US5431843A
(en)
*
|
1991-09-04 |
1995-07-11 |
The Clorox Company |
Cleaning through perhydrolysis conducted in dense fluid medium
|
EP0791093B1
(en)
*
|
1994-11-09 |
2001-04-11 |
R.R. STREET & CO., INC. |
Method and system for rejuvenating pressurized fluid solvents used in cleaning substrates
|
US6148644A
(en)
*
|
1995-03-06 |
2000-11-21 |
Lever Brothers Company, Division Of Conopco, Inc. |
Dry cleaning system using densified carbon dioxide and a surfactant adjunct
|
US5792218A
(en)
*
|
1995-06-07 |
1998-08-11 |
The Clorox Company |
N-alkyl ammonium acetonitrile activators in dense gas cleaning and method
|
US5783082A
(en)
*
|
1995-11-03 |
1998-07-21 |
University Of North Carolina |
Cleaning process using carbon dioxide as a solvent and employing molecularly engineered surfactants
|
US5712237A
(en)
*
|
1995-11-27 |
1998-01-27 |
Stevens; Edwin B. |
Composition for cleaning textiles
|
US5756657A
(en)
*
|
1996-06-26 |
1998-05-26 |
University Of Massachusetts Lowell |
Method of cleaning plastics using super and subcritical media
|
US5881577A
(en)
*
|
1996-09-09 |
1999-03-16 |
Air Liquide America Corporation |
Pressure-swing absorption based cleaning methods and systems
|
US6306564B1
(en)
|
1997-05-27 |
2001-10-23 |
Tokyo Electron Limited |
Removal of resist or residue from semiconductors using supercritical carbon dioxide
|
US6500605B1
(en)
|
1997-05-27 |
2002-12-31 |
Tokyo Electron Limited |
Removal of photoresist and residue from substrate using supercritical carbon dioxide process
|
US5858022A
(en)
*
|
1997-08-27 |
1999-01-12 |
Micell Technologies, Inc. |
Dry cleaning methods and compositions
|
US6200352B1
(en)
*
|
1997-08-27 |
2001-03-13 |
Micell Technologies, Inc. |
Dry cleaning methods and compositions
|
US6218353B1
(en)
|
1997-08-27 |
2001-04-17 |
Micell Technologies, Inc. |
Solid particulate propellant systems and aerosol containers employing the same
|
US6442980B2
(en)
*
|
1997-11-26 |
2002-09-03 |
Chart Inc. |
Carbon dioxide dry cleaning system
|
US6216302B1
(en)
|
1997-11-26 |
2001-04-17 |
Mve, Inc. |
Carbon dioxide dry cleaning system
|
US5904737A
(en)
*
|
1997-11-26 |
1999-05-18 |
Mve, Inc. |
Carbon dioxide dry cleaning system
|
TW426775B
(en)
*
|
1998-03-16 |
2001-03-21 |
Ind Tech Res Inst |
Method of fibers scouring
|
US6120613A
(en)
|
1998-04-30 |
2000-09-19 |
Micell Technologies, Inc. |
Carbon dioxide cleaning and separation systems
|
US6506259B1
(en)
|
1998-04-30 |
2003-01-14 |
Micell Technologies, Inc. |
Carbon dioxide cleaning and separation systems
|
US5977045A
(en)
*
|
1998-05-06 |
1999-11-02 |
Lever Brothers Company |
Dry cleaning system using densified carbon dioxide and a surfactant adjunct
|
US6113708A
(en)
*
|
1998-05-26 |
2000-09-05 |
Candescent Technologies Corporation |
Cleaning of flat-panel display
|
US6048369A
(en)
*
|
1998-06-03 |
2000-04-11 |
North Carolina State University |
Method of dyeing hydrophobic textile fibers with colorant materials in supercritical fluid carbon dioxide
|
US7064070B2
(en)
*
|
1998-09-28 |
2006-06-20 |
Tokyo Electron Limited |
Removal of CMP and post-CMP residue from semiconductors using supercritical carbon dioxide process
|
US6277753B1
(en)
|
1998-09-28 |
2001-08-21 |
Supercritical Systems Inc. |
Removal of CMP residue from semiconductors using supercritical carbon dioxide process
|
WO2001006053A1
(en)
*
|
1999-07-20 |
2001-01-25 |
Micell Technologies, Inc. |
Pre-treatment methods and compositions for carbon dioxide dry cleaning
|
US6314601B1
(en)
|
1999-09-24 |
2001-11-13 |
Mcclain James B. |
System for the control of a carbon dioxide cleaning apparatus
|
US6309425B1
(en)
*
|
1999-10-12 |
2001-10-30 |
Unilever Home & Personal Care, Usa, Division Of Conopco, Inc. |
Cleaning composition and method for using the same
|
US6355072B1
(en)
*
|
1999-10-15 |
2002-03-12 |
R.R. Street & Co. Inc. |
Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent
|
ATE337428T1
(de)
*
|
1999-10-15 |
2006-09-15 |
Timothy L Racette |
Reinigungssystem mit einem organischen und einem unter druck stehenden flüssigen lösungsmittel
|
US7097715B1
(en)
|
2000-10-11 |
2006-08-29 |
R. R. Street Co. Inc. |
Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent
|
US6755871B2
(en)
*
|
1999-10-15 |
2004-06-29 |
R.R. Street & Co. Inc. |
Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent
|
US6558432B2
(en)
|
1999-10-15 |
2003-05-06 |
R. R. Street & Co., Inc. |
Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent
|
US6748960B1
(en)
|
1999-11-02 |
2004-06-15 |
Tokyo Electron Limited |
Apparatus for supercritical processing of multiple workpieces
|
US6576066B1
(en)
*
|
1999-12-06 |
2003-06-10 |
Nippon Telegraph And Telephone Corporation |
Supercritical drying method and supercritical drying apparatus
|
BR0016676A
(pt)
*
|
1999-12-23 |
2002-10-15 |
Unilever Nv |
Composição alvejante, e, métodos de alvejamento e para preparar uma composição alvejante
|
US6261326B1
(en)
|
2000-01-13 |
2001-07-17 |
North Carolina State University |
Method for introducing dyes and other chemicals into a textile treatment system
|
US6248136B1
(en)
|
2000-02-03 |
2001-06-19 |
Micell Technologies, Inc. |
Methods for carbon dioxide dry cleaning with integrated distribution
|
CN1216415C
(zh)
|
2000-04-25 |
2005-08-24 |
东京毅力科创株式会社 |
沉积金属薄膜的方法和包括超临界干燥/清洁组件的金属沉积组合工具
|
AU2005200835B2
(en)
*
|
2000-06-05 |
2006-03-30 |
The Procter & Gamble Company |
Domestic fabric article refreshment in integrated cleaning and treatment processes
|
US7018423B2
(en)
|
2000-06-05 |
2006-03-28 |
Procter & Gamble Company |
Method for the use of aqueous vapor and lipophilic fluid during fabric cleaning
|
US6828292B2
(en)
*
|
2000-06-05 |
2004-12-07 |
Procter & Gamble Company |
Domestic fabric article refreshment in integrated cleaning and treatment processes
|
US6939837B2
(en)
|
2000-06-05 |
2005-09-06 |
Procter & Gamble Company |
Non-immersive method for treating or cleaning fabrics using a siloxane lipophilic fluid
|
US6676710B2
(en)
|
2000-10-18 |
2004-01-13 |
North Carolina State University |
Process for treating textile substrates
|
US6536059B2
(en)
|
2001-01-12 |
2003-03-25 |
Micell Technologies, Inc. |
Pumpless carbon dioxide dry cleaning system
|
US6905555B2
(en)
*
|
2001-02-15 |
2005-06-14 |
Micell Technologies, Inc. |
Methods for transferring supercritical fluids in microelectronic and other industrial processes
|
US6707591B2
(en)
|
2001-04-10 |
2004-03-16 |
Silicon Light Machines |
Angled illumination for a single order light modulator based projection system
|
US6782205B2
(en)
|
2001-06-25 |
2004-08-24 |
Silicon Light Machines |
Method and apparatus for dynamic equalization in wavelength division multiplexing
|
US6747781B2
(en)
|
2001-06-25 |
2004-06-08 |
Silicon Light Machines, Inc. |
Method, apparatus, and diffuser for reducing laser speckle
|
TW497494U
(en)
*
|
2001-12-28 |
2002-08-01 |
Metal Ind Redearch & Amp Dev C |
Fluid driven stirring device for compressing gas cleaning system
|
EP1472017A4
(en)
*
|
2002-01-07 |
2007-03-21 |
Praxair Technology Inc |
PROCESS FOR CLEANING AN ARTICLE
|
WO2003064065A1
(en)
*
|
2002-01-25 |
2003-08-07 |
Supercritical Systems Inc. |
Method for reducing the formation of contaminants during supercritical carbon dioxide processes
|
US6924086B1
(en)
|
2002-02-15 |
2005-08-02 |
Tokyo Electron Limited |
Developing photoresist with supercritical fluid and developer
|
JP2006508521A
(ja)
*
|
2002-02-15 |
2006-03-09 |
東京エレクトロン株式会社 |
溶剤浴と超臨界co2を用いたレジストの乾燥
|
US7270941B2
(en)
*
|
2002-03-04 |
2007-09-18 |
Tokyo Electron Limited |
Method of passivating of low dielectric materials in wafer processing
|
JP4031440B2
(ja)
*
|
2002-03-22 |
2008-01-09 |
東京エレクトロン株式会社 |
超臨界処理を用いる汚染物の除去
|
US7169540B2
(en)
*
|
2002-04-12 |
2007-01-30 |
Tokyo Electron Limited |
Method of treatment of porous dielectric films to reduce damage during cleaning
|
US6764552B1
(en)
|
2002-04-18 |
2004-07-20 |
Novellus Systems, Inc. |
Supercritical solutions for cleaning photoresist and post-etch residue from low-k materials
|
DK1516083T3
(da)
|
2002-06-24 |
2008-08-04 |
Croda Int Plc |
Fremgangsmåde til rensning af tekstiler
|
AU2002321505A1
(en)
|
2002-08-20 |
2004-03-11 |
Imperial Chemical Industries Plc |
Method for conditioning textiles
|
US6801354B1
(en)
|
2002-08-20 |
2004-10-05 |
Silicon Light Machines, Inc. |
2-D diffraction grating for substantially eliminating polarization dependent losses
|
US6880560B2
(en)
|
2002-11-18 |
2005-04-19 |
Techsonic |
Substrate processing apparatus for processing substrates using dense phase gas and sonic waves
|
US20040177867A1
(en)
*
|
2002-12-16 |
2004-09-16 |
Supercritical Systems, Inc. |
Tetra-organic ammonium fluoride and HF in supercritical fluid for photoresist and residue removal
|
EP1442802A1
(en)
*
|
2003-01-28 |
2004-08-04 |
Linde Aktiengesellschaft |
Cleaning with liquid carbon dioxide
|
US6829077B1
(en)
|
2003-02-28 |
2004-12-07 |
Silicon Light Machines, Inc. |
Diffractive light modulator with dynamically rotatable diffraction plane
|
US6806997B1
(en)
|
2003-02-28 |
2004-10-19 |
Silicon Light Machines, Inc. |
Patterned diffractive light modulator ribbon for PDL reduction
|
DE602004027022D1
(de)
*
|
2003-04-29 |
2010-06-17 |
Croda Internat Plc Goole |
Trockenreinigung von textilien
|
US20040231707A1
(en)
*
|
2003-05-20 |
2004-11-25 |
Paul Schilling |
Decontamination of supercritical wafer processing equipment
|
US6938439B2
(en)
*
|
2003-05-22 |
2005-09-06 |
Cool Clean Technologies, Inc. |
System for use of land fills and recyclable materials
|
US7365043B2
(en)
|
2003-06-27 |
2008-04-29 |
The Procter & Gamble Co. |
Lipophilic fluid cleaning compositions capable of delivering scent
|
US20060186088A1
(en)
*
|
2005-02-23 |
2006-08-24 |
Gunilla Jacobson |
Etching and cleaning BPSG material using supercritical processing
|
US20060185693A1
(en)
*
|
2005-02-23 |
2006-08-24 |
Richard Brown |
Cleaning step in supercritical processing
|
US7550075B2
(en)
|
2005-03-23 |
2009-06-23 |
Tokyo Electron Ltd. |
Removal of contaminants from a fluid
|
US7442636B2
(en)
|
2005-03-30 |
2008-10-28 |
Tokyo Electron Limited |
Method of inhibiting copper corrosion during supercritical CO2 cleaning
|
US7399708B2
(en)
*
|
2005-03-30 |
2008-07-15 |
Tokyo Electron Limited |
Method of treating a composite spin-on glass/anti-reflective material prior to cleaning
|
US20070228600A1
(en)
*
|
2005-04-01 |
2007-10-04 |
Bohnert George W |
Method of making containers from recycled plastic resin
|
US7253253B2
(en)
*
|
2005-04-01 |
2007-08-07 |
Honeywell Federal Manufacturing & Technology, Llc |
Method of removing contaminants from plastic resins
|
US7789971B2
(en)
|
2005-05-13 |
2010-09-07 |
Tokyo Electron Limited |
Treatment of substrate using functionalizing agent in supercritical carbon dioxide
|
WO2008143839A1
(en)
*
|
2007-05-15 |
2008-11-27 |
Eco2 Plastics |
Method and system for removing pcbs from synthetic resin materials
|
FR2918167B1
(fr)
*
|
2007-06-27 |
2017-10-20 |
Valeo Systemes Thermiques Branche Thermique Moteur |
Procede de nettoyage interne d'un echangeur de chaleur.
|
WO2009076576A2
(en)
*
|
2007-12-12 |
2009-06-18 |
Eco2 Plastics |
Continuous system for processing particles
|
CN103068496B
(zh)
|
2010-08-06 |
2016-04-13 |
英派尔科技开发有限公司 |
超临界惰性气体和清洗方法
|
CN113550137B
(zh)
*
|
2021-07-12 |
2022-04-22 |
武汉纺织大学 |
一种多效复合脱漂制备无纺布的方法
|