BR112018074918A2 - sistema e métodos para deposição por spray de revestimentos particulados - Google Patents
sistema e métodos para deposição por spray de revestimentos particuladosInfo
- Publication number
- BR112018074918A2 BR112018074918A2 BR112018074918-4A BR112018074918A BR112018074918A2 BR 112018074918 A2 BR112018074918 A2 BR 112018074918A2 BR 112018074918 A BR112018074918 A BR 112018074918A BR 112018074918 A2 BR112018074918 A2 BR 112018074918A2
- Authority
- BR
- Brazil
- Prior art keywords
- pressure chamber
- nanomaterial
- nozzle
- high pressure
- methods
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/02—Coating starting from inorganic powder by application of pressure only
- C23C24/04—Impact or kinetic deposition of particles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B12/00—Arrangements for controlling delivery; Arrangements for controlling the spray area
- B05B12/02—Arrangements for controlling delivery; Arrangements for controlling the spray area for controlling time, or sequence, of delivery
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
- B05B7/0012—Apparatus for achieving spraying before discharge from the apparatus
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/02—Processes for applying liquids or other fluent materials performed by spraying
- B05D1/12—Applying particulate materials
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
- C23C4/134—Plasma spraying
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Dispersion Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Nozzles (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
um sistema de deposição de partículas pode ter uma fonte de partículas que fornece um nanomaterial a uma taxa controlada e um sistema de distribuição de gás acoplado à fonte de partículas e operável para receber o aerossol de nanomaterial. uma câmara de alta pressão pode ser acoplada ao sistema de distribuição de gás, e um bocal pode ser disposto entre a câmara de alta pressão e uma câmara de baixa pressão. o bocal pode ter uma abertura de bocal que permite a comunicação fluídica de um aerossol de nanomaterial entre a câmara de alta pressão e a câmara de baixa pressão e a abertura pode ter um comprimento que excede a largura.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201662344283P | 2016-06-01 | 2016-06-01 | |
US62/344,283 | 2016-06-01 | ||
PCT/US2017/035532 WO2017210478A1 (en) | 2016-06-01 | 2017-06-01 | System and methods for deposition spray of particulate coatings |
Publications (1)
Publication Number | Publication Date |
---|---|
BR112018074918A2 true BR112018074918A2 (pt) | 2019-03-12 |
Family
ID=60479154
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR112018074918-4A BR112018074918A2 (pt) | 2016-06-01 | 2017-06-01 | sistema e métodos para deposição por spray de revestimentos particulados |
Country Status (5)
Country | Link |
---|---|
US (2) | US10092926B2 (pt) |
EP (1) | EP3463677A4 (pt) |
JP (1) | JP2019520200A (pt) |
BR (1) | BR112018074918A2 (pt) |
WO (1) | WO2017210478A1 (pt) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11430900B2 (en) | 2016-08-22 | 2022-08-30 | Arizona Board Of Regents On Behalf Of Arizona State University | Wavelength-selective specularly reflecting photovoltaic module and manufacture thereof |
Family Cites Families (38)
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US4695358A (en) * | 1985-11-08 | 1987-09-22 | Florida State University | Method of removing SO2, NOX and particles from gas mixtures using streamer corona |
US5213851A (en) * | 1990-04-17 | 1993-05-25 | Alfred University | Process for preparing ferrite films by radio-frequency generated aerosol plasma deposition in atmosphere |
JPH06158306A (ja) | 1992-11-27 | 1994-06-07 | Vacuum Metallurgical Co Ltd | ガス・デポジション法によるスパッター用ターゲットの製造方法およびその製造装置 |
RU2196846C2 (ru) | 1995-11-13 | 2003-01-20 | Дзе Юниверсити оф Коннектикут | Наноструктурные сырьевые материалы для термического напыления |
US5874134A (en) | 1996-01-29 | 1999-02-23 | Regents Of The University Of Minnesota | Production of nanostructured materials by hypersonic plasma particle deposition |
GB9900955D0 (en) * | 1999-01-15 | 1999-03-10 | Imperial College | Material deposition |
JP3348154B2 (ja) | 1999-10-12 | 2002-11-20 | 独立行政法人産業技術総合研究所 | 複合構造物及びその作製方法並びに作製装置 |
CA2409093C (en) | 2000-05-16 | 2009-07-21 | Regents Of The University Of Minnesota | High mass throughput particle generation using multiple nozzle spraying |
WO2002005969A2 (en) | 2000-07-19 | 2002-01-24 | Regents Of The University Of Minnesota | Apparatus and method for synthesizing films and coatings by focused particle beam deposition |
US6607597B2 (en) * | 2001-01-30 | 2003-08-19 | Msp Corporation | Method and apparatus for deposition of particles on surfaces |
US6841033B2 (en) * | 2001-03-21 | 2005-01-11 | Nordson Corporation | Material handling system and method for a multi-workpiece plasma treatment system |
US20040055534A1 (en) * | 2002-09-19 | 2004-03-25 | Gaston Systems, Inc. | Fluid applicator for permeable substrates |
JP2004267964A (ja) | 2003-03-11 | 2004-09-30 | Canon Inc | 成膜方法 |
JP4182205B2 (ja) * | 2003-03-20 | 2008-11-19 | 独立行政法人産業技術総合研究所 | 13族窒化物の結晶構造変化方法 |
US8865271B2 (en) | 2003-06-06 | 2014-10-21 | Neophotonics Corporation | High rate deposition for the formation of high quality optical coatings |
US20050129843A1 (en) | 2003-12-11 | 2005-06-16 | Xerox Corporation | Nanoparticle deposition process |
US7444955B2 (en) * | 2004-05-19 | 2008-11-04 | Sub-One Technology, Inc. | Apparatus for directing plasma flow to coat internal passageways |
DE112005001429T5 (de) * | 2004-06-18 | 2007-04-26 | Innovalight, Inc., St. Paul | Verfahren und Vorrichtung zum Bilden von Nanopartikeln unter Verwendung von Hochfrequenzplasmen |
JP2006054162A (ja) * | 2004-07-15 | 2006-02-23 | Ngk Insulators Ltd | 誘電体デバイス |
US7476851B2 (en) | 2004-11-12 | 2009-01-13 | Regents Of The University Of Minnesota | Aerodynamic focusing of nanoparticle or cluster beams |
US7878143B2 (en) * | 2006-03-28 | 2011-02-01 | Brother Kogyo Kabushiki Kaisha | Film-forming apparatus, film-forming method and particle-supplying apparatus |
US7829157B2 (en) * | 2006-04-07 | 2010-11-09 | Lockheed Martin Corporation | Methods of making multilayered, hydrogen-containing thermite structures |
US20070243315A1 (en) | 2006-04-12 | 2007-10-18 | Buckley Daniel T | Methods for manufacturing electrochemical cell parts comprising material deposition processes |
CA2619331A1 (en) * | 2007-01-31 | 2008-07-31 | Scientific Valve And Seal, Lp | Coatings, their production and use |
JP2010530032A (ja) | 2007-06-15 | 2010-09-02 | ナノグラム・コーポレイション | 反応流による無機箔体の析出および合成法 |
WO2010011076A2 (ko) | 2008-07-24 | 2010-01-28 | 주식회사 펨빅스 | 고상파우더 연속 증착장치 및 고상파우더 연속 증착방법 |
EP2332164A1 (en) * | 2008-09-03 | 2011-06-15 | Dow Corning Corporation | Low pressure high frequency pulsed plasma reactor for producing nanoparticles |
JP2010133019A (ja) | 2008-10-29 | 2010-06-17 | Toto Ltd | 構造物形成装置 |
US8137743B2 (en) * | 2009-05-08 | 2012-03-20 | Fuchita Nanotechnology Ltd. | Method for forming zirconia film |
JP5443070B2 (ja) * | 2009-06-19 | 2014-03-19 | 東京エレクトロン株式会社 | インプリントシステム |
JP5719546B2 (ja) * | 2009-09-08 | 2015-05-20 | 東京応化工業株式会社 | 塗布装置及び塗布方法 |
CN103180490A (zh) * | 2010-11-02 | 2013-06-26 | 日本碍子株式会社 | 晶体制造方法 |
WO2013136948A1 (ja) * | 2012-03-13 | 2013-09-19 | 日本碍子株式会社 | 酸化亜鉛単結晶の製造方法 |
JP6002888B2 (ja) * | 2012-06-28 | 2016-10-05 | 有限会社 渕田ナノ技研 | 成膜方法 |
TWI579405B (zh) * | 2012-11-15 | 2017-04-21 | 財團法人工業技術研究院 | 電漿鍍膜裝置 |
US9708713B2 (en) * | 2013-05-24 | 2017-07-18 | Applied Materials, Inc. | Aerosol deposition coating for semiconductor chamber components |
JP6195806B2 (ja) * | 2013-11-13 | 2017-09-13 | 東京エレクトロン株式会社 | 塗布装置 |
WO2015162035A1 (en) * | 2014-04-24 | 2015-10-29 | Basf Se | Gas phase process for producing conductive metal oxide films |
-
2017
- 2017-06-01 US US15/611,627 patent/US10092926B2/en active Active
- 2017-06-01 BR BR112018074918-4A patent/BR112018074918A2/pt not_active Application Discontinuation
- 2017-06-01 WO PCT/US2017/035532 patent/WO2017210478A1/en unknown
- 2017-06-01 EP EP17807512.3A patent/EP3463677A4/en not_active Withdrawn
- 2017-06-01 JP JP2018563617A patent/JP2019520200A/ja active Pending
-
2018
- 2018-11-30 US US16/206,866 patent/US11186912B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
EP3463677A4 (en) | 2020-02-05 |
JP2019520200A (ja) | 2019-07-18 |
US20170348726A1 (en) | 2017-12-07 |
US11186912B2 (en) | 2021-11-30 |
WO2017210478A1 (en) | 2017-12-07 |
EP3463677A1 (en) | 2019-04-10 |
US10092926B2 (en) | 2018-10-09 |
US20190100841A1 (en) | 2019-04-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
B06W | Patent application suspended after preliminary examination (for patents with searches from other patent authorities) [chapter 6.23 patent gazette] | ||
B350 | Update of information on the portal [chapter 15.35 patent gazette] | ||
B11B | Dismissal acc. art. 36, par 1 of ipl - no reply within 90 days to fullfil the necessary requirements |