BE800708A - Nouvelle reserve photographique - Google Patents

Nouvelle reserve photographique

Info

Publication number
BE800708A
BE800708A BE132093A BE132093A BE800708A BE 800708 A BE800708 A BE 800708A BE 132093 A BE132093 A BE 132093A BE 132093 A BE132093 A BE 132093A BE 800708 A BE800708 A BE 800708A
Authority
BE
Belgium
Prior art keywords
new photographic
reserve
photographic reserve
new
photographic
Prior art date
Application number
BE132093A
Other languages
English (en)
French (fr)
Inventor
C W Christensen
C M Isaacson
Original Assignee
Shipley Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shipley Co filed Critical Shipley Co
Publication of BE800708A publication Critical patent/BE800708A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
BE132093A 1972-06-12 1973-06-08 Nouvelle reserve photographique BE800708A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US26198272A 1972-06-12 1972-06-12

Publications (1)

Publication Number Publication Date
BE800708A true BE800708A (fr) 1973-10-01

Family

ID=22995688

Family Applications (1)

Application Number Title Priority Date Filing Date
BE132093A BE800708A (fr) 1972-06-12 1973-06-08 Nouvelle reserve photographique

Country Status (6)

Country Link
JP (1) JPS5114042B2 (de)
BE (1) BE800708A (de)
DE (1) DE2329208A1 (de)
FR (1) FR2188193A1 (de)
GB (1) GB1440244A (de)
NL (1) NL7307936A (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2403054C2 (de) * 1972-07-27 1983-01-13 Hoechst Ag, 6000 Frankfurt Verfahren zur Herstellung eines lichtempfindlichen Aufzeichnungsmaterials
JPS56122031A (en) * 1980-03-01 1981-09-25 Japan Synthetic Rubber Co Ltd Positive type photosensitive resin composition
JPS57173941A (en) * 1981-04-21 1982-10-26 Oki Electric Ind Co Ltd Formation of positive type photo resist pattern
JP2593305B2 (ja) * 1987-02-02 1997-03-26 日本ペイント株式会社 ポジ型感光性樹脂組成物
JP2594088B2 (ja) * 1987-02-02 1997-03-26 日本ペイント株式会社 ポジ型感光性樹脂組成物ならびにその製法
EP0704718B1 (de) * 1989-12-01 2002-03-20 Tosoh Corporation Positiv arbeitende lichtempfindliche Zusammensetzungen zur Herstellung von Linsen
EP1143298A1 (de) * 1999-10-07 2001-10-10 Clariant International Ltd. Lichtempfindliche zusammensetzung
JP4213366B2 (ja) * 2001-06-12 2009-01-21 Ａｚエレクトロニックマテリアルズ株式会社 厚膜レジストパターンの形成方法

Also Published As

Publication number Publication date
GB1440244A (en) 1976-06-23
NL7307936A (de) 1973-12-14
JPS5114042B2 (de) 1976-05-06
FR2188193A1 (de) 1974-01-18
DE2329208A1 (de) 1974-01-03
JPS4957055A (de) 1974-06-03

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