BE792589A - Procede d'obtention de structures semiconductrices par implantation d'ions - Google Patents
Procede d'obtention de structures semiconductrices par implantation d'ionsInfo
- Publication number
- BE792589A BE792589A BE792589DA BE792589A BE 792589 A BE792589 A BE 792589A BE 792589D A BE792589D A BE 792589DA BE 792589 A BE792589 A BE 792589A
- Authority
- BE
- Belgium
- Prior art keywords
- implantation
- ions
- semiconductor structures
- obtaining semiconductor
- obtaining
- Prior art date
Links
- 238000002513 implantation Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
- H01L21/26506—Bombardment with radiation with high-energy radiation producing ion implantation in group IV semiconductors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
- H01L21/26586—Bombardment with radiation with high-energy radiation producing ion implantation characterised by the angle between the ion beam and the crystal planes or the main crystal surface
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/7624—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology
- H01L21/76264—SOI together with lateral isolation, e.g. using local oxidation of silicon, or dielectric or polycristalline material refilled trench or air gap isolation regions, e.g. completely isolated semiconductor islands
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/7624—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology
- H01L21/76264—SOI together with lateral isolation, e.g. using local oxidation of silicon, or dielectric or polycristalline material refilled trench or air gap isolation regions, e.g. completely isolated semiconductor islands
- H01L21/76267—Vertical isolation by silicon implanted buried insulating layers, e.g. oxide layers, i.e. SIMOX techniques
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/7624—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology
- H01L21/76264—SOI together with lateral isolation, e.g. using local oxidation of silicon, or dielectric or polycristalline material refilled trench or air gap isolation regions, e.g. completely isolated semiconductor islands
- H01L21/76281—Lateral isolation by selective oxidation of silicon
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/085—Isolated-integrated
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Element Separation (AREA)
- Local Oxidation Of Silicon (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US18689071A | 1971-10-06 | 1971-10-06 |
Publications (1)
Publication Number | Publication Date |
---|---|
BE792589A true BE792589A (fr) | 1973-03-30 |
Family
ID=22686706
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BE792589D BE792589A (fr) | 1971-10-06 | Procede d'obtention de structures semiconductrices par implantation d'ions |
Country Status (8)
Country | Link |
---|---|
US (1) | US3726719A (fr) |
JP (1) | JPS5147566B2 (fr) |
BE (1) | BE792589A (fr) |
CA (1) | CA981372A (fr) |
DE (1) | DE2231891C3 (fr) |
FR (1) | FR2156545B1 (fr) |
GB (1) | GB1376526A (fr) |
IT (1) | IT959917B (fr) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6849918B1 (en) * | 1965-09-28 | 2005-02-01 | Chou H. Li | Miniaturized dielectrically isolated solid state device |
US4946800A (en) * | 1965-09-28 | 1990-08-07 | Li Chou H | Method for making solid-state device utilizing isolation grooves |
US3852119A (en) * | 1972-11-14 | 1974-12-03 | Texas Instruments Inc | Metal-insulator-semiconductor structures having reduced junction capacitance and method of fabrication |
US3855009A (en) * | 1973-09-20 | 1974-12-17 | Texas Instruments Inc | Ion-implantation and conventional epitaxy to produce dielectrically isolated silicon layers |
JPS51128268A (en) * | 1975-04-30 | 1976-11-09 | Sony Corp | Semiconductor unit |
DE2725966A1 (de) * | 1977-06-08 | 1978-12-21 | Nat Res Dev | Verfahren zum wachsen von kuenstlichen diamanten |
JPS5721856B2 (en) * | 1977-11-28 | 1982-05-10 | Nippon Telegraph & Telephone | Semiconductor and its manufacture |
US4177084A (en) * | 1978-06-09 | 1979-12-04 | Hewlett-Packard Company | Method for producing a low defect layer of silicon-on-sapphire wafer |
DE3067750D1 (en) * | 1979-07-23 | 1984-06-14 | Tokyo Shibaura Electric Co | Charge storage type semiconductor device |
US4391651A (en) * | 1981-10-15 | 1983-07-05 | The United States Of America As Represented By The Secretary Of The Navy | Method of forming a hyperabrupt interface in a GaAs substrate |
FR2575601B1 (fr) * | 1984-12-27 | 1987-01-30 | Commissariat Energie Atomique | Procede et dispositif de determination de parametres electriques d'une couche semi-conductrice en fonction de la profondeur |
JP2724702B2 (ja) * | 1985-06-21 | 1998-03-09 | 日本テキサス・インスツルメンツ 株式会社 | 電荷結合型半導体装置の製造方法 |
JPS61294866A (ja) * | 1985-06-21 | 1986-12-25 | Nippon Texas Instr Kk | 電荷結合型半導体装置 |
US5236872A (en) * | 1991-03-21 | 1993-08-17 | U.S. Philips Corp. | Method of manufacturing a semiconductor device having a semiconductor body with a buried silicide layer |
JP2005064033A (ja) * | 2003-08-12 | 2005-03-10 | Fujio Masuoka | 半導体基板へのイオン注入方法 |
-
0
- BE BE792589D patent/BE792589A/fr unknown
-
1971
- 1971-10-06 US US00186890A patent/US3726719A/en not_active Expired - Lifetime
-
1972
- 1972-06-20 CA CA145,126A patent/CA981372A/en not_active Expired
- 1972-06-23 JP JP47062529A patent/JPS5147566B2/ja not_active Expired
- 1972-06-23 IT IT26075/72A patent/IT959917B/it active
- 1972-06-29 DE DE2231891A patent/DE2231891C3/de not_active Expired
- 1972-06-30 FR FR7224820*A patent/FR2156545B1/fr not_active Expired
- 1972-08-01 GB GB3577272A patent/GB1376526A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS5147566B2 (fr) | 1976-12-15 |
DE2231891A1 (de) | 1973-04-12 |
CA981372A (en) | 1976-01-06 |
FR2156545B1 (fr) | 1975-03-07 |
FR2156545A1 (fr) | 1973-06-01 |
IT959917B (it) | 1973-11-10 |
DE2231891C3 (de) | 1978-04-06 |
US3726719A (en) | 1973-04-10 |
DE2231891B2 (de) | 1977-08-04 |
GB1376526A (en) | 1974-12-04 |
JPS4846269A (fr) | 1973-07-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
BE792589A (fr) | Procede d'obtention de structures semiconductrices par implantation d'ions | |
BE808841A (fr) | Procede de preparation d'amines substituees | |
BE795950A (fr) | Procede de preparation d'amidosilanes | |
BE781466A (fr) | Procede de preparation d'hydroxyaldehydes | |
BE785344A (fr) | Procede de preparation d'alcenyl-silanes | |
BE808733A (fr) | Procede de preparation de cyclohexane-diones-1,3 | |
BE791831A (fr) | Procede d'obtention de 3-methylmercaptopropionaldehyde pur | |
RO64269A (fr) | Procede pour la preparation des izoxazole-(5,4-d)-pirymidines | |
BE774202A (fr) | Procede de preparation de la n,n,n',n'-tetraacetyl-ethylene- diamine | |
BE774540A (fr) | Procede de preparation de l'omega laurinolactame | |
BE793231A (fr) | Procede de preparation d'halogenures d'acides | |
BE768303A (fr) | Procede de preparation de 1,1,2,2-tetrahydroperfluoro- alcanols | |
BE790056A (fr) | Procede de preparation de 1, 1'-dianthraquinonyles | |
BE817376A (fr) | Procede d'isolement de la 1 | |
BE777069A (fr) | Procede d'obtention d'hydrogenochlorosilanes | |
BE781275A (fr) | Procede de preparation d'o-aminobenzonitriles | |
BE807087A (fr) | Procede pour la preparation de thiazolines-(3) | |
BE779136R (fr) | Procede de preparation d'acetoxy-1-methyl-3-butene-2-al-4 | |
BE832830A (fr) | Procede de preparation d'hydroxy-3 triazoles-1,2,4, | |
FR2275441A1 (fr) | Procede de preparation d'acetoxybutanal | |
BE794679A (fr) | Procede de preparation de 2,4-bis-(hydroxyphenyl)-butanes | |
BE790055A (fr) | Procede de preparation de 1,1'-dianthraquinonyles | |
BE799999A (fr) | Procede de preparation d'halogenures d'halogenures d'organo-etains, | |
BE807995A (fr) | Procede de preparation de 1-nitro-anthraquinone pratiquement exempte de 1,5-dinitro-anthraquinone | |
BE768572A (fr) | Procede de fabrication de triceto-2,4,5-imidazolidines,n,n'- substituees |