FR2326479A1 - Procede de decapage de plaquettes semi-conductrices, notamment pour cellules solaires et appareillage de mise en oeuvre du procede - Google Patents

Procede de decapage de plaquettes semi-conductrices, notamment pour cellules solaires et appareillage de mise en oeuvre du procede

Info

Publication number
FR2326479A1
FR2326479A1 FR7530332A FR7530332A FR2326479A1 FR 2326479 A1 FR2326479 A1 FR 2326479A1 FR 7530332 A FR7530332 A FR 7530332A FR 7530332 A FR7530332 A FR 7530332A FR 2326479 A1 FR2326479 A1 FR 2326479A1
Authority
FR
France
Prior art keywords
pickling
implementing
solar cells
semiconductor plates
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7530332A
Other languages
English (en)
Other versions
FR2326479B1 (fr
Inventor
Gerard David
Pierre Leger
Yvon Salles
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Radiotechnique Compelec RTC SA
Original Assignee
Radiotechnique Compelec RTC SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Radiotechnique Compelec RTC SA filed Critical Radiotechnique Compelec RTC SA
Priority to FR7530332A priority Critical patent/FR2326479A1/fr
Priority to DE19762643750 priority patent/DE2643750A1/de
Priority to GB40629/76A priority patent/GB1556069A/en
Priority to JP51116683A priority patent/JPS5256034A/ja
Priority to US05/729,345 priority patent/US4113543A/en
Priority to AU18515/76A priority patent/AU504240B2/en
Publication of FR2326479A1 publication Critical patent/FR2326479A1/fr
Application granted granted Critical
Publication of FR2326479B1 publication Critical patent/FR2326479B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02002—Preparing wafers
    • H01L21/02005—Preparing bulk and homogeneous wafers
    • H01L21/02008—Multistep processes
    • H01L21/0201—Specific process step
    • H01L21/02024—Mirror polishing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1804—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic Table
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/547—Monocrystalline silicon PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electromagnetism (AREA)
  • Weting (AREA)
  • ing And Chemical Polishing (AREA)
  • Photovoltaic Devices (AREA)
FR7530332A 1975-10-03 1975-10-03 Procede de decapage de plaquettes semi-conductrices, notamment pour cellules solaires et appareillage de mise en oeuvre du procede Granted FR2326479A1 (fr)

Priority Applications (6)

Application Number Priority Date Filing Date Title
FR7530332A FR2326479A1 (fr) 1975-10-03 1975-10-03 Procede de decapage de plaquettes semi-conductrices, notamment pour cellules solaires et appareillage de mise en oeuvre du procede
DE19762643750 DE2643750A1 (de) 1975-10-03 1976-09-29 Verfahren zum aetzen von halbleiterscheiben, insbesondere fuer sonnenzellen, und vorrichtung zum durchfuehren dieses verfahrens
GB40629/76A GB1556069A (en) 1975-10-03 1976-09-30 Method and apparatus for etching semiconductor plates
JP51116683A JPS5256034A (en) 1975-10-03 1976-09-30 Mechanical and chemical etching method and apparatus therefor
US05/729,345 US4113543A (en) 1975-10-03 1976-10-04 Apparatus for etching the edges of semiconductor plates
AU18515/76A AU504240B2 (en) 1975-10-03 1976-10-08 Mechanical etching ofthe edges of semiconductor plates

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7530332A FR2326479A1 (fr) 1975-10-03 1975-10-03 Procede de decapage de plaquettes semi-conductrices, notamment pour cellules solaires et appareillage de mise en oeuvre du procede

Publications (2)

Publication Number Publication Date
FR2326479A1 true FR2326479A1 (fr) 1977-04-29
FR2326479B1 FR2326479B1 (fr) 1979-04-06

Family

ID=9160796

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7530332A Granted FR2326479A1 (fr) 1975-10-03 1975-10-03 Procede de decapage de plaquettes semi-conductrices, notamment pour cellules solaires et appareillage de mise en oeuvre du procede

Country Status (6)

Country Link
US (1) US4113543A (fr)
JP (1) JPS5256034A (fr)
AU (1) AU504240B2 (fr)
DE (1) DE2643750A1 (fr)
FR (1) FR2326479A1 (fr)
GB (1) GB1556069A (fr)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53139481A (en) * 1977-05-12 1978-12-05 Hamamatsu Tv Co Ltd Method of producing solar battery
US4158591A (en) * 1978-04-24 1979-06-19 Atlantic Richfield Company Solar cell manufacture
JPS5928036Y2 (ja) * 1980-07-15 1984-08-14 信越化学工業株式会社 化学エツチング処理装置
JPS5729140U (fr) * 1980-07-24 1982-02-16
US5944588A (en) * 1998-06-25 1999-08-31 International Business Machines Corporation Chemical mechanical polisher
JP4509501B2 (ja) * 2003-07-31 2010-07-21 Ｓｕｍｃｏ Ｔｅｃｈｘｉｖ株式会社 円板状部材のエッチング方法及び装置
KR100604051B1 (ko) * 2004-06-30 2006-07-24 동부일렉트로닉스 주식회사 게이트 산화막의 전세정방법
KR100644054B1 (ko) * 2004-12-29 2006-11-10 동부일렉트로닉스 주식회사 세정 장치 및 게이트 산화막의 전세정 방법
JP5478604B2 (ja) * 2008-03-31 2014-04-23 エムイーエムシー・エレクトロニック・マテリアルズ・インコーポレイテッド シリコンウェハの端部をエッチングするための方法
KR20110099108A (ko) * 2008-11-19 2011-09-06 엠이엠씨 일렉트로닉 머티리얼즈, 인크. 반도체 웨이퍼의 에지를 스트리핑하기 위한 방법 및 시스템
US20120175343A1 (en) 2011-01-12 2012-07-12 Siltronic Corporation Apparatus and method for etching a wafer edge

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1146723B (de) * 1959-03-31 1963-04-04 Ind Gravure Company AEtzvorrichtung fuer Druckzylinder oder gewoelbte Platten
DE1190291B (de) * 1960-12-03 1965-04-01 Siemens Ag Vorrichtung zur AEtzung von runden Halbleiterscheiben
GB1017336A (en) * 1962-03-16 1966-01-19 Ass Elect Ind Improvements in and relating to semi-conductor devices
US3964957A (en) * 1973-12-19 1976-06-22 Monsanto Company Apparatus for processing semiconductor wafers
GB1483746A (en) * 1973-12-19 1977-08-24 Monsanto Co Processing of wafers
US3951728A (en) * 1974-07-30 1976-04-20 Hitachi, Ltd. Method of treating semiconductor wafers

Also Published As

Publication number Publication date
US4113543A (en) 1978-09-12
DE2643750A1 (de) 1977-04-14
AU1851576A (en) 1978-04-13
DE2643750C2 (fr) 1989-11-23
AU504240B2 (en) 1979-10-04
FR2326479B1 (fr) 1979-04-06
GB1556069A (en) 1979-11-21
JPS5256034A (en) 1977-05-09

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Legal Events

Date Code Title Description
CA Change of address
CD Change of name or company name
ST Notification of lapse