BR9500258A - Composição capaz de fotoformação de imagem e película seca - Google Patents

Composição capaz de fotoformação de imagem e película seca

Info

Publication number
BR9500258A
BR9500258A BR9500258A BR9500258A BR9500258A BR 9500258 A BR9500258 A BR 9500258A BR 9500258 A BR9500258 A BR 9500258A BR 9500258 A BR9500258 A BR 9500258A BR 9500258 A BR9500258 A BR 9500258A
Authority
BR
Brazil
Prior art keywords
photoforming
image
dry film
composition capable
composition
Prior art date
Application number
BR9500258A
Other languages
English (en)
Inventor
Stephen E Bottomley
Daniel E Lundy
Betsy Dadah
Robert K Barr
Original Assignee
Morton Int Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US08/199,037 external-priority patent/US5364737A/en
Application filed by Morton Int Inc filed Critical Morton Int Inc
Publication of BR9500258A publication Critical patent/BR9500258A/pt

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0073Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Paints Or Removers (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
BR9500258A 1994-01-25 1995-01-19 Composição capaz de fotoformação de imagem e película seca BR9500258A (pt)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US18687594A 1994-01-25 1994-01-25
US08/199,037 US5364737A (en) 1994-01-25 1994-02-18 Waterbone photoresists having associate thickeners
US08/241,872 US5411837A (en) 1994-01-25 1994-05-12 Waterborne photoresists having binders with sulfonic acid functionality

Publications (1)

Publication Number Publication Date
BR9500258A true BR9500258A (pt) 1995-10-17

Family

ID=27392163

Family Applications (1)

Application Number Title Priority Date Filing Date
BR9500258A BR9500258A (pt) 1994-01-25 1995-01-19 Composição capaz de fotoformação de imagem e película seca

Country Status (7)

Country Link
EP (1) EP0664489A1 (pt)
JP (1) JPH07234508A (pt)
CN (1) CN1107584A (pt)
AU (1) AU660402B1 (pt)
BR (1) BR9500258A (pt)
CA (1) CA2133146A1 (pt)
IL (1) IL112007A0 (pt)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG85613A1 (en) * 1998-02-06 2002-01-15 Morton Int Inc Photoimageable compositions having hydrophilic binder polymers and hydrophilic monomers
US8703385B2 (en) * 2012-02-10 2014-04-22 3M Innovative Properties Company Photoresist composition
EP3008135B1 (de) * 2013-06-14 2019-10-23 Covestro Deutschland AG Blendfreie, mikrostrukturierte und speziell beschichtete folie

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2443785A1 (de) * 1974-09-13 1976-04-01 Basf Ag Fluessige, photovernetzbare formmasse zur herstellung von reliefdruckplatten
US4079028A (en) * 1975-10-03 1978-03-14 Rohm And Haas Company Polyurethane thickeners in latex compositions
JPS54147031A (en) * 1978-05-11 1979-11-16 Toray Industries Photosensitive material
JPS603622A (ja) * 1983-06-21 1985-01-10 Konishiroku Photo Ind Co Ltd 感光性樹脂組成物
JPS60175044A (ja) * 1984-02-20 1985-09-09 Toyobo Co Ltd リスフィルム用感光性組成物
JPS61174541A (ja) * 1985-01-29 1986-08-06 Toyobo Co Ltd 画像複製材料用感光性組成物
US4767826A (en) * 1985-07-18 1988-08-30 Polytechnic Institute Of New York Radiation-sensitive polymers
US4743698A (en) * 1985-10-01 1988-05-10 Alco Chemical Corp. Acrylic emulsion copolymers for thickening aqueous systems and copolymerizable surfactant monomers for use therein
JPH0246460A (ja) * 1988-08-08 1990-02-15 Toyobo Co Ltd 感光性樹脂組成物
US5045435A (en) * 1988-11-25 1991-09-03 Armstrong World Industries, Inc. Water-borne, alkali-developable, photoresist coating compositions and their preparation

Also Published As

Publication number Publication date
JPH07234508A (ja) 1995-09-05
CN1107584A (zh) 1995-08-30
IL112007A0 (en) 1995-03-15
CA2133146A1 (en) 1995-07-26
EP0664489A1 (en) 1995-07-26
AU660402B1 (en) 1995-06-22

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Legal Events

Date Code Title Description
EE Request for examination
FB34 Technical and formal requirements: requirement - article 34 of industrial property law
B11T Dismissal of application maintained [chapter 11.20 patent gazette]