982-06-24
JPS5810738B2 (ja) * 1975-05-02 1983-02-26 富士写真フイルム株式会社 油溶性写真用添加剤をゼラチン水溶液中に分散する方法
JPS5479366A (en) * 1977-12-07 1979-06-25 Patsukusu Kk Lubricant for record disc* magnetic tape and photographic film
US4175969A (en) * 1978-03-17 1979-11-27 Gaf Corporation Antistatic photographic X-ray film having a uniform protective surface coating of surfactant oligomer of tetrafluoroethylene
IT1116858B (it) * 1978-05-15 1986-02-10 Minnesota Mining & Mfg Procedimento per la preparazione di derivati isopropilenici e prodotto ottenuto
JPS6018977B2 (ja) * 1978-06-02 1985-05-14 富士写真フイルム株式会社 写真感光材料
JPS5836894B2 (ja) * 1978-07-03 1983-08-12 富士写真フイルム株式会社 写真感光材料
US4335201A (en) * 1980-11-24 1982-06-15 Eastman Kodak Company Antistatic compositions and elements containing same
JPS58200235A (ja) * 1982-05-18 1983-11-21 Fuji Photo Film Co Ltd ハロゲン化銀写真感光材料
IT1199806B (it) * 1986-12-18 1989-01-05 Minnesota Mining & Mfg Processo per la formazione di immagini fotografiche a colori stabili
IT1228436B (it) * 1987-07-24 1991-06-17 Minnesota Mining & Mfg Materiali fotografici agli alogenuri d'argento sensibili alla luce
US4806571A (en) * 1988-05-06 1989-02-21 The Dow Chemical Company Organic composition containing a fluoroalkyl sulfonic acid salt
IT1227930B (it) * 1988-11-25 1991-05-14 Minnesota Mining & Mfg Materiali fotografici agli alogenuri d'argento sensibili alla luce.
US5300394A (en) * 1992-12-16 1994-04-05 Eastman Kodak Company Dispersions for imaging systems
GB9319790D0 (en) * 1993-09-24 1993-11-10 Kodak Ltd Antistatic composition
US6171707B1 (en) * 1994-01-18 2001-01-09 3M Innovative Properties Company Polymeric film base having a coating layer of organic solvent based polymer with a fluorinated antistatic agent
US5411844A (en) * 1994-03-31 1995-05-02 Eastman Kodak Company Photographic element and coating composition therefor
US5418128A (en) * 1994-03-31 1995-05-23 Eastman Kodak Company Photographic element and coating composition therefor
EP0693709A1 (en) * 1994-07-18 1996-01-24 Minnesota Mining And Manufacturing Company Fluoropolymers and fluorochemical surface active agents for improving the antistatic behaviour of materials and light sensitive material having improved antistatic behaviour
GB2299680B (en) * 1995-04-05 1998-10-28 Kodak Ltd Photographic material
US5576074A (en) * 1995-08-23 1996-11-19 Minnesota Mining And Manufacturing Company Laser write process for making a conductive metal circuit
US6699648B2 (en) 2002-03-27 2004-03-02 Eastman Kodak Company Modified antistatic compositions and thermally developable materials containing same
US6762013B2 (en) 2002-10-04 2004-07-13 Eastman Kodak Company Thermally developable materials containing fluorochemical conductive layers
CN102489216B (zh) * 2011-12-06 2014-01-22 华中师范大学 两性含氟离子型表面活性剂的制备方法与应用

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US366478A (en) * 1887-07-12 Bake-pan
US2420611A (en) * 1945-12-14 1947-05-13 Gen Aniline & Film Corp Antistatic photographic film
DE1547721A1 (de) * 1965-08-16 1969-12-18 Eastman Kodak Co Verwendung von Sulfobetainen als Beschichtungshilfsmittel bei der Herstellung photographischer Schichten
US3489567A (en) * 1967-03-03 1970-01-13 Eastman Kodak Co Lubricating compositions and photographic elements having lubricated surface
US3573049A (en) * 1967-10-02 1971-03-30 Eastman Kodak Co Photographic materials and processes for developing photographic compositions having a zwitterionic and anionic elements
US3589906A (en) * 1968-10-16 1971-06-29 Du Pont Photographic layers containing perfluoro compounds and coating thereof
GB1293189A (en) * 1970-06-04 1972-10-18 Agfa Gevaert Photographic silver halide element
BE789556A (fr) * 1971-10-01 1973-03-29 Union Carbide Corp Element alcain de pile au zinc
US3775126A (en) * 1972-02-29 1973-11-27 Eastman Kodak Co Light-sensitive element comprising a coating layer containing a mixture of a cationic perfluorinated alkyl and an alkylphenoxypoly(propylene oxide)
JPS48101118A (es) * 1972-02-29 1973-12-20

Also Published As

Publication number Publication date
GB1445407A (en) 1976-08-11
JPS5239291B2 (es) 1977-10-04
DE2337638A1 (de) 1974-02-21
FR2193993A1 (es) 1974-02-22
IT966734B (it) 1974-02-20
JPS49133023A (es) 1974-12-20
US3884699A (en) 1975-05-20
BE802671A (fr) 1974-01-23
AR200731A1 (es) 1974-12-13
FR2193993B1 (es) 1979-08-03
DE2337638C2 (de) 1983-11-03

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