BR7200054D0 - Aparelho para alinhar uma mascara compreendendo um grande numero de elementos iguais com respeito a um substrato semicondutor - Google Patents

Aparelho para alinhar uma mascara compreendendo um grande numero de elementos iguais com respeito a um substrato semicondutor

Info

Publication number
BR7200054D0
BR7200054D0 BR54/72A BR5472A BR7200054D0 BR 7200054 D0 BR7200054 D0 BR 7200054D0 BR 54/72 A BR54/72 A BR 54/72A BR 5472 A BR5472 A BR 5472A BR 7200054 D0 BR7200054 D0 BR 7200054D0
Authority
BR
Brazil
Prior art keywords
align
mask
understanding
respect
semiconductor substrate
Prior art date
Application number
BR54/72A
Other languages
English (en)
Portuguese (pt)
Inventor
B Jacobs
P Kraner
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Publication of BR7200054D0 publication Critical patent/BR7200054D0/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Transform (AREA)
BR54/72A 1971-01-08 1972-01-05 Aparelho para alinhar uma mascara compreendendo um grande numero de elementos iguais com respeito a um substrato semicondutor BR7200054D0 (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7100212A NL7100212A (enExample) 1971-01-08 1971-01-08

Publications (1)

Publication Number Publication Date
BR7200054D0 true BR7200054D0 (pt) 1973-06-12

Family

ID=19812206

Family Applications (1)

Application Number Title Priority Date Filing Date
BR54/72A BR7200054D0 (pt) 1971-01-08 1972-01-05 Aparelho para alinhar uma mascara compreendendo um grande numero de elementos iguais com respeito a um substrato semicondutor

Country Status (15)

Country Link
US (1) US3811779A (enExample)
JP (1) JPS5325238B1 (enExample)
AT (1) AT334979B (enExample)
AU (1) AU466289B2 (enExample)
BE (1) BE777785A (enExample)
BR (1) BR7200054D0 (enExample)
CA (1) CA958819A (enExample)
CH (1) CH539839A (enExample)
DE (1) DE2163856C3 (enExample)
ES (1) ES398630A1 (enExample)
FR (1) FR2121301A5 (enExample)
GB (1) GB1384891A (enExample)
IT (1) IT946331B (enExample)
NL (1) NL7100212A (enExample)
SE (1) SE374620B (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2622283A1 (de) * 1976-05-19 1977-12-08 Bosch Gmbh Robert Verfahren zur lokalisierung eines festkoerperplaettchens und festkoerperplaettchen zur durchfuehrung des verfahrens
NL7606548A (nl) * 1976-06-17 1977-12-20 Philips Nv Werkwijze en inrichting voor het uitrichten van een i.c.-patroon ten opzichte van een halfgelei- dend substraat.
US4265542A (en) * 1977-11-04 1981-05-05 Computervision Corporation Apparatus and method for fine alignment of a photomask to a semiconductor wafer
CH629000A5 (de) * 1978-05-22 1982-03-31 Bbc Brown Boveri & Cie Verfahren zum optischen justieren von bauelementen.
JPS59224515A (ja) * 1983-06-03 1984-12-17 Mitsubishi Electric Corp 光学式エンコ−ダ
EP0135597B1 (de) * 1983-09-23 1987-07-22 Ibm Deutschland Gmbh Verfahren und Einrichtung zum gegenseitigen Ausrichten von Objekten
FR2553532A1 (fr) * 1983-10-12 1985-04-19 Varian Associates Dispositif capacitif d'alignement de masque
US4702606A (en) * 1984-06-01 1987-10-27 Nippon Kogaku K.K. Position detecting system
DE3682675D1 (de) * 1986-04-29 1992-01-09 Ibm Deutschland Interferometrische maskensubstratausrichtung.
WO1991011056A1 (fr) * 1990-01-18 1991-07-25 Spetsialnoe Konstruktorskoe Bjuro Radioelektronnoi Apparatury Instituta Radiofiziki I Elektroniki Akademii Nauk Armyanskoi Ssr Procede et dispositif de reglage d'un convertisseur photoelectrique d'angle de rotation d'arbre en code
NL9001611A (nl) * 1990-07-16 1992-02-17 Asm Lithography Bv Apparaat voor het afbeelden van een maskerpatroon op een substraat.

Also Published As

Publication number Publication date
IT946331B (it) 1973-05-21
AU3742671A (en) 1973-07-05
AU466289B2 (en) 1975-10-23
CA958819A (en) 1974-12-03
BE777785A (fr) 1972-07-06
CH539839A (de) 1973-07-31
SE374620B (enExample) 1975-03-10
JPS5325238B1 (enExample) 1978-07-25
DE2163856A1 (de) 1972-07-20
ATA11172A (de) 1976-06-15
NL7100212A (enExample) 1972-07-11
DE2163856B2 (de) 1979-11-08
FR2121301A5 (enExample) 1972-08-18
GB1384891A (en) 1975-02-26
US3811779A (en) 1974-05-21
DE2163856C3 (de) 1980-07-31
ES398630A1 (es) 1974-10-01
AT334979B (de) 1977-02-10

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