BR112020021337A2 - Caracterização de um elemento ótico - Google Patents
Caracterização de um elemento ótico Download PDFInfo
- Publication number
- BR112020021337A2 BR112020021337A2 BR112020021337-3A BR112020021337A BR112020021337A2 BR 112020021337 A2 BR112020021337 A2 BR 112020021337A2 BR 112020021337 A BR112020021337 A BR 112020021337A BR 112020021337 A2 BR112020021337 A2 BR 112020021337A2
- Authority
- BR
- Brazil
- Prior art keywords
- laser
- optical
- fact
- mirror
- sam
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 276
- 238000012512 characterization method Methods 0.000 title claims abstract description 80
- 238000000034 method Methods 0.000 claims abstract description 56
- 238000013519 translation Methods 0.000 claims abstract description 31
- 230000000903 blocking effect Effects 0.000 claims description 32
- 238000001514 detection method Methods 0.000 claims description 24
- 238000005259 measurement Methods 0.000 claims description 20
- 239000006096 absorbing agent Substances 0.000 claims description 17
- 230000009021 linear effect Effects 0.000 claims description 13
- 230000010287 polarization Effects 0.000 claims description 13
- 239000000523 sample Substances 0.000 claims description 8
- 230000002123 temporal effect Effects 0.000 claims description 8
- 238000000399 optical microscopy Methods 0.000 claims description 3
- 238000005086 pumping Methods 0.000 claims description 3
- 238000010408 sweeping Methods 0.000 claims description 3
- 230000009022 nonlinear effect Effects 0.000 claims 1
- 238000000576 coating method Methods 0.000 description 23
- 239000011248 coating agent Substances 0.000 description 18
- 230000007547 defect Effects 0.000 description 16
- 210000001624 hip Anatomy 0.000 description 15
- 238000010521 absorption reaction Methods 0.000 description 13
- 230000005855 radiation Effects 0.000 description 12
- 238000002310 reflectometry Methods 0.000 description 12
- 230000008859 change Effects 0.000 description 11
- 239000000463 material Substances 0.000 description 11
- 239000013307 optical fiber Substances 0.000 description 10
- 239000004065 semiconductor Substances 0.000 description 9
- 238000007796 conventional method Methods 0.000 description 7
- 239000013078 crystal Substances 0.000 description 7
- 239000000835 fiber Substances 0.000 description 7
- 230000001965 increasing effect Effects 0.000 description 7
- 229910052779 Neodymium Inorganic materials 0.000 description 6
- 238000004458 analytical method Methods 0.000 description 6
- 238000013459 approach Methods 0.000 description 6
- 230000008901 benefit Effects 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 230000006870 function Effects 0.000 description 6
- 238000005286 illumination Methods 0.000 description 6
- 230000033001 locomotion Effects 0.000 description 6
- 238000012986 modification Methods 0.000 description 6
- 230000004048 modification Effects 0.000 description 6
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 230000000712 assembly Effects 0.000 description 4
- 238000000429 assembly Methods 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- 238000000926 separation method Methods 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- LSGOVYNHVSXFFJ-UHFFFAOYSA-N vanadate(3-) Chemical compound [O-][V]([O-])([O-])=O LSGOVYNHVSXFFJ-UHFFFAOYSA-N 0.000 description 4
- 230000003321 amplification Effects 0.000 description 3
- 238000004891 communication Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000013507 mapping Methods 0.000 description 3
- 238000012544 monitoring process Methods 0.000 description 3
- 238000003199 nucleic acid amplification method Methods 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 238000006748 scratching Methods 0.000 description 3
- 230000002393 scratching effect Effects 0.000 description 3
- 230000003595 spectral effect Effects 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 230000007704 transition Effects 0.000 description 3
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical group [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 2
- 235000008694 Humulus lupulus Nutrition 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 108010038083 amyloid fibril protein AS-SAM Proteins 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 239000002019 doping agent Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 238000012014 optical coherence tomography Methods 0.000 description 2
- 230000005693 optoelectronics Effects 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 238000011179 visual inspection Methods 0.000 description 2
- 238000005303 weighing Methods 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 241000699670 Mus sp. Species 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910009372 YVO4 Inorganic materials 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 230000004308 accommodation Effects 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000002730 additional effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000007844 bleaching agent Substances 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000002068 genetic effect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- CPBQJMYROZQQJC-UHFFFAOYSA-N helium neon Chemical compound [He].[Ne] CPBQJMYROZQQJC-UHFFFAOYSA-N 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000005305 interferometry Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000000386 microscopy Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000005289 physical deposition Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000012163 sequencing technique Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 230000008685 targeting Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
- 239000013598 vector Substances 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 210000000707 wrist Anatomy 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/0014—Monitoring arrangements not otherwise provided for
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J11/00—Measuring the characteristics of individual optical pulses or of optical pulse trains
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
- H01S3/0092—Nonlinear frequency conversion, e.g. second harmonic generation [SHG] or sum- or difference-frequency generation outside the laser cavity
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/025—Constructional details of solid state lasers, e.g. housings or mountings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/04—Arrangements for thermal management
- H01S3/0405—Conductive cooling, e.g. by heat sinks or thermo-electric elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/04—Arrangements for thermal management
- H01S3/042—Arrangements for thermal management for solid state lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08018—Mode suppression
- H01S3/0804—Transverse or lateral modes
- H01S3/0805—Transverse or lateral modes by apertures, e.g. pin-holes or knife-edges
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08059—Constructional details of the reflector, e.g. shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08072—Thermal lensing or thermally induced birefringence; Compensation thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08081—Unstable resonators
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
- H01S3/0813—Configuration of resonator
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/086—One or more reflectors having variable properties or positions for initial adjustment of the resonator
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
- H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
- H01S3/0941—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode
- H01S3/09415—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode the pumping beam being parallel to the lasing mode of the pumped medium, e.g. end-pumping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/105—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/11—Mode locking; Q-switching; Other giant-pulse techniques, e.g. cavity dumping
- H01S3/1106—Mode locking
- H01S3/1112—Passive mode locking
- H01S3/1115—Passive mode locking using intracavity saturable absorbers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/11—Mode locking; Q-switching; Other giant-pulse techniques, e.g. cavity dumping
- H01S3/1106—Mode locking
- H01S3/1112—Passive mode locking
- H01S3/1115—Passive mode locking using intracavity saturable absorbers
- H01S3/1118—Semiconductor saturable absorbers, e.g. semiconductor saturable absorber mirrors [SESAMs]; Solid-state saturable absorbers, e.g. carbon nanotube [CNT] based
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/131—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
- H01S3/1312—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation by controlling the optical pumping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/1601—Solid materials characterised by an active (lasing) ion
- H01S3/1603—Solid materials characterised by an active (lasing) ion rare earth
- H01S3/1611—Solid materials characterised by an active (lasing) ion rare earth neodymium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/163—Solid materials characterised by a crystal matrix
- H01S3/164—Solid materials characterised by a crystal matrix garnet
- H01S3/1643—YAG
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/163—Solid materials characterised by a crystal matrix
- H01S3/1645—Solid materials characterised by a crystal matrix halide
- H01S3/1653—YLiF4(YLF, LYF)
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/163—Solid materials characterised by a crystal matrix
- H01S3/1655—Solid materials characterised by a crystal matrix silicate
- H01S3/1658—Mg2SiO4 (Forsterite)
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/163—Solid materials characterised by a crystal matrix
- H01S3/1671—Solid materials characterised by a crystal matrix vanadate, niobate, tantalate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/163—Solid materials characterised by a crystal matrix
- H01S3/1671—Solid materials characterised by a crystal matrix vanadate, niobate, tantalate
- H01S3/1673—YVO4 [YVO]
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Nanotechnology (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Lasers (AREA)
- Mechanical Optical Scanning Systems (AREA)
- Laser Beam Printer (AREA)
- Semiconductor Lasers (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201862666677P | 2018-05-03 | 2018-05-03 | |
| US62/666,677 | 2018-05-03 | ||
| PCT/US2019/027534 WO2019212735A1 (en) | 2018-05-03 | 2019-04-15 | Characterizing an optical element |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BR112020021337A2 true BR112020021337A2 (pt) | 2021-01-19 |
Family
ID=66429564
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BR112020021337-3A BR112020021337A2 (pt) | 2018-05-03 | 2019-04-15 | Caracterização de um elemento ótico |
Country Status (11)
| Country | Link |
|---|---|
| US (2) | US11128098B2 (https=) |
| EP (1) | EP3788684A1 (https=) |
| JP (1) | JP2021523562A (https=) |
| KR (1) | KR20210005215A (https=) |
| CN (1) | CN112166534A (https=) |
| AU (1) | AU2019262767A1 (https=) |
| BR (1) | BR112020021337A2 (https=) |
| CA (1) | CA3098712A1 (https=) |
| MX (1) | MX2020011617A (https=) |
| TW (1) | TW201947207A (https=) |
| WO (1) | WO2019212735A1 (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10732105B1 (en) * | 2019-02-15 | 2020-08-04 | Agilent Technologies, Inc. | Method and apparatus for characterizing laser gain chips |
| CN113375914B (zh) * | 2021-06-04 | 2022-09-02 | 哈尔滨工程大学 | 一种用于激光板条面检测的光斑强度分布获取方法 |
| JP7789508B2 (ja) * | 2021-08-19 | 2025-12-22 | 株式会社ディスコ | パルス幅計測治具 |
| WO2024214298A1 (ja) * | 2023-04-14 | 2024-10-17 | ギガフォトン株式会社 | レーザ装置及び光学素子の劣化判定方法 |
| CN116780336B (zh) * | 2023-06-25 | 2024-02-09 | 重庆师范大学 | 利用半导体材料非线性效应实现自锁模的超快紫外激光器 |
Family Cites Families (44)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3163779B2 (ja) * | 1992-09-22 | 2001-05-08 | 松下電器産業株式会社 | レーザー装置 |
| US5814565A (en) | 1995-02-23 | 1998-09-29 | University Of Utah Research Foundation | Integrated optic waveguide immunosensor |
| JPH09260753A (ja) * | 1996-03-25 | 1997-10-03 | Ando Electric Co Ltd | 外部共振器型波長可変光源 |
| JPH09289347A (ja) * | 1996-04-23 | 1997-11-04 | Mitsubishi Electric Corp | レーザ装置 |
| JP3022437B2 (ja) * | 1997-09-25 | 2000-03-21 | 日本電気株式会社 | モード同期半導体レーザ |
| JP3197869B2 (ja) * | 1998-03-31 | 2001-08-13 | アンリツ株式会社 | 波長可変レーザ光源装置 |
| US6795198B1 (en) * | 1998-05-28 | 2004-09-21 | Martin Fuchs | Method and device for measuring thin films and semiconductor substrates using reflection mode geometry |
| US6787308B2 (en) | 1998-07-30 | 2004-09-07 | Solexa Ltd. | Arrayed biomolecules and their use in sequencing |
| US6252892B1 (en) * | 1998-09-08 | 2001-06-26 | Imra America, Inc. | Resonant fabry-perot semiconductor saturable absorbers and two photon absorption power limiters |
| US7175811B2 (en) | 2000-04-28 | 2007-02-13 | Edgelight Biosciences | Micro-array evanescent wave fluorescence detection device |
| US6917726B2 (en) | 2001-09-27 | 2005-07-12 | Cornell Research Foundation, Inc. | Zero-mode clad waveguides for performing spectroscopy with confined effective observation volumes |
| US6504967B1 (en) * | 2000-06-02 | 2003-01-07 | Calient Networks, Inc. | Passive alignment method and apparatus for fabricating a MEMS device |
| FR2813121A1 (fr) | 2000-08-21 | 2002-02-22 | Claude Weisbuch | Dispositif perfectionne de support d'elements chromophores |
| WO2002045219A1 (en) * | 2000-11-29 | 2002-06-06 | Ron Nagar | Tunable laser |
| US6781734B2 (en) * | 2001-03-30 | 2004-08-24 | Santur Corporation | Modulator alignment for laser |
| US6980572B2 (en) * | 2002-05-28 | 2005-12-27 | The Regents Of The University Of California | Wavelength selectable light source |
| US7738086B2 (en) | 2005-05-09 | 2010-06-15 | The Trustees Of Columbia University In The City Of New York | Active CMOS biosensor chip for fluorescent-based detection |
| US7991024B2 (en) * | 2005-07-01 | 2011-08-02 | Nec Corporation | External cavity wavelength tunable laser device and optical output module |
| US7426322B2 (en) | 2005-07-20 | 2008-09-16 | Searete Llc. | Plasmon photocatalysis |
| US20070046934A1 (en) * | 2005-08-26 | 2007-03-01 | New Wave Research, Inc. | Multi-function laser induced breakdown spectroscopy and laser ablation material analysis system and method |
| US8975216B2 (en) | 2006-03-30 | 2015-03-10 | Pacific Biosciences Of California | Articles having localized molecules disposed thereon and methods of producing same |
| JP4478800B2 (ja) * | 2006-05-15 | 2010-06-09 | 独立行政法人産業技術総合研究所 | クロック伝送装置 |
| US8207509B2 (en) | 2006-09-01 | 2012-06-26 | Pacific Biosciences Of California, Inc. | Substrates, systems and methods for analyzing materials |
| EP3936857B1 (en) | 2006-09-01 | 2023-06-21 | Pacific Biosciences Of California, Inc. | Substrates, systems and methods for analyzing materials |
| FR2908888B1 (fr) | 2006-11-21 | 2012-08-03 | Centre Nat Rech Scient | Dispositif pour la detection exaltee de l'emission d'une particule cible |
| US7599048B2 (en) * | 2007-02-09 | 2009-10-06 | Wafermasters, Inc. | Optical emission spectroscopy process monitoring and material characterization |
| WO2009082706A1 (en) | 2007-12-21 | 2009-07-02 | The Trustees Of Columbia University In The City Of New York | Active cmos sensor array for electrochemical biomolecular detection |
| WO2009102949A2 (en) * | 2008-02-13 | 2009-08-20 | Xitronix Corporation | Method and apparatus of z-scan photoreflectance characterization |
| WO2009137494A1 (en) * | 2008-05-05 | 2009-11-12 | Applied Spectra, Inc. | Laser ablation apparatus and method |
| CA2737505C (en) | 2008-09-16 | 2017-08-29 | Pacific Biosciences Of California, Inc. | Substrates and optical systems and methods of use thereof |
| US8160113B2 (en) * | 2009-07-21 | 2012-04-17 | Mobius Photonics, Inc. | Tailored pulse burst |
| US8278728B2 (en) | 2009-10-17 | 2012-10-02 | Florida Institute Of Technology | Array of concentric CMOS photodiodes for detection and de-multiplexing of spatially modulated optical channels |
| CN102985803A (zh) | 2010-02-19 | 2013-03-20 | 加利福尼亚太平洋生物科学股份有限公司 | 集成的分析系统和方法 |
| JP5368360B2 (ja) | 2010-04-09 | 2013-12-18 | 浜松ホトニクス株式会社 | パルスファイバレーザ装置 |
| US8865078B2 (en) | 2010-06-11 | 2014-10-21 | Industrial Technology Research Institute | Apparatus for single-molecule detection |
| CA2856163C (en) | 2011-10-28 | 2019-05-07 | Illumina, Inc. | Microarray fabrication system and method |
| US9606060B2 (en) | 2012-01-13 | 2017-03-28 | California Institute Of Technology | Filterless time-domain detection of one or more fluorophores |
| US9372308B1 (en) | 2012-06-17 | 2016-06-21 | Pacific Biosciences Of California, Inc. | Arrays of integrated analytical devices and methods for production |
| US9223084B2 (en) | 2012-12-18 | 2015-12-29 | Pacific Biosciences Of California, Inc. | Illumination of optical analytical devices |
| US20150016479A1 (en) * | 2013-07-12 | 2015-01-15 | Coherent Kaiserslautern GmbH | Laser apparatus with beam translation |
| US9765395B2 (en) | 2014-04-28 | 2017-09-19 | Nanomedical Diagnostics, Inc. | System and method for DNA sequencing and blood chemistry analysis |
| CN104242051B (zh) * | 2014-09-18 | 2017-05-10 | 武汉光迅科技股份有限公司 | 一种外腔可调谐激光器以及其腔模锁定方法 |
| US9666748B2 (en) | 2015-01-14 | 2017-05-30 | International Business Machines Corporation | Integrated on chip detector and zero waveguide module structure for use in DNA sequencing |
| EP3271762B1 (en) | 2015-03-16 | 2023-01-04 | Pacific Biosciences of California, Inc. | Analytical system comprising integrated devices and systems for free-space optical coupling |
-
2019
- 2019-04-15 CN CN201980029706.1A patent/CN112166534A/zh active Pending
- 2019-04-15 JP JP2020561720A patent/JP2021523562A/ja active Pending
- 2019-04-15 BR BR112020021337-3A patent/BR112020021337A2/pt not_active IP Right Cessation
- 2019-04-15 EP EP19722339.9A patent/EP3788684A1/en not_active Withdrawn
- 2019-04-15 US US16/384,335 patent/US11128098B2/en not_active Expired - Fee Related
- 2019-04-15 CA CA3098712A patent/CA3098712A1/en active Pending
- 2019-04-15 WO PCT/US2019/027534 patent/WO2019212735A1/en not_active Ceased
- 2019-04-15 AU AU2019262767A patent/AU2019262767A1/en not_active Abandoned
- 2019-04-15 MX MX2020011617A patent/MX2020011617A/es unknown
- 2019-04-15 KR KR1020207034453A patent/KR20210005215A/ko not_active Ceased
- 2019-04-23 TW TW108114111A patent/TW201947207A/zh unknown
-
2021
- 2021-08-25 US US17/412,154 patent/US20210384696A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| US11128098B2 (en) | 2021-09-21 |
| AU2019262767A1 (en) | 2020-11-12 |
| MX2020011617A (es) | 2020-12-07 |
| US20210384696A1 (en) | 2021-12-09 |
| KR20210005215A (ko) | 2021-01-13 |
| JP2021523562A (ja) | 2021-09-02 |
| US20190341736A1 (en) | 2019-11-07 |
| CN112166534A (zh) | 2021-01-01 |
| TW201947207A (zh) | 2019-12-16 |
| WO2019212735A1 (en) | 2019-11-07 |
| CA3098712A1 (en) | 2019-11-07 |
| EP3788684A1 (en) | 2021-03-10 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP7591601B2 (ja) | コンパクトなモードロックレーザモジュール | |
| BR112020021337A2 (pt) | Caracterização de um elemento ótico | |
| Preuss et al. | Three-stage birefringent filter tuning smoothly over the visible region: theoretical treatment and experimental design | |
| US12170433B2 (en) | Amplitude-modulated laser | |
| US20060039436A1 (en) | Diode-pumped laser | |
| McClung et al. | Longitudinal mode control in giant pulse lasers | |
| Cox et al. | Single mode, piezoelectrically tuned, picosecond short‐cavity dye laser | |
| Hildenstein et al. | High-power, high-beam quality miniaturized laser module for pumping of solid state lasers at 980 nm | |
| JP2014126567A (ja) | 赤外固体レーザー発振装置 | |
| Henseleit et al. | Coherent perfect absorption in one-port devices with wedged organic thin-film absorbers | |
| Belcher et al. | VCSEL Laser System for Atomic Clocks | |
| Steers et al. | Fiber coupled, ultra-compact static Fourier transform spectrometer and laser wavemeter | |
| KR20040006509A (ko) | 라만 레이저 발진기 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| B350 | Update of information on the portal [chapter 15.35 patent gazette] | ||
| B08F | Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette] |
Free format text: REFERENTE A 5A ANUIDADE. |
|
| B08K | Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette] |
Free format text: EM VIRTUDE DO ARQUIVAMENTO PUBLICADO NA RPI 2770 DE 06-02-2024 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDO O ARQUIVAMENTO DO PEDIDO DE PATENTE, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013. |