BE759342A - Appareil et methode pour la determination automatique de la resistance d'etalement, la resistivite et la concentration d'impuretes dans des corps semi-conducteurs - Google Patents

Appareil et methode pour la determination automatique de la resistance d'etalement, la resistivite et la concentration d'impuretes dans des corps semi-conducteurs

Info

Publication number
BE759342A
BE759342A BE759342DA BE759342A BE 759342 A BE759342 A BE 759342A BE 759342D A BE759342D A BE 759342DA BE 759342 A BE759342 A BE 759342A
Authority
BE
Belgium
Prior art keywords
resistivity
impurities
concentration
automatic determination
semiconductor bodies
Prior art date
Application number
Other languages
English (en)
Inventor
R G Mazur
Original Assignee
Westinghouse Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication date
Publication of BE759342A publication Critical patent/BE759342A/fr

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28—Testing of electronic circuits, e.g. by signal tracer
    • G01R31/282—Testing of electronic circuits specially adapted for particular applications not provided for elsewhere
    • G01R31/2831—Testing of materials or semi-finished products, e.g. semiconductor wafers or substrates
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
    • G01N27/04—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
    • G01N27/041—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a solid body
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02—General constructional details
    • G01R1/06—Measuring leads; Measuring probes
    • G01R1/067—Measuring probes
    • G01R1/06705—Apparatus for holding or moving single probes

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Measurement Of Resistance Or Impedance (AREA)
BE759342D 1969-11-24 Appareil et methode pour la determination automatique de la resistance d'etalement, la resistivite et la concentration d'impuretes dans des corps semi-conducteurs BE759342A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US87934269A 1969-11-24 1969-11-24

Publications (1)

Publication Number Publication Date
BE759342A true BE759342A (fr) 1971-05-24

Family

ID=25373949

Family Applications (1)

Application Number Title Priority Date Filing Date
BE759342D BE759342A (fr) 1969-11-24 Appareil et methode pour la determination automatique de la resistance d'etalement, la resistivite et la concentration d'impuretes dans des corps semi-conducteurs

Country Status (3)

Country Link
US (1) US3628137A (fr)
JP (1) JPS4927981B1 (fr)
BE (1) BE759342A (fr)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4646009A (en) * 1982-05-18 1987-02-24 Ade Corporation Contacts for conductivity-type sensors
DE3710365A1 (de) * 1987-03-28 1988-10-13 Messerschmitt Boelkow Blohm Verfahren zur reproduzierbaren bildung von materialschichten und/oder behandlung von halbleiter-materialschichten
JPH01283705A (ja) * 1988-05-10 1989-11-15 Endo Shomei:Kk 照明器具の回転駆動ユニット
US5023561A (en) * 1990-05-04 1991-06-11 Solid State Measurements, Inc. Apparatus and method for non-invasive measurement of electrical properties of a dielectric layer in a semiconductor wafer
US5036271A (en) * 1990-05-23 1991-07-30 Solid State Measurements, Inc. Apparatus for characterization of electrical properties of a semiconductor body
JP2729130B2 (ja) * 1992-04-16 1998-03-18 三菱電機株式会社 半導体装置の製造パラメタの設定方法及びその装置
JP3039911B2 (ja) * 1995-06-13 2000-05-08 高砂熱学工業株式会社 基板表面の有機物汚染の評価装置および方法
US5891744A (en) * 1996-01-29 1999-04-06 Micron Technology, Inc. Method of monitoring a process of manufacturing a semiconductor wafer including hemispherical grain polysilicon
US6052653A (en) * 1997-07-11 2000-04-18 Solid State Measurements, Inc. Spreading resistance profiling system
EP1256006B1 (fr) 1999-10-19 2006-07-19 Solid State Measurements, Inc. Mesure electrique non invasive de plaquettes semi-conductrices
US6851096B2 (en) * 2001-08-22 2005-02-01 Solid State Measurements, Inc. Method and apparatus for testing semiconductor wafers
US6940298B2 (en) * 2002-09-30 2005-09-06 Teradyne, Inc. High fidelity electrical probe
JP2006203151A (ja) * 2004-12-24 2006-08-03 Fuji Electric Holdings Co Ltd 半導体素子の濃度評価方法
EP1949089B1 (fr) * 2005-11-14 2013-06-19 Abb Ab Procede et appareil pour estimer une propriete mecanique
KR100793607B1 (ko) * 2006-06-27 2008-01-10 매그나칩 반도체 유한회사 에피텍셜 실리콘 웨이퍼 및 그 제조방법
CN101131371B (zh) * 2007-10-08 2010-06-02 苏州阿特斯阳光电力科技有限公司 一种精炼冶金硅的杂质含量检测分析方法
FR2964459B1 (fr) * 2010-09-02 2012-09-28 Commissariat Energie Atomique Procede de cartographie de la concentration en oxygene
US11841296B2 (en) * 2021-12-02 2023-12-12 Globalfoundries U.S. Inc. Semiconductor substrates for electrical resistivity measurements

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3312893A (en) * 1963-12-12 1967-04-04 Dow Corning Automatic apparatus for measuring resistivity of semiconductors
US3416078A (en) * 1965-07-08 1968-12-10 Motorola Inc Method of determining resistivity of a thin layer
US3487301A (en) * 1968-03-04 1969-12-30 Ibm Measurement of semiconductor resistivity profiles by measuring voltages,calculating apparent resistivities and applying correction factors

Also Published As

Publication number Publication date
JPS4927981B1 (fr) 1974-07-23
US3628137A (en) 1971-12-14

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