BR6914931D0 - Material fotosenssivel adequado para a preparacao de uma chapa polimetalica de impressao off-set e processo para a sua preparacao - Google Patents
Material fotosenssivel adequado para a preparacao de uma chapa polimetalica de impressao off-set e processo para a sua preparacaoInfo
- Publication number
- BR6914931D0 BR6914931D0 BR214931/69A BR21493169A BR6914931D0 BR 6914931 D0 BR6914931 D0 BR 6914931D0 BR 214931/69 A BR214931/69 A BR 214931/69A BR 21493169 A BR21493169 A BR 21493169A BR 6914931 D0 BR6914931 D0 BR 6914931D0
- Authority
- BR
- Brazil
- Prior art keywords
- preparation
- polymetallic
- plate
- photosensitive material
- material suitable
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
- G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/04—Printing plates or foils; Materials therefor metallic
- B41N1/08—Printing plates or foils; Materials therefor metallic for lithographic printing
- B41N1/10—Printing plates or foils; Materials therefor metallic for lithographic printing multiple
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
- C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
- C08G8/20—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with polyhydric phenols
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/28—Chemically modified polycondensates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/28—Chemically modified polycondensates
- C08G8/32—Chemically modified polycondensates by organic acids or derivatives thereof, e.g. fatty oils
Landscapes
- Chemical & Material Sciences (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE1817107A DE1817107C3 (de) | 1968-12-27 | 1968-12-27 | Vorsensibilisierte MehrmetaU-Offsetdruckplatte |
Publications (1)
Publication Number | Publication Date |
---|---|
BR6914931D0 true BR6914931D0 (pt) | 1973-01-25 |
Family
ID=5717460
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR214931/69A BR6914931D0 (pt) | 1968-12-27 | 1969-12-10 | Material fotosenssivel adequado para a preparacao de uma chapa polimetalica de impressao off-set e processo para a sua preparacao |
Country Status (14)
Country | Link |
---|---|
AT (1) | AT292034B (pt) |
BE (1) | BE741743A (pt) |
BR (1) | BR6914931D0 (pt) |
CA (1) | CA931806A (pt) |
CH (1) | CH530656A (pt) |
CS (1) | CS151538B2 (pt) |
DE (1) | DE1817107C3 (pt) |
DK (1) | DK133207C (pt) |
ES (1) | ES373504A1 (pt) |
FR (1) | FR2027168A1 (pt) |
GB (1) | GB1286879A (pt) |
IL (1) | IL33511A (pt) |
NL (1) | NL6918151A (pt) |
SE (1) | SE355088B (pt) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1375461A (pt) * | 1972-05-05 | 1974-11-27 | ||
US4268610A (en) | 1979-11-05 | 1981-05-19 | Hercules Incorporated | Photoresist formulations |
DE3114163C2 (de) * | 1981-04-08 | 1983-12-29 | Renker GmbH & Co KG, 5160 Düren | Negativ arbeitendes photomechanisches Aufzeichnungsmaterial |
DE3211547C2 (de) * | 1982-03-29 | 1984-08-09 | Renker GmbH & Co KG, 5160 Düren | Verwendung einer mit Photolack beschichteten Kunststoffolie als Beschriftungsschablone |
US4539286A (en) * | 1983-06-06 | 1985-09-03 | Dynachem Corporation | Flexible, fast processing, photopolymerizable composition |
US4610951A (en) * | 1983-06-06 | 1986-09-09 | Dynachem Corporation | Process of using a flexible, fast processing photopolymerizable composition |
US4684599A (en) * | 1986-07-14 | 1987-08-04 | Eastman Kodak Company | Photoresist compositions containing quinone sensitizer |
-
1968
- 1968-12-27 DE DE1817107A patent/DE1817107C3/de not_active Expired
-
1969
- 1969-11-03 AT AT1031869A patent/AT292034B/de not_active IP Right Cessation
- 1969-11-05 SE SE15181/69A patent/SE355088B/xx unknown
- 1969-11-07 DK DK589769A patent/DK133207C/da active
- 1969-11-13 ES ES373504A patent/ES373504A1/es not_active Expired
- 1969-11-14 BE BE741743D patent/BE741743A/xx unknown
- 1969-11-17 FR FR6939439A patent/FR2027168A1/fr not_active Withdrawn
- 1969-11-19 CH CH1723469A patent/CH530656A/de not_active IP Right Cessation
- 1969-12-03 NL NL6918151A patent/NL6918151A/xx unknown
- 1969-12-08 CA CA069223A patent/CA931806A/en not_active Expired
- 1969-12-09 IL IL33511A patent/IL33511A/en unknown
- 1969-12-10 BR BR214931/69A patent/BR6914931D0/pt unknown
- 1969-12-10 GB GB60319/69A patent/GB1286879A/en not_active Expired
- 1969-12-23 CS CS8493A patent/CS151538B2/cs unknown
Also Published As
Publication number | Publication date |
---|---|
CH530656A (de) | 1972-11-15 |
CA931806A (en) | 1973-08-14 |
DE1817107B2 (de) | 1980-01-17 |
FR2027168A1 (pt) | 1970-09-25 |
DK133207B (da) | 1976-04-05 |
DK133207C (da) | 1976-08-30 |
NL6918151A (pt) | 1970-06-30 |
IL33511A0 (en) | 1970-02-19 |
CS151538B2 (pt) | 1973-10-19 |
GB1286879A (en) | 1972-08-23 |
SU403207A3 (pt) | 1973-10-19 |
SE355088B (pt) | 1973-04-02 |
DE1817107A1 (de) | 1970-07-09 |
BE741743A (pt) | 1970-05-14 |
DE1817107C3 (de) | 1980-09-11 |
ES373504A1 (es) | 1972-02-01 |
IL33511A (en) | 1973-07-30 |
AT292034B (de) | 1971-08-10 |
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