BR112012007544A2 - geometria de aplicador de revestimento não ortogonal para revestimentos aperfeiçoados em um substrato - Google Patents

geometria de aplicador de revestimento não ortogonal para revestimentos aperfeiçoados em um substrato

Info

Publication number
BR112012007544A2
BR112012007544A2 BR112012007544A BR112012007544A BR112012007544A2 BR 112012007544 A2 BR112012007544 A2 BR 112012007544A2 BR 112012007544 A BR112012007544 A BR 112012007544A BR 112012007544 A BR112012007544 A BR 112012007544A BR 112012007544 A2 BR112012007544 A2 BR 112012007544A2
Authority
BR
Brazil
Prior art keywords
coating
nozzle
casing
coating applicator
zone
Prior art date
Application number
BR112012007544A
Other languages
English (en)
Inventor
James W Mccamy
John F Sopko
Original Assignee
Ppg Ind Ohio Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ppg Ind Ohio Inc filed Critical Ppg Ind Ohio Inc
Publication of BR112012007544A2 publication Critical patent/BR112012007544A2/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45502—Flow conditions in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45578—Elongated nozzles, tubes with holes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45587—Mechanical means for changing the gas flow
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Surface Treatment Of Glass (AREA)
  • Chemical Vapour Deposition (AREA)
  • Coating Apparatus (AREA)
  • Nozzles (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

geometria de aplicador de revestimento não ortogonal para revestimentos aperfeiçoados em um substrato. um aparelho de revestimento inclui geometria de aplicador de revestimento não ortogonal para aperfeiçoar revestimentos na faixa de vidro, e para aperfeiçoar o rendimento de tais revestimentos. o aparelhos inclui uma primeira disposição para mover a faixa ao longo de uma primeira linha reta imaginária (23) através de uma zona de revestimento fornecida em uma câmara de formação de vidro. o aplicador de revestimento tem um bico de revestimento (80) e uma fenda de exaustão, (83) cada um tem um eixo geométrico longitudinal. o bico de revestimento (80) direciona vapores de revestimento para a zona de revestimento, e a fenda de exaustão (82) remove vapores da zona de revestimento. uma segunda disposição monta o aplicador de revestimento em relação afastada ao percurso com o bico revestimento (80) e a fenda de exaustão (82) voltada para a zona de revestimento. uma segunda linha reta imaginária (94) é normal ao eixo geométrico longitudinal do bico de revestimento (80), e a ,primeira linha imaginária (23) e a segunda linha imaginária (94) formam um ângulo no intervalo maior do que zero graus a 90 graus.
BR112012007544A 2009-10-02 2010-08-16 geometria de aplicador de revestimento não ortogonal para revestimentos aperfeiçoados em um substrato BR112012007544A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/572,317 US8557328B2 (en) 2009-10-02 2009-10-02 Non-orthogonal coater geometry for improved coatings on a substrate
PCT/US2010/045562 WO2011041030A1 (en) 2009-10-02 2010-08-16 Non-orthogonal coater geometry for improved coatings on a substrate

Publications (1)

Publication Number Publication Date
BR112012007544A2 true BR112012007544A2 (pt) 2016-12-06

Family

ID=42797274

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112012007544A BR112012007544A2 (pt) 2009-10-02 2010-08-16 geometria de aplicador de revestimento não ortogonal para revestimentos aperfeiçoados em um substrato

Country Status (12)

Country Link
US (1) US8557328B2 (pt)
EP (1) EP2483440A1 (pt)
JP (1) JP5596158B2 (pt)
KR (1) KR101352919B1 (pt)
CN (1) CN102656293B (pt)
BR (1) BR112012007544A2 (pt)
IN (1) IN2012DN02451A (pt)
MX (1) MX2012003853A (pt)
MY (1) MY154269A (pt)
RU (1) RU2012117731A (pt)
TW (1) TWI468231B (pt)
WO (1) WO2011041030A1 (pt)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9259219B2 (en) 2009-11-09 2016-02-16 Ethicon, Llc Surgical needle coatings and methods
US9221075B2 (en) * 2009-11-09 2015-12-29 Ethicon, Inc. Surgical needle coatings and methods
US8616821B2 (en) * 2010-08-26 2013-12-31 Taiwan Semiconductor Manufacturing Company, Ltd. Integrated apparatus to assure wafer quality and manufacturability
US11354558B2 (en) 2013-01-18 2022-06-07 Amatech Group Limited Contactless smartcards with coupling frames
US9966281B2 (en) 2013-11-15 2018-05-08 Taiwan Semiconductor Manufacturing Company, Ltd. Methods and systems for chemical mechanical polish cleaning
US9523328B2 (en) 2014-02-26 2016-12-20 Ford Global Technologies, Llc System, method and tooling for flexible assembly of cylinder-head valve trains
JP6305314B2 (ja) * 2014-10-29 2018-04-04 東京エレクトロン株式会社 成膜装置およびシャワーヘッド
KR102420015B1 (ko) * 2015-08-28 2022-07-12 삼성전자주식회사 Cs-ald 장치의 샤워헤드
US20170368763A1 (en) * 2016-06-28 2017-12-28 Ford Motor Company Applicator and Method for Applying a Lubricant/Sealer
US10534350B2 (en) 2016-06-28 2020-01-14 Ford Motor Company Flexible pressing verification system
US10745804B2 (en) * 2017-01-31 2020-08-18 Ofs Fitel, Llc Parallel slit torch for making optical fiber preform
US11197666B2 (en) 2017-09-15 2021-12-14 Cilag Gmbh International Surgical coated needles
WO2019239186A1 (en) * 2018-06-13 2019-12-19 Arcelormittal Vacuum deposition facility and method for coating a substrate
WO2019239185A1 (en) 2018-06-13 2019-12-19 Arcelormittal Vacuum deposition facility and method for coating a substrate
WO2019239184A1 (en) 2018-06-13 2019-12-19 Arcelormittal Vacuum deposition facility and method for coating a substrate

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2928627A (en) * 1956-07-10 1960-03-15 Lockheed Aircraft Corp Aircraft propulsion systems
US3282243A (en) * 1965-09-08 1966-11-01 Ethyl Corp Movable means comprising vapor-plating nozzle and exhaust
US3333936A (en) * 1965-10-15 1967-08-01 Libbey Owens Ford Glass Co Cooler compensating heater for temperature control in glass making
GB1282866A (en) * 1968-08-16 1972-07-26 Pilkington Brothers Ltd Improvements in or relating to the production of glass having desired surface characteristics
GB1516032A (en) * 1976-04-13 1978-06-28 Bfg Glassgroup Coating of glass
US4402722A (en) * 1982-02-01 1983-09-06 Ppg Industries, Inc. Cooling arrangement and method for forming float glass
US4584206A (en) * 1984-07-30 1986-04-22 Ppg Industries, Inc. Chemical vapor deposition of a reflective film on the bottom surface of a float glass ribbon
US4900110A (en) * 1984-07-30 1990-02-13 Ppg Industries, Inc. Chemical vapor deposition of a reflective film on the bottom surface of a float glass ribbon
US4928627A (en) 1985-12-23 1990-05-29 Atochem North America, Inc. Apparatus for coating a substrate
US4853257A (en) * 1987-09-30 1989-08-01 Ppg Industries, Inc. Chemical vapor deposition of tin oxide on float glass in the tin bath
US5228949A (en) * 1991-11-07 1993-07-20 Chemcut Corporation Method and apparatus for controlled spray etching
JPH06112132A (ja) * 1992-09-25 1994-04-22 Fuji Electric Co Ltd 有機金属気相成長装置
US5378308A (en) * 1992-11-09 1995-01-03 Bmc Industries, Inc. Etchant distribution apparatus
GB9300400D0 (en) * 1993-01-11 1993-03-03 Glaverbel A device and method for forming a coating by pyrolysis
US5356718A (en) * 1993-02-16 1994-10-18 Ppg Industries, Inc. Coating apparatus, method of coating glass, compounds and compositions for coating glasss and coated glass substrates
US5863337A (en) * 1993-02-16 1999-01-26 Ppg Industries, Inc. Apparatus for coating a moving glass substrate
US5599387A (en) * 1993-02-16 1997-02-04 Ppg Industries, Inc. Compounds and compositions for coating glass with silicon oxide
JPH10280156A (ja) * 1997-04-09 1998-10-20 Sony Corp プラズマｃｖｄ装置
JP4292623B2 (ja) * 1999-04-27 2009-07-08 旭硝子株式会社 酸化スズ膜の成膜方法
TW579664B (en) * 2000-01-11 2004-03-11 Matsushita Electric Ind Co Ltd Apparatus and method for manufacturing printed circuit board
US8182608B2 (en) * 2007-09-26 2012-05-22 Eastman Kodak Company Deposition system for thin film formation
US7572686B2 (en) * 2007-09-26 2009-08-11 Eastman Kodak Company System for thin film deposition utilizing compensating forces

Also Published As

Publication number Publication date
JP5596158B2 (ja) 2014-09-24
US20110081486A1 (en) 2011-04-07
CN102656293A (zh) 2012-09-05
TWI468231B (zh) 2015-01-11
US8557328B2 (en) 2013-10-15
EP2483440A1 (en) 2012-08-08
TW201124210A (en) 2011-07-16
KR20120059598A (ko) 2012-06-08
RU2012117731A (ru) 2013-11-10
JP2013506761A (ja) 2013-02-28
MY154269A (en) 2015-05-29
WO2011041030A1 (en) 2011-04-07
IN2012DN02451A (pt) 2015-08-21
CN102656293B (zh) 2014-12-03
MX2012003853A (es) 2012-05-08
KR101352919B1 (ko) 2014-01-17

Similar Documents

Publication Publication Date Title
BR112012007544A2 (pt) geometria de aplicador de revestimento não ortogonal para revestimentos aperfeiçoados em um substrato
BR112018002556A2 (pt) componente multissegmentado para artigo gerador de aerossol
PH12015500539A1 (en) Plasma source and methods for despositing thin film coatings using plasma enhanced chemical vapor deposition
MX2016000309A (es) Composicion intumescente.
BR112015019528A2 (pt) superfícies poliméricas enxertadas para condensação gota a gota e métodos associados de uso e fabricação
MY174152A (en) Coating and curing apparatus and methods
BR112018011479A2 (pt) artigo gerador de aerossol incluindo um elemento condutor de calor e tratamento de superfície
BR112016028523A2 (pt) artigo para fumar compreendendo uma fonte de calor combustível e suporte e método de fabricação dos mesmos
WO2012027009A3 (en) Gas distribution showerhead with high emissivity surface
BR112014018734A8 (pt) Artigo de fumo, fonte térmica combustível, e processo de redução ou eliminação de aumentos em temperatura de um substrato formador de aerossol de um artigo de fumo
WO2010054112A3 (en) Plasma resistant coatings for plasma chamber components
AR070921A1 (es) Composiciones de recubrimiento curables a baja temperatura y metodos relacionados
BR112013001147A2 (pt) instalação modular para o tratamento de superfícies de artigos
BR112018073559A2 (pt) artigo gerador de aerossol com uma fonte de calor isolada
BR112016006911A2 (pt) método para formar um revestimento liso de superfície decorativa, produto de papel ou papelão, e, uso de um produto de papel ou papelão
WO2011006128A3 (en) Curved microwave plasma line source for coating of three-dimensional substrates
BRPI0508204A (pt) método de remoção de depósitos de uma superfìcie
BR112016021385A2 (pt) Sistema de iluminação e método de sistema de iluminação
EA201290598A1 (ru) Устройство и способ для покрытия подложки
BR112018013510A2 (pt) aparelho de fabricação de aditivo contínuo
BR112017010283A2 (pt) aparelho de penteado a vapor com invólucro melhorado
BR112018010447A8 (pt) processo e planta para obtenção de vidros coloridos
BR112015000291A2 (pt) método para caracterizar um objeto
BR112015032674A2 (pt) material auto-adesivo sem revestimento
MX2015007042A (es) Maquina de recubrimiento.

Legal Events

Date Code Title Description
B08F Application fees: application dismissed [chapter 8.6 patent gazette]
B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]