BR102016020900A2 - método de controle de grau de liberdade em sistemas mecatrônicos e monocromador de duplo cristal - Google Patents

método de controle de grau de liberdade em sistemas mecatrônicos e monocromador de duplo cristal

Info

Publication number
BR102016020900A2
BR102016020900A2 BR102016020900A BR102016020900A BR102016020900A2 BR 102016020900 A2 BR102016020900 A2 BR 102016020900A2 BR 102016020900 A BR102016020900 A BR 102016020900A BR 102016020900 A BR102016020900 A BR 102016020900A BR 102016020900 A2 BR102016020900 A2 BR 102016020900A2
Authority
BR
Brazil
Prior art keywords
degree
crystal monochromator
double crystal
mechatronic systems
control method
Prior art date
Application number
BR102016020900A
Other languages
English (en)
Portuguese (pt)
Inventor
Saveri Silva Marlon
Ramalho Geraldes Renan
Malagodi Caliari Ricardo
Original Assignee
Cnpem Centro Nac De Pesquisa Em Energia E Materiais
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cnpem Centro Nac De Pesquisa Em Energia E Materiais filed Critical Cnpem Centro Nac De Pesquisa Em Energia E Materiais
Priority to BR102016020900A priority Critical patent/BR102016020900A2/pt
Priority to JP2019513887A priority patent/JP7181184B2/ja
Priority to AU2017325120A priority patent/AU2017325120B2/en
Priority to US16/331,925 priority patent/US20190204590A1/en
Priority to PCT/BR2017/050262 priority patent/WO2018045441A1/pt
Priority to CA3036294A priority patent/CA3036294C/en
Priority to CN201780055764.2A priority patent/CN109690379B/zh
Priority to EP17847833.5A priority patent/EP3511756B1/de
Publication of BR102016020900A2 publication Critical patent/BR102016020900A2/pt
Priority to US17/512,458 priority patent/US11747612B2/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/003—Alignment of optical elements
    • G02B7/005—Motorised alignment
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/1822—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors comprising means for aligning the optical axis
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/1822—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors comprising means for aligning the optical axis
    • G02B7/1827—Motorised alignment
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
BR102016020900A 2016-09-09 2016-09-09 método de controle de grau de liberdade em sistemas mecatrônicos e monocromador de duplo cristal BR102016020900A2 (pt)

Priority Applications (9)

Application Number Priority Date Filing Date Title
BR102016020900A BR102016020900A2 (pt) 2016-09-09 2016-09-09 método de controle de grau de liberdade em sistemas mecatrônicos e monocromador de duplo cristal
JP2019513887A JP7181184B2 (ja) 2016-09-09 2017-09-06 シンクロトロンビームラインにおいて、ナノメートル機械的安定性及び分解能を有する光学素子を移動及び位置決めするための機器
AU2017325120A AU2017325120B2 (en) 2016-09-09 2017-09-06 Instrument for moving and positioning of optical elements with nanometric mechanical stability and resolution implemented as a double-crystal monochromator in synchrotron beamlines
US16/331,925 US20190204590A1 (en) 2016-09-09 2017-09-06 Instrument for moving and positioning of optical elements with nanometric mechanical stability and resolution in synchroton light source beamlines
PCT/BR2017/050262 WO2018045441A1 (pt) 2016-09-09 2017-09-06 Instrumento para movimentação e posicionamento de elementos ópticos com resolução e estabilidade mecânica nanométricas em linhas de luz
CA3036294A CA3036294C (en) 2016-09-09 2017-09-06 Instrument for moving and positioning of optical elements with nanometric mechanical stability and resolution in synchroton light source beamlines
CN201780055764.2A CN109690379B (zh) 2016-09-09 2017-09-06 用于在同步加速器光源光束线中移动和定位具有纳米级机械稳定性和分辨率的光学元件的仪器
EP17847833.5A EP3511756B1 (de) 2016-09-09 2017-09-06 Vorrichtung zum bewegen und positionieren von optischen elementen mit nanometrischer mechanischer stabilität und auflösung in lichtleitungen
US17/512,458 US11747612B2 (en) 2016-09-09 2021-10-27 Instrument for moving and positioning of optical elements with nanometric mechanical stabiling and resolution in synchrotron light source beamlines

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
BR102016020900A BR102016020900A2 (pt) 2016-09-09 2016-09-09 método de controle de grau de liberdade em sistemas mecatrônicos e monocromador de duplo cristal

Publications (1)

Publication Number Publication Date
BR102016020900A2 true BR102016020900A2 (pt) 2018-03-20

Family

ID=62001634

Family Applications (1)

Application Number Title Priority Date Filing Date
BR102016020900A BR102016020900A2 (pt) 2016-09-09 2016-09-09 método de controle de grau de liberdade em sistemas mecatrônicos e monocromador de duplo cristal

Country Status (3)

Country Link
EP (1) EP3511756B1 (de)
CN (1) CN109690379B (de)
BR (1) BR102016020900A2 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2028161B1 (en) * 2021-05-06 2022-11-23 Mi Partners Bv Device for moving an optical element

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2590418B2 (ja) * 1992-06-25 1997-03-12 工業技術院長 ブタン液送システム
US5283682A (en) * 1992-10-06 1994-02-01 Ball Corporation Reactionless scanning and positioning system
JPH10521A (ja) * 1996-06-07 1998-01-06 Nikon Corp 支持装置
TW490598B (en) * 1999-11-30 2002-06-11 Asm Lithography Bv Lithographic projection apparatus and method of manufacturing a device using a lithographic projection apparatus
EP1321822A1 (de) * 2001-12-21 2003-06-25 ASML Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
KR20090039664A (ko) * 2006-07-06 2009-04-22 가부시키가이샤 니콘 마이크로 액츄에이터, 광학 유닛 및 노광 장치, 및 디바이스 제조 방법
US8358039B2 (en) * 2008-10-17 2013-01-22 Massachusetts Institute Of Technology High-scan rate positioner for scanned probe microscopy
JP5335372B2 (ja) * 2008-10-30 2013-11-06 キヤノン株式会社 光学要素の支持装置、それを用いた露光装置及びデバイスの製造方法
NL2006773A (en) * 2010-06-23 2011-12-27 Asml Netherlands Bv Lithographic apparatus.
DE102014204523A1 (de) * 2014-03-12 2015-09-17 Carl Zeiss Smt Gmbh Schwingungskompensiertes optisches system, lithographieanlage und verfahren
US10139617B2 (en) * 2016-02-22 2018-11-27 Raytheon Company Reaction compensated steerable platform

Also Published As

Publication number Publication date
EP3511756A4 (de) 2020-04-22
CN109690379A (zh) 2019-04-26
EP3511756B1 (de) 2023-05-24
EP3511756A1 (de) 2019-07-17
CN109690379B (zh) 2021-12-28

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Legal Events

Date Code Title Description
B11K Dismissal acc. art. 17, par 2 of ipl - pending earlier application (priority claim) definitively shelved
B03F Publication of an application: publication of application definitely dismissed [chapter 3.6 patent gazette]