FR2176750A1 - - Google Patents

Info

Publication number
FR2176750A1
FR2176750A1 FR7309180A FR7309180A FR2176750A1 FR 2176750 A1 FR2176750 A1 FR 2176750A1 FR 7309180 A FR7309180 A FR 7309180A FR 7309180 A FR7309180 A FR 7309180A FR 2176750 A1 FR2176750 A1 FR 2176750A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR7309180A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Publication of FR2176750A1 publication Critical patent/FR2176750A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/143—Electron beam

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • ing And Chemical Polishing (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
FR7309180A 1972-03-22 1973-03-14 Withdrawn FR2176750A1 (en, 2012)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US23704872A 1972-03-22 1972-03-22

Publications (1)

Publication Number Publication Date
FR2176750A1 true FR2176750A1 (en, 2012) 1973-11-02

Family

ID=22892131

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7309180A Withdrawn FR2176750A1 (en, 2012) 1972-03-22 1973-03-14

Country Status (6)

Country Link
US (1) US3770433A (en, 2012)
JP (1) JPS498176A (en, 2012)
BE (1) BE797059A (en, 2012)
DE (1) DE2313467A1 (en, 2012)
FR (1) FR2176750A1 (en, 2012)
NL (1) NL7303808A (en, 2012)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4012536A (en) * 1972-12-14 1977-03-15 Rca Corporation Electron beam recording medium comprising 1-methylvinyl methyl ketone
US4018937A (en) * 1972-12-14 1977-04-19 Rca Corporation Electron beam recording comprising polymer of 1-methylvinyl methyl ketone
US3847767A (en) * 1973-03-13 1974-11-12 Grace W R & Co Method of producing a screen printable photocurable solder resist
CA1032392A (en) * 1973-10-23 1978-06-06 Eugene D. Feit High energy radiation curable resist and preparatory process
US4078098A (en) * 1974-05-28 1978-03-07 International Business Machines Corporation High energy radiation exposed positive resist mask process
US3961101A (en) * 1974-09-16 1976-06-01 Rca Corporation Process for improved development of electron-beam-sensitive resist films
US4011351A (en) * 1975-01-29 1977-03-08 International Business Machines Corporation Preparation of resist image with methacrylate polymers
AU3870478A (en) * 1977-08-09 1980-02-14 Somar Mfg High energy radiation cruable resist material
JPH0536782B2 (en, 2012) * 1979-05-31 1993-05-31 Ei Teii Ando Teii Tekunorojiizu Inc
US4383026A (en) * 1979-05-31 1983-05-10 Bell Telephone Laboratories, Incorporated Accelerated particle lithographic processing and articles so produced
JPS56158747U (en, 2012) * 1980-04-28 1981-11-26
CA1164261A (en) * 1981-04-21 1984-03-27 Tsukasa Tada PROCESS FOR FORMING RESIST PATTERNS BY DEVELOPING A POLYMER CONTAINING TRIFLUOROETHYL-.alpha.- CHLOROCRYLATE UNITS WITH SPECIFIC KETONE COMPOUNDS
US4389482A (en) * 1981-12-14 1983-06-21 International Business Machines Corporation Process for forming photoresists with strong resistance to reactive ion etching and high sensitivity to mid- and deep UV-light
DE3879186D1 (de) * 1988-04-19 1993-04-15 Ibm Verfahren zur herstellung von integrierten halbleiterstrukturen welche feldeffekttransistoren mit kanallaengen im submikrometerbereich enthalten.
CA2377081A1 (en) 2002-03-15 2003-09-15 Quantiscript Inc. Method of producing an etch-resistant polymer structure using electron beam lithography
US6989227B2 (en) * 2002-06-07 2006-01-24 Applied Materials Inc. E-beam curable resist and process for e-beam curing the resist

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2747103A (en) * 1951-03-28 1956-05-22 Polaroid Corp Radiation detection devices
NL101499C (en, 2012) * 1951-08-20
US3418295A (en) * 1965-04-27 1968-12-24 Du Pont Polymers and their preparation
US3357831A (en) * 1965-06-21 1967-12-12 Harris Intertype Corp Photopolymer
US3529960A (en) * 1967-01-24 1970-09-22 Hilbert Sloan Methods of treating resist coatings
US3594243A (en) * 1967-02-07 1971-07-20 Gen Aniline & Film Corp Formation of polymeric resists
US3575925A (en) * 1968-06-17 1971-04-20 Nat Starch Chem Corp Photosensitive coating systems
US3469982A (en) * 1968-09-11 1969-09-30 Jack Richard Celeste Process for making photoresists
US3702812A (en) * 1971-12-23 1972-11-14 Scm Corp Photopolymerization catalyst comprising ferrocene and an active halogen-containing compound

Also Published As

Publication number Publication date
US3770433A (en) 1973-11-06
DE2313467A1 (de) 1973-09-27
NL7303808A (en, 2012) 1973-09-25
JPS498176A (en, 2012) 1974-01-24
BE797059A (fr) 1973-07-16

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Legal Events

Date Code Title Description
ST Notification of lapse