BR7402572D0 - Aperfeicoamento em composicao solida fotosazonavel resistente a solda e aperfeicoamento em processo para forma um material fotosazonado resistente a solda - Google Patents
Aperfeicoamento em composicao solida fotosazonavel resistente a solda e aperfeicoamento em processo para forma um material fotosazonado resistente a soldaInfo
- Publication number
- BR7402572D0 BR7402572D0 BR2572/74A BR257274A BR7402572D0 BR 7402572 D0 BR7402572 D0 BR 7402572D0 BR 2572/74 A BR2572/74 A BR 2572/74A BR 257274 A BR257274 A BR 257274A BR 7402572 D0 BR7402572 D0 BR 7402572D0
- Authority
- BR
- Brazil
- Prior art keywords
- weld
- resistant
- photosazoned
- perfecting
- processing
- Prior art date
Links
- 239000000463 material Substances 0.000 title 1
- 239000007787 solid Substances 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
- C08G75/12—Polythioether-ethers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
- C08G75/02—Polythioethers
- C08G75/04—Polythioethers from mercapto compounds or metallic derivatives thereof
- C08G75/045—Polythioethers from mercapto compounds or metallic derivatives thereof from mercapto compounds and unsaturated compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/0275—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with dithiol or polysulfide compounds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/122—Sulfur compound containing
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Polymerisation Methods In General (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US34837873A | 1973-04-05 | 1973-04-05 | |
| US00363453A US3824104A (en) | 1973-04-05 | 1973-05-24 | Solder resistant photopolymer composition |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BR7402572D0 true BR7402572D0 (pt) | 1974-11-19 |
Family
ID=26995677
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BR2572/74A BR7402572D0 (pt) | 1973-04-05 | 1974-04-02 | Aperfeicoamento em composicao solida fotosazonavel resistente a solda e aperfeicoamento em processo para forma um material fotosazonado resistente a solda |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US3824104A (pt) |
| JP (1) | JPS5724809B2 (pt) |
| BR (1) | BR7402572D0 (pt) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2030584B (en) * | 1978-10-03 | 1983-03-23 | Lankro Chem Ltd | Photopolymerisable solder resist compositions |
| US4260675A (en) * | 1979-05-10 | 1981-04-07 | Sullivan Donald F | Photoprinting plate and method of preparing printed circuit board solder masks therewith |
| US4506004A (en) * | 1982-04-01 | 1985-03-19 | Sullivan Donald F | Printed wiring board |
| JPS5764734A (en) * | 1980-10-08 | 1982-04-20 | Hitachi Chem Co Ltd | Photosensitive resin composition and photosensitive element |
| USRE32430E (en) * | 1982-04-01 | 1987-06-02 | Printed wiring board | |
| US4732829A (en) * | 1982-04-01 | 1988-03-22 | Donald Sullivan | Polymer printing |
| US4752553A (en) * | 1982-04-01 | 1988-06-21 | M&T Chemicals Inc. | High resolution solder mask photopolymers for screen coating over circuit traces |
| JPS59224840A (ja) * | 1984-04-12 | 1984-12-17 | ダブリュー・アール・グレイス・アンド・カンパニー―コネチカット | 印刷版の製造方法 |
| JPS60257442A (ja) * | 1984-05-23 | 1985-12-19 | ザ、ミード、コーポレーシヨン | ポリチオールを含有するカプセル化感光組成物を使用する感光材料 |
| JPS6173740A (ja) * | 1984-09-20 | 1986-04-15 | Asahi Chem Ind Co Ltd | 感光性組成物 |
| GB8515475D0 (en) * | 1985-06-19 | 1985-07-24 | Ciba Geigy Ag | Forming images |
| US4786569A (en) * | 1985-09-04 | 1988-11-22 | Ciba-Geigy Corporation | Adhesively bonded photostructurable polyimide film |
| US5667934A (en) * | 1990-10-09 | 1997-09-16 | International Business Machines Corporation | Thermally stable photoimaging composition |
| US9093448B2 (en) | 2008-11-25 | 2015-07-28 | Lord Corporation | Methods for protecting a die surface with photocurable materials |
| CN102224583B (zh) * | 2008-11-25 | 2014-09-10 | 洛德公司 | 使用光固化性材料保护晶片表面的方法 |
| CN102762976B (zh) | 2010-02-16 | 2015-09-09 | 浜松光子学株式会社 | 气体浓度计算装置及气体浓度测量模块 |
| WO2012126695A1 (en) * | 2011-03-23 | 2012-09-27 | Huntsman Advanced Materials (Switzerland) Gmbh | Stable curable thiol-ene composition |
-
1973
- 1973-05-24 US US00363453A patent/US3824104A/en not_active Expired - Lifetime
-
1974
- 1974-04-02 BR BR2572/74A patent/BR7402572D0/pt unknown
- 1974-04-03 JP JP3703774A patent/JPS5724809B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5724809B2 (pt) | 1982-05-26 |
| US3824104A (en) | 1974-07-16 |
| JPS5035283A (pt) | 1975-04-03 |
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