BR0318062A - Método, sistema, e, meio legìvel por computador - Google Patents
Método, sistema, e, meio legìvel por computadorInfo
- Publication number
- BR0318062A BR0318062A BR0318062-0A BR0318062A BR0318062A BR 0318062 A BR0318062 A BR 0318062A BR 0318062 A BR0318062 A BR 0318062A BR 0318062 A BR0318062 A BR 0318062A
- Authority
- BR
- Brazil
- Prior art keywords
- abrasive article
- abrasive
- roughing
- manufacturing process
- machine
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/16—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation taking regard of the load
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B51/00—Arrangements for automatic control of a series of individual steps in grinding a workpiece
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Automatic Control Of Machine Tools (AREA)
Abstract
"MéTODO, SISTEMA, E, MEIO LEGìVEL POR COMPUTADOR". Em geral, são descritas técnicas que permitem um processo abrasivo de fabricação obter um parâmetro de desempenho controlado, por exemplo, uma quantidade de remoção de material, sem exigir o uso de controles de retroalimentação dentro do processo abrasivo de fabricação. Por exemplo, um sistema inclui uma máquina para desbastar uma peça de trabalho com um artigo abrasivo, e um controlador para controlar a aplicação do artigo abrasivo à pega de trabalho pela máquina para obter uma taxa de corte substancialmente constante para o artigo abrasivo. O controlador controla uma ou mais variáveis de processo de acordo com um modelo matemático de circuito aberto que relaciona a taxa de corte do artigo abrasivo a uma força de aplicação do artigo abrasivo para obter remoção controlada de material. Por exemplo, uma taxa de corte constante pode ser obtida ou uma quantidade fixa de material pode ser removida enquanto desbastando uma ou mais peças de trabalho de acordo com o modelo.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/355,659 US7089081B2 (en) | 2003-01-31 | 2003-01-31 | Modeling an abrasive process to achieve controlled material removal |
PCT/US2003/041302 WO2004069477A1 (en) | 2003-01-31 | 2003-12-23 | Modeling an abrasive process to achieve controlled material removal |
Publications (1)
Publication Number | Publication Date |
---|---|
BR0318062A true BR0318062A (pt) | 2005-12-20 |
Family
ID=32770584
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR0318062-0A BR0318062A (pt) | 2003-01-31 | 2003-12-23 | Método, sistema, e, meio legìvel por computador |
Country Status (9)
Country | Link |
---|---|
US (1) | US7089081B2 (pt) |
EP (1) | EP1590128A1 (pt) |
JP (1) | JP2006513869A (pt) |
KR (1) | KR101043466B1 (pt) |
CN (1) | CN100446927C (pt) |
AU (1) | AU2003299932A1 (pt) |
BR (1) | BR0318062A (pt) |
TW (1) | TWI318909B (pt) |
WO (1) | WO2004069477A1 (pt) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10337489B4 (de) * | 2003-08-14 | 2007-04-19 | P & L Gmbh & Co. Kg | Verfahren zur automatischen Werkzeugverschleißkorrektur |
JP4183672B2 (ja) * | 2004-10-01 | 2008-11-19 | 株式会社ノリタケカンパニーリミテド | ロータリ研削方法およびロータリ研削盤の制御装置 |
US7179159B2 (en) * | 2005-05-02 | 2007-02-20 | Applied Materials, Inc. | Materials for chemical mechanical polishing |
US8142261B1 (en) | 2006-11-27 | 2012-03-27 | Chien-Min Sung | Methods for enhancing chemical mechanical polishing pad processes |
US7473162B1 (en) * | 2006-02-06 | 2009-01-06 | Chien-Min Sung | Pad conditioner dresser with varying pressure |
US7749050B2 (en) * | 2006-02-06 | 2010-07-06 | Chien-Min Sung | Pad conditioner dresser |
US20100173567A1 (en) * | 2006-02-06 | 2010-07-08 | Chien-Min Sung | Methods and Devices for Enhancing Chemical Mechanical Polishing Processes |
US20090127231A1 (en) * | 2007-11-08 | 2009-05-21 | Chien-Min Sung | Methods of Forming Superhard Cutters and Superhard Cutters Formed Thereby |
KR101050796B1 (ko) * | 2008-09-17 | 2011-07-20 | 주식회사 포스코 | 시험편 몰드 연마방법 |
CN102581744A (zh) * | 2011-01-12 | 2012-07-18 | 上海运青制版有限公司 | 一种研磨机自动控制方法及装置 |
KR102089383B1 (ko) | 2012-08-02 | 2020-03-16 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 정밀하게 형상화된 특징부를 갖는 연마 물품 및 그의 제조 방법 |
WO2014022453A1 (en) | 2012-08-02 | 2014-02-06 | 3M Innovative Properties Company | Abrasive element precursor with precisely shaped features and method of making thereof |
US10096460B2 (en) * | 2016-08-02 | 2018-10-09 | Semiconductor Components Industries, Llc | Semiconductor wafer and method of wafer thinning using grinding phase and separation phase |
EP3843945A1 (en) * | 2018-08-27 | 2021-07-07 | 3M Innovative Properties Company | A system for monitoring one or more of an abrading tool, a consumable abrasive product and a workpiece |
Family Cites Families (47)
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US3656265A (en) * | 1969-10-14 | 1972-04-18 | Schaffner Mfg Co Inc | Method of making an abrasive belt |
CS206626B1 (en) * | 1978-02-23 | 1981-06-30 | Miroslav Mirsch | Method of adaptive control of necking-down cycle on grinding machine and device for execution of the said cycle |
US4351029A (en) * | 1979-12-05 | 1982-09-21 | Westinghouse Electric Corp. | Tool life monitoring and tracking apparatus |
US4535571A (en) * | 1981-03-30 | 1985-08-20 | Energy-Adaptive Grinding, Inc. | Grinding control methods and apparatus |
JPS57194876A (en) * | 1981-05-21 | 1982-11-30 | Seiko Seiki Co Ltd | Controlling method of grinding machine |
US4590573A (en) * | 1982-09-17 | 1986-05-20 | Robert Hahn | Computer-controlled grinding machine |
DE3518902C2 (de) | 1985-05-25 | 1994-06-09 | Schaudt Maschinenbau Gmbh | Vorrichtung zur Identifikation von Schleifscheiben |
US4900252A (en) * | 1987-07-24 | 1990-02-13 | Siemens Aktiengesellschaft | Recognition system for tools insertable into dental treatment instruments |
US5177901A (en) * | 1988-11-15 | 1993-01-12 | Smith Roderick L | Predictive high wheel speed grinding system |
US5012989A (en) * | 1989-11-24 | 1991-05-07 | Eastman Kodak Company | Apparatus and method for tape velocity and tension control in a capstanless magnetic tape transport |
GB2241911B (en) | 1990-03-14 | 1993-11-17 | Norville Optical Co Ltd | Ophthalmic lens manufacture |
US5152917B1 (en) * | 1991-02-06 | 1998-01-13 | Minnesota Mining & Mfg | Structured abrasive article |
DE4111016C1 (en) | 1991-04-05 | 1992-07-16 | Herminghausen-Werke Gmbh, 6052 Muehlheim, De | Grinding machine setter matching monitored tool condition - uses data store for condition parameter in form of magnetisable or optically writable code carrier directly mountable on regulating or grinding wheel |
US5344688A (en) * | 1992-08-19 | 1994-09-06 | Minnesota Mining And Manufacturing Company | Coated abrasive article and a method of making same |
JPH08505488A (ja) * | 1993-01-12 | 1996-06-11 | ミネソタ・マイニング・アンド・マニュファクチュアリング・カンパニー | データカートリッジのテープ駆動機構におけるトラックのサーボ制御方法 |
CN1055652C (zh) * | 1993-03-12 | 2000-08-23 | 胡强 | 时间控制磨削方法及装置 |
US5441549A (en) * | 1993-04-19 | 1995-08-15 | Minnesota Mining And Manufacturing Company | Abrasive articles comprising a grinding aid dispersed in a polymeric blend binder |
CZ144294A3 (en) | 1993-06-14 | 1994-12-15 | Stiefenhofer Gmbh C | Method of controlling movement of material during its treatment by sterilization and apparatus for making the same |
US5508596A (en) * | 1993-10-07 | 1996-04-16 | Omax Corporation | Motion control with precomputation |
US5514028A (en) * | 1994-01-07 | 1996-05-07 | Ali; Christopher A. | Single sheet sandpaper delivery system and sandpaper sheet therefor |
US5452150A (en) * | 1994-06-27 | 1995-09-19 | Minnesota Mining And Manufacturing Company | Data cartridge with magnetic tape markers |
US5643044A (en) * | 1994-11-01 | 1997-07-01 | Lund; Douglas E. | Automatic chemical and mechanical polishing system for semiconductor wafers |
US5897424A (en) * | 1995-07-10 | 1999-04-27 | The United States Of America As Represented By The Secretary Of Commerce | Renewable polishing lap |
US5609718A (en) * | 1995-09-29 | 1997-03-11 | Micron Technology, Inc. | Method and apparatus for measuring a change in the thickness of polishing pads used in chemical-mechanical planarization of semiconductor wafers |
US5738574A (en) * | 1995-10-27 | 1998-04-14 | Applied Materials, Inc. | Continuous processing system for chemical mechanical polishing |
US5725421A (en) * | 1996-02-27 | 1998-03-10 | Minnesota Mining And Manufacturing Company | Apparatus for rotative abrading applications |
US5833519A (en) * | 1996-08-06 | 1998-11-10 | Micron Technology, Inc. | Method and apparatus for mechanical polishing |
US6475253B2 (en) * | 1996-09-11 | 2002-11-05 | 3M Innovative Properties Company | Abrasive article and method of making |
US5908283A (en) * | 1996-11-26 | 1999-06-01 | United Parcel Service Of Americia, Inc. | Method and apparatus for palletizing packages of random size and weight |
DE19722121A1 (de) | 1997-05-27 | 1998-12-03 | Wendt Gmbh | Vorrichtung zur Kennzeichnung und automatischen Identifikation und Klassifikation von Werkzeugen |
US6146248A (en) | 1997-05-28 | 2000-11-14 | Lam Research Corporation | Method and apparatus for in-situ end-point detection and optimization of a chemical-mechanical polishing process using a linear polisher |
TW374050B (en) | 1997-10-31 | 1999-11-11 | Applied Materials Inc | Method and apparatus for modeling substrate reflectivity during chemical mechanical polishing |
US6123612A (en) * | 1998-04-15 | 2000-09-26 | 3M Innovative Properties Company | Corrosion resistant abrasive article and method of making |
US6171174B1 (en) * | 1998-06-26 | 2001-01-09 | Advanced Micro Devices | System and method for controlling a multi-arm polishing tool |
US6000997A (en) * | 1998-07-10 | 1999-12-14 | Aplex, Inc. | Temperature regulation in a CMP process |
US6206759B1 (en) * | 1998-11-30 | 2001-03-27 | Micron Technology, Inc. | Polishing pads and planarizing machines for mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies, and methods for making and using such pads and machines |
DE19915909C2 (de) | 1998-12-11 | 2003-05-28 | Steinemann Technology Ag St Ga | Verfahren zur Steuerung des Schleifprozesses sowie Rechnersteuerung für Breitschleifmaschine |
US6322427B1 (en) * | 1999-04-30 | 2001-11-27 | Applied Materials, Inc. | Conditioning fixed abrasive articles |
US6264533B1 (en) * | 1999-05-28 | 2001-07-24 | 3M Innovative Properties Company | Abrasive processing apparatus and method employing encoded abrasive product |
TW466153B (en) | 1999-06-22 | 2001-12-01 | Applied Materials Inc | Method and apparatus for measuring a pad profile and closed loop control of a pad conditioning process |
US6293139B1 (en) * | 1999-11-03 | 2001-09-25 | Memc Electronic Materials, Inc. | Method of determining performance characteristics of polishing pads |
JP4387010B2 (ja) | 1999-11-10 | 2009-12-16 | 株式会社ディスコ | 切削装置 |
US6896583B2 (en) * | 2001-02-06 | 2005-05-24 | Agere Systems, Inc. | Method and apparatus for conditioning a polishing pad |
US6612917B2 (en) * | 2001-02-07 | 2003-09-02 | 3M Innovative Properties Company | Abrasive article suitable for modifying a semiconductor wafer |
DE60121292T2 (de) * | 2001-04-02 | 2007-07-05 | Infineon Technologies Ag | Verfahren zur Konditionierung der Oberfläche eines Polierkissens |
US6564116B2 (en) * | 2001-04-06 | 2003-05-13 | Gou-Jen Wang | Method for determining efficiently parameters in chemical-mechanical polishing (CMP) |
US6910947B2 (en) * | 2001-06-19 | 2005-06-28 | Applied Materials, Inc. | Control of chemical mechanical polishing pad conditioner directional velocity to improve pad life |
-
2003
- 2003-01-31 US US10/355,659 patent/US7089081B2/en not_active Expired - Fee Related
- 2003-12-23 WO PCT/US2003/041302 patent/WO2004069477A1/en active Application Filing
- 2003-12-23 CN CNB2003801094326A patent/CN100446927C/zh not_active Expired - Fee Related
- 2003-12-23 KR KR1020057014065A patent/KR101043466B1/ko not_active IP Right Cessation
- 2003-12-23 BR BR0318062-0A patent/BR0318062A/pt not_active IP Right Cessation
- 2003-12-23 AU AU2003299932A patent/AU2003299932A1/en not_active Abandoned
- 2003-12-23 JP JP2004568049A patent/JP2006513869A/ja not_active Ceased
- 2003-12-23 EP EP03800200A patent/EP1590128A1/en not_active Withdrawn
-
2004
- 2004-01-06 TW TW093100248A patent/TWI318909B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR20050095882A (ko) | 2005-10-04 |
JP2006513869A (ja) | 2006-04-27 |
TWI318909B (en) | 2010-01-01 |
EP1590128A1 (en) | 2005-11-02 |
AU2003299932A1 (en) | 2004-08-30 |
CN1744969A (zh) | 2006-03-08 |
CN100446927C (zh) | 2008-12-31 |
US20040153197A1 (en) | 2004-08-05 |
KR101043466B1 (ko) | 2011-06-23 |
US7089081B2 (en) | 2006-08-08 |
WO2004069477A1 (en) | 2004-08-19 |
TW200510121A (en) | 2005-03-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
B08F | Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette] |
Free format text: REFERENTE A 6A ANUIDADE |
|
B08K | Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette] |
Free format text: REFERENTE AO DESPACHO 8.6 PUBLICADO NA RPI 2073 DE 28/09/2010. |