BE823525A - Traitement de galettes de semi-conducteurs - Google Patents

Traitement de galettes de semi-conducteurs

Info

Publication number
BE823525A
BE823525A BE151653A BE151653A BE823525A BE 823525 A BE823525 A BE 823525A BE 151653 A BE151653 A BE 151653A BE 151653 A BE151653 A BE 151653A BE 823525 A BE823525 A BE 823525A
Authority
BE
Belgium
Prior art keywords
cakes
semiconductor
treatment
semiconductor cakes
Prior art date
Application number
BE151653A
Other languages
English (en)
Inventor
R J Walsh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE823525A publication Critical patent/BE823525A/fr

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67075—Apparatus for fluid treatment for etching for wet etching
    • H01L21/67086—Apparatus for fluid treatment for etching for wet etching with the semiconductor substrates being dipped in baths or vessels
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/08—Apparatus, e.g. for photomechanical printing surfaces

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Weting (AREA)
  • ing And Chemical Polishing (AREA)
BE151653A 1973-12-19 1974-12-18 Traitement de galettes de semi-conducteurs BE823525A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US42638773A 1973-12-19 1973-12-19

Publications (1)

Publication Number Publication Date
BE823525A true BE823525A (fr) 1975-06-18

Family

ID=23690593

Family Applications (1)

Application Number Title Priority Date Filing Date
BE151653A BE823525A (fr) 1973-12-19 1974-12-18 Traitement de galettes de semi-conducteurs

Country Status (5)

Country Link
JP (1) JPS5093775A (fr)
BE (1) BE823525A (fr)
CA (1) CA1027465A (fr)
DE (1) DE2459892A1 (fr)
GB (1) GB1483746A (fr)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2326479A1 (fr) * 1975-10-03 1977-04-29 Radiotechnique Compelec Procede de decapage de plaquettes semi-conductrices, notamment pour cellules solaires et appareillage de mise en oeuvre du procede
JPS5721321Y2 (fr) * 1975-12-26 1982-05-08
JPS5288967U (fr) * 1975-12-26 1977-07-02
JPS5619933Y2 (fr) * 1978-01-10 1981-05-12
JPS5617021A (en) * 1979-07-20 1981-02-18 Fujitsu Ltd Surface treatment of substrate
JPS5729140U (fr) * 1980-07-24 1982-02-16
JPS6327784Y2 (fr) * 1980-09-19 1988-07-27
US4482425A (en) * 1983-06-27 1984-11-13 Psi Star, Inc. Liquid etching reactor and method
US5278104A (en) * 1989-07-25 1994-01-11 Kabushiki Kaisha Toshiba Semiconductor wafer carrier having a dust cover
JPH0770505B2 (ja) * 1989-07-25 1995-07-31 株式会社東芝 半導体装置支持キャリヤ
US5054519A (en) * 1990-12-26 1991-10-08 Imtec Products, Inc. Recirculating chemical bath with inflow and self balancing outflow
KR100232998B1 (ko) * 1996-06-05 1999-12-01 윤종용 식각량 조절수단을 갖는 케미컬 배스 유니트
EP2260507B1 (fr) * 2008-03-31 2012-09-26 MEMC Electronic Materials, Inc. Procédés pour graver le bord d'une tranche de silicium, tranche de silicium, appareil de gravure
EP2359390A1 (fr) * 2008-11-19 2011-08-24 MEMC Electronic Materials, Inc. Procédé et système de décapage du bord d'une tranche de semi-conducteur
CN113793819B (zh) * 2021-09-16 2024-06-18 长江存储科技有限责任公司 化学槽及其温度控制方法
CN115241330B (zh) * 2022-09-19 2022-12-27 英利能源发展(天津)有限公司 一种氢氟酸刻蚀太阳能电池用半导体硅片装置

Also Published As

Publication number Publication date
JPS5093775A (fr) 1975-07-26
GB1483746A (en) 1977-08-24
DE2459892A1 (de) 1975-09-04
CA1027465A (fr) 1978-03-07

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