BE797059A - Reserve sensible aux electrons et destinee a la realisation de circuits integres - Google Patents

Reserve sensible aux electrons et destinee a la realisation de circuits integres

Info

Publication number
BE797059A
BE797059A BE129027A BE129027A BE797059A BE 797059 A BE797059 A BE 797059A BE 129027 A BE129027 A BE 129027A BE 129027 A BE129027 A BE 129027A BE 797059 A BE797059 A BE 797059A
Authority
BE
Belgium
Prior art keywords
reserve
electrons
realization
sensitive
intended
Prior art date
Application number
BE129027A
Other languages
English (en)
French (fr)
Inventor
J L Bartelt
E D Feit
Original Assignee
Western Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co filed Critical Western Electric Co
Publication of BE797059A publication Critical patent/BE797059A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/143—Electron beam

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • ing And Chemical Polishing (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
BE129027A 1972-03-22 1973-03-20 Reserve sensible aux electrons et destinee a la realisation de circuits integres BE797059A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US23704872A 1972-03-22 1972-03-22

Publications (1)

Publication Number Publication Date
BE797059A true BE797059A (fr) 1973-07-16

Family

ID=22892131

Family Applications (1)

Application Number Title Priority Date Filing Date
BE129027A BE797059A (fr) 1972-03-22 1973-03-20 Reserve sensible aux electrons et destinee a la realisation de circuits integres

Country Status (6)

Country Link
US (1) US3770433A (en, 2012)
JP (1) JPS498176A (en, 2012)
BE (1) BE797059A (en, 2012)
DE (1) DE2313467A1 (en, 2012)
FR (1) FR2176750A1 (en, 2012)
NL (1) NL7303808A (en, 2012)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4012536A (en) * 1972-12-14 1977-03-15 Rca Corporation Electron beam recording medium comprising 1-methylvinyl methyl ketone
US4018937A (en) * 1972-12-14 1977-04-19 Rca Corporation Electron beam recording comprising polymer of 1-methylvinyl methyl ketone
US3847767A (en) * 1973-03-13 1974-11-12 Grace W R & Co Method of producing a screen printable photocurable solder resist
CA1032392A (en) * 1973-10-23 1978-06-06 Eugene D. Feit High energy radiation curable resist and preparatory process
US4078098A (en) * 1974-05-28 1978-03-07 International Business Machines Corporation High energy radiation exposed positive resist mask process
US3961101A (en) * 1974-09-16 1976-06-01 Rca Corporation Process for improved development of electron-beam-sensitive resist films
US4011351A (en) * 1975-01-29 1977-03-08 International Business Machines Corporation Preparation of resist image with methacrylate polymers
AU3870478A (en) * 1977-08-09 1980-02-14 Somar Mfg High energy radiation cruable resist material
JPH0536782B2 (en, 2012) * 1979-05-31 1993-05-31 Ei Teii Ando Teii Tekunorojiizu Inc
US4383026A (en) * 1979-05-31 1983-05-10 Bell Telephone Laboratories, Incorporated Accelerated particle lithographic processing and articles so produced
JPS56158747U (en, 2012) * 1980-04-28 1981-11-26
CA1164261A (en) * 1981-04-21 1984-03-27 Tsukasa Tada PROCESS FOR FORMING RESIST PATTERNS BY DEVELOPING A POLYMER CONTAINING TRIFLUOROETHYL-.alpha.- CHLOROCRYLATE UNITS WITH SPECIFIC KETONE COMPOUNDS
US4389482A (en) * 1981-12-14 1983-06-21 International Business Machines Corporation Process for forming photoresists with strong resistance to reactive ion etching and high sensitivity to mid- and deep UV-light
DE3879186D1 (de) * 1988-04-19 1993-04-15 Ibm Verfahren zur herstellung von integrierten halbleiterstrukturen welche feldeffekttransistoren mit kanallaengen im submikrometerbereich enthalten.
CA2377081A1 (en) 2002-03-15 2003-09-15 Quantiscript Inc. Method of producing an etch-resistant polymer structure using electron beam lithography
US6989227B2 (en) * 2002-06-07 2006-01-24 Applied Materials Inc. E-beam curable resist and process for e-beam curing the resist

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2747103A (en) * 1951-03-28 1956-05-22 Polaroid Corp Radiation detection devices
NL101499C (en, 2012) * 1951-08-20
US3418295A (en) * 1965-04-27 1968-12-24 Du Pont Polymers and their preparation
US3357831A (en) * 1965-06-21 1967-12-12 Harris Intertype Corp Photopolymer
US3529960A (en) * 1967-01-24 1970-09-22 Hilbert Sloan Methods of treating resist coatings
US3594243A (en) * 1967-02-07 1971-07-20 Gen Aniline & Film Corp Formation of polymeric resists
US3575925A (en) * 1968-06-17 1971-04-20 Nat Starch Chem Corp Photosensitive coating systems
US3469982A (en) * 1968-09-11 1969-09-30 Jack Richard Celeste Process for making photoresists
US3702812A (en) * 1971-12-23 1972-11-14 Scm Corp Photopolymerization catalyst comprising ferrocene and an active halogen-containing compound

Also Published As

Publication number Publication date
US3770433A (en) 1973-11-06
DE2313467A1 (de) 1973-09-27
NL7303808A (en, 2012) 1973-09-25
JPS498176A (en, 2012) 1974-01-24
FR2176750A1 (en, 2012) 1973-11-02

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