BE869676A - Materiau photographique photosensible contenant des composes liberant des inhibiteurs de developpement - Google Patents

Materiau photographique photosensible contenant des composes liberant des inhibiteurs de developpement

Info

Publication number
BE869676A
BE869676A BE78189830A BE189830A BE869676A BE 869676 A BE869676 A BE 869676A BE 78189830 A BE78189830 A BE 78189830A BE 189830 A BE189830 A BE 189830A BE 869676 A BE869676 A BE 869676A
Authority
BE
Belgium
Prior art keywords
material containing
containing compounds
photographic material
development inhibitors
photosensitive photographic
Prior art date
Application number
BE78189830A
Other languages
English (en)
French (fr)
Original Assignee
Ciba Geigy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy filed Critical Ciba Geigy
Publication of BE869676A publication Critical patent/BE869676A/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D257/00—Heterocyclic compounds containing rings having four nitrogen atoms as the only ring hetero atoms
    • C07D257/02—Heterocyclic compounds containing rings having four nitrogen atoms as the only ring hetero atoms not condensed with other rings
    • C07D257/04—Five-membered rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D231/00—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings
    • C07D231/02—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings
    • C07D231/10—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
    • C07D231/12—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
    • C07D233/54—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members
    • C07D233/56—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, attached to ring carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D249/00—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
    • C07D249/02—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms not condensed with other rings
    • C07D249/08—1,2,4-Triazoles; Hydrogenated 1,2,4-triazoles
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D249/00—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
    • C07D249/02—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms not condensed with other rings
    • C07D249/08—1,2,4-Triazoles; Hydrogenated 1,2,4-triazoles
    • C07D249/10—1,2,4-Triazoles; Hydrogenated 1,2,4-triazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D249/12—Oxygen or sulfur atoms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C7/00—Multicolour photographic processes or agents therefor; Regeneration of such processing agents; Photosensitive materials for multicolour processes
    • G03C7/30—Colour processes using colour-coupling substances; Materials therefor; Preparing or processing such materials
    • G03C7/305—Substances liberating photographically active agents, e.g. development-inhibiting releasing couplers
    • G03C7/30511—Substances liberating photographically active agents, e.g. development-inhibiting releasing couplers characterised by the releasing group
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/156—Precursor compound
    • Y10S430/158—Development inhibitor releaser, DIR

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Hydrogenated Pyridines (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
BE78189830A 1977-08-12 1978-08-11 Materiau photographique photosensible contenant des composes liberant des inhibiteurs de developpement BE869676A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB3388377 1977-08-12

Publications (1)

Publication Number Publication Date
BE869676A true BE869676A (fr) 1979-02-12

Family

ID=10358692

Family Applications (1)

Application Number Title Priority Date Filing Date
BE78189830A BE869676A (fr) 1977-08-12 1978-08-11 Materiau photographique photosensible contenant des composes liberant des inhibiteurs de developpement

Country Status (6)

Country Link
US (1) US4226934A (xx)
JP (1) JPS5449138A (xx)
BE (1) BE869676A (xx)
CH (1) CH638906A5 (xx)
DE (1) DE2835073A1 (xx)
FR (1) FR2400223A1 (xx)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54118245A (en) * 1978-01-26 1979-09-13 Ciba Geigy Ag Color photographic material
JPS57154234A (en) * 1981-03-19 1982-09-24 Konishiroku Photo Ind Co Ltd Phtotographic sensitive silver halide material
US4410618A (en) * 1982-06-11 1983-10-18 Eastman Kodak Company Blocked photographic reagents
AU591540B2 (en) 1985-12-28 1989-12-07 Konishiroku Photo Industry Co., Ltd. Method of processing light-sensitive silver halide color photographic material
JP2522690B2 (ja) * 1988-06-16 1996-08-07 富士写真フイルム株式会社 ハロゲン化銀カラ―写真感光材料
EP0377181A3 (de) * 1989-01-04 1991-06-12 Agfa-Gevaert AG Farbfotografisches Material

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1547640A1 (de) * 1967-04-10 1969-12-04 Agfa Gevaert Ag Verbessertes photographisches Material
US3632373A (en) * 1968-04-01 1972-01-04 Eastman Kodak Co Method for preparing silver halide layers having substantially uniform image contrast
US3890169A (en) * 1973-03-26 1975-06-17 Bell Telephone Labor Inc Method of forming stable native oxide on gallium arsenide based compound semiconductors by combined drying and annealing
US3856588A (en) * 1972-10-11 1974-12-24 Matsushita Electric Ind Co Ltd Stabilizing insulation for diffused group iii-v devices
JPS5116142B2 (xx) * 1972-12-18 1976-05-21
JPS5149725A (xx) * 1974-10-25 1976-04-30 Konishiroku Photo Ind
US4055443A (en) * 1975-06-19 1977-10-25 Jury Stepanovich Akimov Method for producing semiconductor matrix of light-emitting elements utilizing ion implantation and diffusion heating
US4058413A (en) * 1976-05-13 1977-11-15 The United States Of America As Represented By The Secretary Of The Air Force Ion implantation method for the fabrication of gallium arsenide semiconductor devices utilizing an aluminum nitride protective capping layer
JPS537232A (en) * 1976-07-07 1978-01-23 Fuji Photo Film Co Ltd Silver halide photographic photosensitive material
JPS53105177A (en) * 1977-02-24 1978-09-13 Toshiba Corp Manufacture of semiconductor device

Also Published As

Publication number Publication date
FR2400223B1 (xx) 1980-07-04
FR2400223A1 (fr) 1979-03-09
JPS5449138A (en) 1979-04-18
DE2835073A1 (de) 1979-02-22
US4226934A (en) 1980-10-07
DE2835073C2 (xx) 1989-06-15
CH638906A5 (de) 1983-10-14
JPS619627B2 (xx) 1986-03-25

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Legal Events

Date Code Title Description
RE Patent lapsed

Owner name: CIBA-GEIGY A.G.

Effective date: 19900831