CA1003260A - Photopolymerisable compositions and their uses - Google Patents

Photopolymerisable compositions and their uses

Info

Publication number
CA1003260A
CA1003260A CA177,240A CA177240A CA1003260A CA 1003260 A CA1003260 A CA 1003260A CA 177240 A CA177240 A CA 177240A CA 1003260 A CA1003260 A CA 1003260A
Authority
CA
Canada
Prior art keywords
photopolymerisable compositions
photopolymerisable
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA177,240A
Other languages
English (en)
Other versions
CA177240S (en
Inventor
John P. Murphy
Peter P. De Moira
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ozalid Co Ltd
Original Assignee
Ozalid Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ozalid Co Ltd filed Critical Ozalid Co Ltd
Application granted granted Critical
Publication of CA1003260A publication Critical patent/CA1003260A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/28—Processing photosensitive materials; Apparatus therefor for obtaining powder images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Epoxy Compounds (AREA)
  • Epoxy Resins (AREA)
CA177,240A 1972-08-02 1973-07-24 Photopolymerisable compositions and their uses Expired CA1003260A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB3598372A GB1376840A (en) 1972-08-02 1972-08-02 Photosensitive compositions and their uses

Publications (1)

Publication Number Publication Date
CA1003260A true CA1003260A (en) 1977-01-11

Family

ID=10383683

Family Applications (1)

Application Number Title Priority Date Filing Date
CA177,240A Expired CA1003260A (en) 1972-08-02 1973-07-24 Photopolymerisable compositions and their uses

Country Status (12)

Country Link
US (1) US3930856A (fr)
AU (1) AU465209B2 (fr)
BE (1) BE803119A (fr)
CA (1) CA1003260A (fr)
DE (1) DE2339035C3 (fr)
FR (1) FR2194984A1 (fr)
GB (1) GB1376840A (fr)
IT (1) IT990050B (fr)
NL (1) NL7310707A (fr)
NO (1) NO139874C (fr)
SE (1) SE398677B (fr)
ZA (1) ZA735028B (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2452729A1 (fr) * 1979-03-28 1980-10-24 Rhone Poulenc Syst Article pour la realisation d'auxiliaires visuels tels que films de montage pour l'impression phonographique
FR2452731A1 (fr) * 1979-03-28 1980-10-24 Rhone Poulenc Syst Compositions photopolymerisables filmogenes developpables a l'eau
FR2475753B1 (fr) * 1980-02-11 1987-03-20 Rhone Poulenc Syst Plaque lithographique a base de fluoborate de paradiazodiphenylamine et de resine epoxy liquide
US4771005A (en) * 1983-06-27 1988-09-13 Erez Forensic Technology Ltd. Reagents, test kits and methods for the detection of cannabinoids

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL270834A (fr) * 1960-10-31
DE1251036B (de) * 1961-05-12 1967-09-28 General Aniline &. Film Corpora tion New York, N Y (V St A) Verfahren zur Herstellung von Formkorpern
US3155513A (en) * 1961-10-30 1964-11-03 Minnesota Mining & Mfg Heat sensitive sheet material and method of making
US3205157A (en) * 1962-03-13 1965-09-07 North American Aviation Inc Electromagnetic radiation polymerization
SE335474B (fr) * 1963-04-18 1971-05-24 R Landau
DE1447016C3 (de) * 1963-10-25 1973-11-15 Kalle Ag, 6202 Wiesbaden-Biebrich Vorsensibilisierte Druckplatte
US3433769A (en) * 1965-11-12 1969-03-18 Us Air Force Curing system for ethoxyline resins consisting of a solution of phosphomolybdic acid and a hydroxy phosphate ester
US3585034A (en) * 1967-04-03 1971-06-15 Gaf Corp Manufacture of phosphor screens
US3703496A (en) * 1967-10-20 1972-11-21 Hooker Chemical Corp Hydrolytic stabilizer of phosphite esters and use as epoxy resin stabilizer
US3708296A (en) * 1968-08-20 1973-01-02 American Can Co Photopolymerization of epoxy monomers
US3711390A (en) * 1971-05-18 1973-01-16 J Feinberg Photopolymerizable epoxy systems containing substituted cyclic amides or substituted ureas as gelation inhibitors

Also Published As

Publication number Publication date
NO139874B (no) 1979-02-12
NL7310707A (fr) 1974-02-05
NO139874C (no) 1979-05-23
SE398677B (sv) 1978-01-09
ZA735028B (en) 1974-06-26
IT990050B (it) 1975-06-20
AU5860973A (en) 1975-01-30
DE2339035C3 (de) 1980-01-31
AU465209B2 (en) 1975-09-18
BE803119A (fr) 1973-12-03
DE2339035A1 (de) 1974-02-14
FR2194984A1 (fr) 1974-03-01
DE2339035B2 (de) 1979-05-17
GB1376840A (en) 1974-12-11
US3930856A (en) 1976-01-06

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