BR9806665A - Processo sintético, composição fotocurável, e, elemento fotocurável - Google Patents
Processo sintético, composição fotocurável, e, elemento fotocurávelInfo
- Publication number
- BR9806665A BR9806665A BR9806665-0A BR9806665A BR9806665A BR 9806665 A BR9806665 A BR 9806665A BR 9806665 A BR9806665 A BR 9806665A BR 9806665 A BR9806665 A BR 9806665A
- Authority
- BR
- Brazil
- Prior art keywords
- photocurable
- synthetic process
- compositions
- composition
- photocurable composition
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/111—Polymer of unsaturated acid or ester
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Graft Or Block Polymers (AREA)
- Polymerisation Methods In General (AREA)
Abstract
"PROCESSO SINTéTICO, COMPOSIçãO FOTOCURáVEL, E, ELEMENTO FOTOCURáVEL". São proporcionadas composições fotocuráveis de revelação aquosa. As composições podem ser formadas de um polímero látex e uma borracha, e são dispersíveis em água. As composições são úteis na formação de chapas flexográficas para impressão.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/902,644 US5902714A (en) | 1997-07-30 | 1997-07-30 | Latex-based, aqueous developable photopolymers and use thereof in printing plates |
Publications (1)
Publication Number | Publication Date |
---|---|
BR9806665A true BR9806665A (pt) | 2001-09-18 |
Family
ID=25416162
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR9806665-0A BR9806665A (pt) | 1997-07-30 | 1999-07-28 | Processo sintético, composição fotocurável, e, elemento fotocurável |
Country Status (8)
Country | Link |
---|---|
US (1) | US5902714A (pt) |
EP (1) | EP1000384A4 (pt) |
JP (1) | JP2001512180A (pt) |
AR (1) | AR015414A1 (pt) |
AU (1) | AU740497B2 (pt) |
BR (1) | BR9806665A (pt) |
CA (1) | CA2285945A1 (pt) |
WO (1) | WO1999006886A1 (pt) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7144700B1 (en) * | 1999-07-23 | 2006-12-05 | Affymetrix, Inc. | Photolithographic solid-phase polymer synthesis |
AU2002224117B2 (en) | 2000-11-28 | 2005-01-27 | Asahi Kasei Chemicals Corporation | Improved water-developable photosensitive resin for flexography |
US6881533B2 (en) * | 2003-02-18 | 2005-04-19 | Kodak Polychrome Graphics Llc | Flexographic printing plate with ink-repellent non-image areas |
JP5325823B2 (ja) * | 2010-03-25 | 2013-10-23 | 東海ゴム工業株式会社 | 感光性樹脂組成物、印刷版原版およびフレキソ印刷版 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01300246A (ja) * | 1988-05-28 | 1989-12-04 | Nippon Paint Co Ltd | フレキソ印刷用感光性樹脂組成物 |
US4956252A (en) * | 1988-08-30 | 1990-09-11 | E. I. Dupont De Nemours And Company | Aqueous processible photosensitive compositions containing core shell microgels |
JP2793068B2 (ja) * | 1991-04-24 | 1998-09-03 | 日本ペイント株式会社 | 感光性樹脂組成物 |
JPH05204139A (ja) * | 1992-01-24 | 1993-08-13 | Nippon Paint Co Ltd | フレキソ版材用感光性樹脂組成物 |
US5736298A (en) * | 1992-10-02 | 1998-04-07 | Japan Synthetic Rubber Co., Ltd. | Water developable photosensitive resin composition |
DE69426298T2 (de) * | 1993-03-31 | 2001-07-12 | Nippon Zeon Co., Ltd. | Lichtempfindliche zusammensetzung, lichtempfindliche kautschukplatte und verfahren zur herstellung dieser platte, flexografische platte und verfahren zur herstellung dieser platte |
JP3028725B2 (ja) * | 1994-02-10 | 2000-04-04 | 東洋インキ製造株式会社 | 反応性マイクロゲルおよびそれを用いた水現像可能なフレキソ印刷版用感光性樹脂組成物 |
EP0675412B1 (en) * | 1994-03-30 | 2001-01-17 | Japan Synthetic Rubber Co., Ltd. | Photosensitive resin composition |
JPH1031303A (ja) * | 1994-09-29 | 1998-02-03 | Nippon Zeon Co Ltd | 感光性組成物及び感光性ゴム版 |
JP3044689B2 (ja) * | 1994-10-14 | 2000-05-22 | 日本ゼオン株式会社 | 感光性エラストマー組成物及び感光性ゴム版 |
US5889116A (en) * | 1995-12-06 | 1999-03-30 | Nippon Zeon Co., Ltd. | Photosensitive composition from copolymers of ethylenic phosphorous monomer(s) and elastomer |
EP0864927B1 (en) * | 1997-03-11 | 2000-12-27 | JSR Corporation | Water-developable photosensitive resin composition |
-
1997
- 1997-07-30 US US08/902,644 patent/US5902714A/en not_active Expired - Lifetime
-
1998
- 1998-07-21 CA CA002285945A patent/CA2285945A1/en not_active Abandoned
- 1998-07-21 WO PCT/US1998/014967 patent/WO1999006886A1/en not_active Application Discontinuation
- 1998-07-21 AU AU85755/98A patent/AU740497B2/en not_active Ceased
- 1998-07-21 JP JP2000505551A patent/JP2001512180A/ja active Pending
- 1998-07-21 EP EP98936913A patent/EP1000384A4/en not_active Withdrawn
- 1998-07-30 AR ARP980103780A patent/AR015414A1/es unknown
-
1999
- 1999-07-28 BR BR9806665-0A patent/BR9806665A/pt not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
AU740497B2 (en) | 2001-11-08 |
EP1000384A4 (en) | 2001-09-19 |
AU8575598A (en) | 1999-02-22 |
US5902714A (en) | 1999-05-11 |
WO1999006886A1 (en) | 1999-02-11 |
AR015414A1 (es) | 2001-05-02 |
JP2001512180A (ja) | 2001-08-21 |
EP1000384A1 (en) | 2000-05-17 |
CA2285945A1 (en) | 1999-02-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FA10 | Dismissal: dismissal - article 33 of industrial property law | ||
B11Y | Definitive dismissal - extension of time limit for request of examination expired [chapter 11.1.1 patent gazette] |