BE831682R - Procede de fabrication de structures en relief - Google Patents

Procede de fabrication de structures en relief

Info

Publication number
BE831682R
BE831682R BE158566A BE158566A BE831682R BE 831682 R BE831682 R BE 831682R BE 158566 A BE158566 A BE 158566A BE 158566 A BE158566 A BE 158566A BE 831682 R BE831682 R BE 831682R
Authority
BE
Belgium
Prior art keywords
relief structures
manufacturing relief
manufacturing
structures
relief
Prior art date
Application number
BE158566A
Other languages
English (en)
French (fr)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19742437422 external-priority patent/DE2437422C3/de
Application filed filed Critical
Application granted granted Critical
Publication of BE831682R publication Critical patent/BE831682R/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
BE158566A 1974-08-02 1975-07-24 Procede de fabrication de structures en relief BE831682R (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19742437422 DE2437422C3 (de) 1974-08-02 Verfahren zur Herstellung von Reliefstrukturen

Publications (1)

Publication Number Publication Date
BE831682R true BE831682R (fr) 1975-11-17

Family

ID=5922340

Family Applications (1)

Application Number Title Priority Date Filing Date
BE158566A BE831682R (fr) 1974-08-02 1975-07-24 Procede de fabrication de structures en relief

Country Status (8)

Country Link
US (1) US4088489A (xx)
JP (1) JPS5541421B2 (xx)
AT (1) AT352406B (xx)
BE (1) BE831682R (xx)
FR (1) FR2288995A2 (xx)
GB (1) GB1512972A (xx)
IT (1) IT1049570B (xx)
NL (1) NL180145C (xx)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3069448D1 (en) * 1979-05-18 1984-11-22 Ciba Geigy Ag Photocrosslinkable copolymers, photosensitive recording material containing them, its utilisation in the production of photographic pictures and process for the production of photographic pictures
DE2933856A1 (de) * 1979-08-21 1981-03-12 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung eines zugfesten lichtwellenleiters
DE3233912A1 (de) * 1982-09-13 1984-03-15 Merck Patent Gmbh, 6100 Darmstadt Fotolacke zur ausbildung von reliefstrukturen aus hochwaermebestaendigen polymeren
US4663268A (en) * 1984-12-28 1987-05-05 Eastman Kodak Company High-temperature resistant photoresists featuring maleimide binders
DE3717933A1 (de) * 1987-05-27 1988-12-08 Hoechst Ag Photopolymerisierbares gemisch, dieses enthaltendes aufzeichnungsmaterial und verfahren zur herstellung von hochwaermebestaendigen reliefstrukturen
DE4217688A1 (de) * 1992-05-29 1993-12-02 Basf Lacke & Farben Durch Einwirkung von Strahlung vernetzendes Gemisch und dessen Verwendung zur Herstellung hochtemperaturbeständiger Reliefstrukturen
US6006667A (en) * 1998-03-12 1999-12-28 Presstek, Inc. Method of lithographic imaging with reduced debris-generated performance degradation and related constructions

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3475176A (en) * 1966-09-06 1969-10-28 Eastman Kodak Co Azide sensitized photosensitive prepolymer compositions
US3650746A (en) * 1969-06-16 1972-03-21 Grace W R & Co Dual image formation on separate supports of photocurable composition
US3858510A (en) * 1971-03-11 1975-01-07 Asahi Chemical Ind Relief structures prepared from photosensitive compositions
US3801638A (en) * 1971-03-12 1974-04-02 Gaf Corp Triacrylyldiethylenetriamine,method of producing the same,and photopolymerization process and system utilizing the same
BE793732A (fr) * 1972-01-10 1973-05-02 Grace W R & Co Composition contenant un polyene et un polythiol
NL177718C (nl) * 1973-02-22 1985-11-01 Siemens Ag Werkwijze ter vervaardiging van reliefstructuren uit warmte-bestendige polymeren.
US3847767A (en) * 1973-03-13 1974-11-12 Grace W R & Co Method of producing a screen printable photocurable solder resist

Also Published As

Publication number Publication date
IT1049570B (it) 1981-02-10
JPS5541421B2 (xx) 1980-10-24
AT352406B (de) 1979-09-25
NL180145C (nl) 1987-01-02
JPS5140921A (xx) 1976-04-06
DE2437422A1 (de) 1976-02-19
NL7509203A (nl) 1976-02-04
US4088489A (en) 1978-05-09
NL180145B (nl) 1986-08-01
ATA450675A (de) 1979-02-15
DE2437422B2 (de) 1976-08-26
GB1512972A (en) 1978-06-01
FR2288995B2 (xx) 1978-11-03
FR2288995A2 (fr) 1976-05-21

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Legal Events

Date Code Title Description
RE20 Patent expired

Owner name: SIEMENS A.G.

Effective date: 19940221