BR0204641A - Estrutura de laser de nitreto iii-v duplo com interferência térmica reduzida - Google Patents
Estrutura de laser de nitreto iii-v duplo com interferência térmica reduzidaInfo
- Publication number
- BR0204641A BR0204641A BR0204641-5A BR0204641A BR0204641A BR 0204641 A BR0204641 A BR 0204641A BR 0204641 A BR0204641 A BR 0204641A BR 0204641 A BR0204641 A BR 0204641A
- Authority
- BR
- Brazil
- Prior art keywords
- thermal interference
- reduced thermal
- iii
- laser frame
- nitride laser
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/4025—Array arrangements, e.g. constituted by discrete laser diodes or laser bar
- H01S5/4031—Edge-emitting structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/34333—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer based on Ga(In)N or Ga(In)P, e.g. blue laser
Abstract
"ESTRUTURA DE LASER DE NITRETO III-V DUPLO COM INTERFERêNCIA TéRMICA REDUZIDA". Uma estrutura de laser de nitreto III-V duplo tem uma camada de dispersão de corrente espessa sobre um substrato de safira e um sulco que se estende para dentro da camada de dispersão de corrente para reduzir a interferência térmica entre os lasers duplos.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/000,898 US6618418B2 (en) | 2001-11-15 | 2001-11-15 | Dual III-V nitride laser structure with reduced thermal cross-talk |
Publications (1)
Publication Number | Publication Date |
---|---|
BR0204641A true BR0204641A (pt) | 2003-09-16 |
Family
ID=21693488
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR0204641-5A BR0204641A (pt) | 2001-11-15 | 2002-11-13 | Estrutura de laser de nitreto iii-v duplo com interferência térmica reduzida |
Country Status (5)
Country | Link |
---|---|
US (1) | US6618418B2 (pt) |
EP (1) | EP1324444B1 (pt) |
JP (1) | JP2003158342A (pt) |
BR (1) | BR0204641A (pt) |
DE (1) | DE60225110T2 (pt) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101188344A (zh) * | 2002-03-08 | 2008-05-28 | 松下电器产业株式会社 | 半导体激光器和其制造方法 |
KR101034055B1 (ko) | 2003-07-18 | 2011-05-12 | 엘지이노텍 주식회사 | 발광 다이오드 및 그 제조방법 |
JP2005109102A (ja) * | 2003-09-30 | 2005-04-21 | Mitsubishi Electric Corp | モノリシック半導体レーザおよびその製造方法 |
WO2005086243A1 (en) * | 2004-03-08 | 2005-09-15 | Showa Denko K.K. | Pn junction type croup iii nitride semiconductor light-emitting device |
US7800097B2 (en) * | 2004-12-13 | 2010-09-21 | Panasonic Corporation | Semiconductor device including independent active layers and method for fabricating the same |
KR100665284B1 (ko) * | 2005-11-07 | 2007-01-09 | 삼성전기주식회사 | 반도체 발광 소자 |
DE102006051745B4 (de) * | 2006-09-28 | 2024-02-08 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | LED-Halbleiterkörper und Verwendung eines LED-Halbleiterkörpers |
FI121902B (fi) * | 2007-06-20 | 2011-05-31 | Optogan Oy | Valoa säteilevä diodi |
DE102007058723A1 (de) * | 2007-09-10 | 2009-03-12 | Osram Opto Semiconductors Gmbh | Lichtemittierende Struktur |
JP4599442B2 (ja) | 2008-08-27 | 2010-12-15 | 株式会社東芝 | 半導体発光素子の製造方法 |
DE102010014667A1 (de) | 2010-04-12 | 2011-10-13 | Osram Opto Semiconductors Gmbh | Leuchtdiodenchip mit Stromaufweitungsschicht |
SE535945C2 (sv) * | 2010-11-19 | 2013-02-26 | Rosenqvist Rail Ab | Handmanövrerbart arrangemang och förfarande för att avbefästa rälsclips |
CN102545058B (zh) * | 2012-01-16 | 2013-10-09 | 苏州纳睿光电有限公司 | 一种氮化镓基激光器外延结构及其制作方法 |
US9306373B2 (en) * | 2013-02-15 | 2016-04-05 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Semiconductor lasers and etched-facet integrated devices having non-uniform trenches |
US9768259B2 (en) * | 2013-07-26 | 2017-09-19 | Cree, Inc. | Controlled ion implantation into silicon carbide using channeling and devices fabricated using controlled ion implantation into silicon carbide using channeling |
CN107810377B (zh) | 2015-06-10 | 2020-06-19 | 康宁股份有限公司 | 耐热串扰的流动反应器 |
WO2016201211A1 (en) | 2015-06-10 | 2016-12-15 | Corning Incorporated | Continuous flow reactor with tunable heat transfer capability |
US20200185883A1 (en) * | 2018-12-11 | 2020-06-11 | Sharp Kabushiki Kaisha | Nitride semiconductor laser device and method for producing nitride semiconductor laser device |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5153889A (en) * | 1989-05-31 | 1992-10-06 | Kabushiki Kaisha Toshiba | Semiconductor light emitting device |
BE1007282A3 (nl) | 1993-07-12 | 1995-05-09 | Philips Electronics Nv | Opto-electronische halfgeleiderinrichting met een array van halfgeleiderdiodelasers en werkwijze ter vervaardiging daarvan. |
US5812576A (en) * | 1996-08-26 | 1998-09-22 | Xerox Corporation | Loss-guided semiconductor lasers |
US6031858A (en) * | 1996-09-09 | 2000-02-29 | Kabushiki Kaisha Toshiba | Semiconductor laser and method of fabricating same |
US6239033B1 (en) * | 1998-05-28 | 2001-05-29 | Sony Corporation | Manufacturing method of semiconductor device |
US5831960A (en) * | 1997-07-17 | 1998-11-03 | Motorola, Inc. | Integrated vertical cavity surface emitting laser pair for high density data storage and method of fabrication |
US5917847A (en) * | 1997-09-26 | 1999-06-29 | Xerox Corporation | Independently addressable semiconductor laser arrays with buried selectively oxidized native oxide apertures |
US6058124A (en) * | 1997-11-25 | 2000-05-02 | Xerox Corporation | Monolithic independently addressable Red/IR side by side laser |
US6389051B1 (en) * | 1999-04-09 | 2002-05-14 | Xerox Corporation | Structure and method for asymmetric waveguide nitride laser diode |
-
2001
- 2001-11-15 US US10/000,898 patent/US6618418B2/en not_active Expired - Lifetime
-
2002
- 2002-11-13 BR BR0204641-5A patent/BR0204641A/pt not_active Application Discontinuation
- 2002-11-14 JP JP2002330348A patent/JP2003158342A/ja active Pending
- 2002-11-15 DE DE60225110T patent/DE60225110T2/de not_active Expired - Lifetime
- 2002-11-15 EP EP02025712A patent/EP1324444B1/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE60225110D1 (de) | 2008-04-03 |
EP1324444B1 (en) | 2008-02-20 |
EP1324444A3 (en) | 2005-04-13 |
US6618418B2 (en) | 2003-09-09 |
DE60225110T2 (de) | 2009-03-05 |
US20030091085A1 (en) | 2003-05-15 |
EP1324444A2 (en) | 2003-07-02 |
JP2003158342A (ja) | 2003-05-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
B07A | Application suspended after technical examination (opinion) [chapter 7.1 patent gazette] | ||
B09B | Patent application refused [chapter 9.2 patent gazette] |
Free format text: INDEFIRO O PEDIDO DE ACORDO COM ART. 8O COMBINADO COM ART. 13 DA LPI |
|
B09B | Patent application refused [chapter 9.2 patent gazette] |
Free format text: MANTIDO O INDEFERIMENTO UMA VEZ QUE NAO FOI APRESENTADO RECURSO DENTRO DO PRAZO LEGAL. |