BR112012025351A2 - eletrólitos em estado sólido tendo alta condução de ions de lítio - Google Patents
eletrólitos em estado sólido tendo alta condução de ions de lítioInfo
- Publication number
- BR112012025351A2 BR112012025351A2 BR112012025351A BR112012025351A BR112012025351A2 BR 112012025351 A2 BR112012025351 A2 BR 112012025351A2 BR 112012025351 A BR112012025351 A BR 112012025351A BR 112012025351 A BR112012025351 A BR 112012025351A BR 112012025351 A2 BR112012025351 A2 BR 112012025351A2
- Authority
- BR
- Brazil
- Prior art keywords
- lithium
- solid state
- lithium ions
- electrolyte
- high conduction
- Prior art date
Links
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 title abstract 4
- 229910001416 lithium ion Inorganic materials 0.000 title abstract 4
- 229910001251 solid state electrolyte alloy Inorganic materials 0.000 title abstract 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 abstract 3
- 239000003792 electrolyte Substances 0.000 abstract 3
- 229910052744 lithium Inorganic materials 0.000 abstract 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 2
- 239000008367 deionised water Substances 0.000 abstract 1
- 229910021641 deionized water Inorganic materials 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 239000010416 ion conductor Substances 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 239000011159 matrix material Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 239000007787 solid Substances 0.000 abstract 1
- 239000007784 solid electrolyte Substances 0.000 abstract 1
- 239000002904 solvent Substances 0.000 abstract 1
- 238000009718 spray deposition Methods 0.000 abstract 1
- 238000005507 spraying Methods 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
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- H—ELECTRICITY
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- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M10/00—Secondary cells; Manufacture thereof
- H01M10/05—Accumulators with non-aqueous electrolyte
- H01M10/056—Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes
- H01M10/0561—Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes the electrolyte being constituted of inorganic materials only
- H01M10/0562—Solid materials
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/06—Coating on selected surface areas, e.g. using masks
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- C—CHEMISTRY; METALLURGY
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
- C23C18/1216—Metal oxides
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1229—Composition of the substrate
- C23C18/1241—Metallic substrates
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
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- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1275—Process of deposition of the inorganic material performed under inert atmosphere
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- C—CHEMISTRY; METALLURGY
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
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- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1283—Control of temperature, e.g. gradual temperature increase, modulation of temperature
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- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
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- H01M4/02—Electrodes composed of, or comprising, active material
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- H01M4/50—Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides of manganese
- H01M4/505—Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides of manganese of mixed oxides or hydroxides containing manganese for inserting or intercalating light metals, e.g. LiMn2O4 or LiMn2OxFy
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- H01M4/52—Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides of nickel, cobalt or iron
- H01M4/525—Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides of nickel, cobalt or iron of mixed oxides or hydroxides containing iron, cobalt or nickel for inserting or intercalating light metals, e.g. LiNiO2, LiCoO2 or LiCoOxFy
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- H01M4/5825—Oxygenated metallic salts or polyanionic structures, e.g. borates, phosphates, silicates, olivines
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- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
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- Chemical & Material Sciences (AREA)
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- Manufacturing & Machinery (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Engineering (AREA)
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- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electrochemistry (AREA)
- Computer Hardware Design (AREA)
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Abstract
eletrólitos em estado sólido tendo alta condução de ions de lítio. a presente invenção refere-se a um método para a produção de películas condutoras de íons que inclui a utilização de produtos químicos inorgânicos primários, que são preferivelmente solúveis em água; formulando a solução com um solvente apropriado, de preferência, água deionizada, e deposição por pulverização da matriz do eletrólito sólido sobre um substrato aquecido, de preferência de 100 a 400°c utilizando um sistema de deposição por pulvferização. no caso do lítio o passo de deposição é então seguido por litiação ou adição de lítio, em seguida, o tratamento térmico, a temperaturas de preferência variando entre 100 e 500°c, obter um eletrólito inorgânico em estado sólido altamente condutor de íons de lítio. o método pode ser utilizado para outros condutores iônicos para fazer eletrólitos para várias aplicações. o eletrólito pode ser incorporado em uma bateria de íons de lítio.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/798,510 US20110171528A1 (en) | 2010-01-12 | 2010-04-06 | Solid state electrolytes having high lithium ion conduction |
PCT/US2011/000599 WO2011126558A1 (en) | 2010-04-06 | 2011-04-04 | Sold state electrolytes having high lithium ion conduction |
Publications (1)
Publication Number | Publication Date |
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BR112012025351A2 true BR112012025351A2 (pt) | 2016-06-28 |
Family
ID=44258795
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR112012025351A BR112012025351A2 (pt) | 2010-04-06 | 2011-04-04 | eletrólitos em estado sólido tendo alta condução de ions de lítio |
Country Status (11)
Country | Link |
---|---|
US (1) | US20110171528A1 (pt) |
EP (1) | EP2556557A1 (pt) |
JP (1) | JP2013528896A (pt) |
KR (1) | KR20130059340A (pt) |
CN (1) | CN102884667A (pt) |
AU (1) | AU2011238903A1 (pt) |
BR (1) | BR112012025351A2 (pt) |
CA (1) | CA2795672A1 (pt) |
EA (1) | EA201290999A1 (pt) |
MX (1) | MX2012011524A (pt) |
WO (1) | WO2011126558A1 (pt) |
Families Citing this family (18)
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US8349498B2 (en) * | 2010-01-12 | 2013-01-08 | Sisom Thin Films, Llc | Method of forming solid state electrolyte having high lithium ion conduction and battery incorporating same |
US9692039B2 (en) | 2012-07-24 | 2017-06-27 | Quantumscape Corporation | Nanostructured materials for electrochemical conversion reactions |
EP2905835B1 (en) * | 2012-10-05 | 2016-10-12 | Fujitsu Limited | Lithium-ion conductor and all-solid lithium-ion secondary cell |
FR3000616B1 (fr) * | 2012-12-31 | 2015-01-02 | I Ten | Procede de fabrication de batteries tout solide en structure multicouches |
US9017777B2 (en) | 2013-02-26 | 2015-04-28 | Quantumscape Corporation | Inorganic films using a cascaded source for battery devices |
US10497970B2 (en) | 2013-03-14 | 2019-12-03 | Arizona Board Of Regents On Behalf Of Arizona State University | Alkali ion conducting plastic crystals |
WO2014153146A1 (en) * | 2013-03-14 | 2014-09-25 | Angell C Austen | Inorganic plastic crystal electrolytes |
KR102384822B1 (ko) | 2014-02-25 | 2022-04-08 | 퀀텀스케이프 배터리, 인코포레이티드 | 삽입 및 변환 물질 양자 모두를 갖는 하이브리드 전극 |
US10326135B2 (en) | 2014-08-15 | 2019-06-18 | Quantumscape Corporation | Doped conversion materials for secondary battery cathodes |
US9966629B2 (en) | 2015-02-03 | 2018-05-08 | Samsung Electronics Co., Ltd. | Sodium-conducting solid electrolyte |
JP6352960B2 (ja) * | 2016-02-09 | 2018-07-04 | 国立大学法人東京工業大学 | 硫化物固体電解質材料、電池および硫化物固体電解質材料の製造方法 |
JP6672895B2 (ja) * | 2016-03-03 | 2020-03-25 | ウシオ電機株式会社 | 配線基板の製造方法 |
WO2018075972A1 (en) | 2016-10-21 | 2018-04-26 | Quantumscape Corporation | Electrolyte separators including lithium borohydride and composite electrolyte separators of lithium-stuffed garnet and lithium borohydride |
FR3080957B1 (fr) | 2018-05-07 | 2020-07-10 | I-Ten | Electrodes mesoporeuses pour dispositifs electrochimiques en couches minces |
JP2020061304A (ja) * | 2018-10-11 | 2020-04-16 | 古河機械金属株式会社 | 硫化物系無機固体電解質材料用の五硫化二リン組成物 |
CN112242555B (zh) * | 2019-07-16 | 2021-10-22 | 宁德时代新能源科技股份有限公司 | 一种硫化物固态电解质片及其制备方法 |
CN112242556B (zh) * | 2019-07-16 | 2021-09-28 | 宁德时代新能源科技股份有限公司 | 一种固态电解质的制备方法 |
JP7422553B2 (ja) | 2020-02-03 | 2024-01-26 | 太平洋セメント株式会社 | 固体電解質用リチウムランタンジルコニウム酸化物結晶粒子集合体の製造方法 |
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US5217826A (en) * | 1990-07-31 | 1993-06-08 | Matsushita Electric Industrial Co., Ltd. | Lithium-ion conducting solid electrolyte |
US7211532B2 (en) * | 1995-11-15 | 2007-05-01 | Kabushiki Kaisha Ohara | Alkali ion conductive glass-ceramics and electric cells and gas sensors using the same |
JP4745472B2 (ja) * | 1998-07-16 | 2011-08-10 | 株式会社オハラ | リチウムイオン伝導性ガラスセラミックスおよびこれを用いた電池、ガスセンサー |
JP3407733B2 (ja) * | 2000-12-13 | 2003-05-19 | 住友電気工業株式会社 | 無機固体電解質薄膜の形成方法 |
US20060063051A1 (en) * | 2004-09-20 | 2006-03-23 | Jang Bor Z | Metal-air battery with ion-conducting inorganic glass electrolyte |
JP5311169B2 (ja) * | 2005-01-11 | 2013-10-09 | 出光興産株式会社 | リチウムイオン伝導性固体電解質、その製造方法及び該固体電解質を用いたリチウム二次電池用固体電解質並びに該二次電池用固体電解質を用いた全固体リチウム電池 |
CN100583543C (zh) * | 2005-01-11 | 2010-01-20 | 出光兴产株式会社 | 锂离子传导性固体电解质、其制造方法及使用了该固体电解质的锂二次电池用固体电解质以及使用了该二次电池用固体电解质的全固体锂电池 |
US9580320B2 (en) * | 2005-10-13 | 2017-02-28 | Ohara Inc. | Lithium ion conductive solid electrolyte and method for manufacturing the same |
JP5319879B2 (ja) * | 2006-10-31 | 2013-10-16 | 株式会社オハラ | リチウム二次電池およびリチウム二次電池用の電極 |
-
2010
- 2010-04-06 US US12/798,510 patent/US20110171528A1/en not_active Abandoned
-
2011
- 2011-04-04 JP JP2013503741A patent/JP2013528896A/ja not_active Withdrawn
- 2011-04-04 CA CA2795672A patent/CA2795672A1/en not_active Abandoned
- 2011-04-04 WO PCT/US2011/000599 patent/WO2011126558A1/en active Application Filing
- 2011-04-04 BR BR112012025351A patent/BR112012025351A2/pt not_active Application Discontinuation
- 2011-04-04 MX MX2012011524A patent/MX2012011524A/es not_active Application Discontinuation
- 2011-04-04 EP EP11715090A patent/EP2556557A1/en not_active Withdrawn
- 2011-04-04 AU AU2011238903A patent/AU2011238903A1/en not_active Abandoned
- 2011-04-04 EA EA201290999A patent/EA201290999A1/ru unknown
- 2011-04-04 CN CN2011800234691A patent/CN102884667A/zh active Pending
- 2011-04-04 KR KR1020127028947A patent/KR20130059340A/ko not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
AU2011238903A1 (en) | 2012-11-22 |
EA201290999A1 (ru) | 2013-05-30 |
EP2556557A1 (en) | 2013-02-13 |
MX2012011524A (es) | 2013-02-27 |
KR20130059340A (ko) | 2013-06-05 |
WO2011126558A1 (en) | 2011-10-13 |
CA2795672A1 (en) | 2011-10-13 |
CN102884667A (zh) | 2013-01-16 |
JP2013528896A (ja) | 2013-07-11 |
AU2011238903A9 (en) | 2013-01-24 |
US20110171528A1 (en) | 2011-07-14 |
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