BE688703A - - Google Patents

Info

Publication number
BE688703A
BE688703A BE688703DA BE688703A BE 688703 A BE688703 A BE 688703A BE 688703D A BE688703D A BE 688703DA BE 688703 A BE688703 A BE 688703A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE688703A publication Critical patent/BE688703A/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
BE688703D 1965-10-23 1966-10-21 BE688703A (US07223432-20070529-C00017.png)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US502986A US3410774A (en) 1965-10-23 1965-10-23 Method and apparatus for reverse sputtering selected electrically exposed areas of a cathodically biased workpiece

Publications (1)

Publication Number Publication Date
BE688703A true BE688703A (US07223432-20070529-C00017.png) 1967-03-31

Family

ID=24000292

Family Applications (1)

Application Number Title Priority Date Filing Date
BE688703D BE688703A (US07223432-20070529-C00017.png) 1965-10-23 1966-10-21

Country Status (7)

Country Link
US (1) US3410774A (US07223432-20070529-C00017.png)
BE (1) BE688703A (US07223432-20070529-C00017.png)
CH (1) CH447760A (US07223432-20070529-C00017.png)
DE (1) DE1621599C2 (US07223432-20070529-C00017.png)
FR (1) FR1501165A (US07223432-20070529-C00017.png)
GB (1) GB1157989A (US07223432-20070529-C00017.png)
NL (1) NL154560B (US07223432-20070529-C00017.png)

Families Citing this family (51)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3502562A (en) * 1967-04-19 1970-03-24 Corning Glass Works Multiple cathode sputtering fixture
US3507774A (en) * 1967-06-02 1970-04-21 Nat Res Corp Low energy sputtering apparatus for operation below one micron pressure
US3528906A (en) * 1967-06-05 1970-09-15 Texas Instruments Inc Rf sputtering method and system
US3708418A (en) * 1970-03-05 1973-01-02 Rca Corp Apparatus for etching of thin layers of material by ion bombardment
US3676317A (en) * 1970-10-23 1972-07-11 Stromberg Datagraphix Inc Sputter etching process
FR2128140B1 (US07223432-20070529-C00017.png) * 1971-03-05 1976-04-16 Alsthom Cgee
DE2117199C3 (de) * 1971-04-08 1974-08-22 Philips Patentverwaltung Gmbh, 2000 Hamburg Verfahren zur Herstellung geätzter Muster in dünnen Schichten mit definierten Kantenprofilen
US4157465A (en) * 1972-01-10 1979-06-05 Smiths Industries Limited Gas-lubricated bearings
US3897324A (en) * 1973-06-25 1975-07-29 Honeywell Inc Material deposition masking for microcircuit structures
US4012307A (en) * 1975-12-05 1977-03-15 General Dynamics Corporation Method for conditioning drilled holes in multilayer wiring boards
JPS5582781A (en) * 1978-12-18 1980-06-21 Ibm Reactive ion etching lithography
US4277321A (en) * 1979-04-23 1981-07-07 Bell Telephone Laboratories, Incorporated Treating multilayer printed wiring boards
US4340461A (en) * 1980-09-10 1982-07-20 International Business Machines Corp. Modified RIE chamber for uniform silicon etching
US4391034A (en) * 1980-12-22 1983-07-05 Ibm Corporation Thermally compensated shadow mask
US4426274A (en) 1981-06-02 1984-01-17 International Business Machines Corporation Reactive ion etching apparatus with interlaced perforated anode
US4654118A (en) * 1986-03-17 1987-03-31 The United States Of America As Represented By The Secretary Of The Army Selectively etching microstructures in a glow discharge plasma
US4824544A (en) * 1987-10-29 1989-04-25 International Business Machines Corporation Large area cathode lift-off sputter deposition device
US5341980A (en) * 1990-02-19 1994-08-30 Hitachi, Ltd. Method of fabricating electronic circuit device and apparatus for performing the same method
CA2032763C (en) * 1990-12-20 2001-08-21 Mitel Corporation Prevention of via poisoning by glow discharge induced desorption
US5340015A (en) * 1993-03-22 1994-08-23 Westinghouse Electric Corp. Method for applying brazing filler metals
US5415753A (en) * 1993-07-22 1995-05-16 Materials Research Corporation Stationary aperture plate for reactive sputter deposition
US5527438A (en) * 1994-12-16 1996-06-18 Applied Materials, Inc. Cylindrical sputtering shield
JP3523405B2 (ja) 1996-01-26 2004-04-26 株式会社日立製作所 荷電ビーム処理によるパターン形成方法及び荷電ビーム処理装置
US6287977B1 (en) 1998-07-31 2001-09-11 Applied Materials, Inc. Method and apparatus for forming improved metal interconnects
US6193855B1 (en) 1999-10-19 2001-02-27 Applied Materials, Inc. Use of modulated inductive power and bias power to reduce overhang and improve bottom coverage
US6350353B2 (en) 1999-11-24 2002-02-26 Applied Materials, Inc. Alternate steps of IMP and sputtering process to improve sidewall coverage
US6344419B1 (en) 1999-12-03 2002-02-05 Applied Materials, Inc. Pulsed-mode RF bias for sidewall coverage improvement
US6554979B2 (en) 2000-06-05 2003-04-29 Applied Materials, Inc. Method and apparatus for bias deposition in a modulating electric field
US6521897B1 (en) * 2000-11-17 2003-02-18 The Regents Of The University Of California Ion beam collimating grid to reduce added defects
US6746591B2 (en) 2001-10-16 2004-06-08 Applied Materials Inc. ECP gap fill by modulating the voltate on the seed layer to increase copper concentration inside feature
WO2003036703A1 (en) * 2001-10-22 2003-05-01 Unaxis Usa, Inc. Process and apparatus for etching of thin, damage sensitive layers using high frequency pulsed plasma
JP4710774B2 (ja) * 2005-11-09 2011-06-29 株式会社日立製作所 研磨定盤の製造方法
US9779643B2 (en) 2012-02-15 2017-10-03 Microsoft Technology Licensing, Llc Imaging structure emitter configurations
US9578318B2 (en) 2012-03-14 2017-02-21 Microsoft Technology Licensing, Llc Imaging structure emitter calibration
US11068049B2 (en) 2012-03-23 2021-07-20 Microsoft Technology Licensing, Llc Light guide display and field of view
US10191515B2 (en) 2012-03-28 2019-01-29 Microsoft Technology Licensing, Llc Mobile device light guide display
US9558590B2 (en) 2012-03-28 2017-01-31 Microsoft Technology Licensing, Llc Augmented reality light guide display
US9717981B2 (en) 2012-04-05 2017-08-01 Microsoft Technology Licensing, Llc Augmented reality and physical games
US10502876B2 (en) 2012-05-22 2019-12-10 Microsoft Technology Licensing, Llc Waveguide optics focus elements
US10192358B2 (en) 2012-12-20 2019-01-29 Microsoft Technology Licensing, Llc Auto-stereoscopic augmented reality display
US10324733B2 (en) 2014-07-30 2019-06-18 Microsoft Technology Licensing, Llc Shutdown notifications
US20160035539A1 (en) * 2014-07-30 2016-02-04 Lauri SAINIEMI Microfabrication
US10592080B2 (en) 2014-07-31 2020-03-17 Microsoft Technology Licensing, Llc Assisted presentation of application windows
US9787576B2 (en) 2014-07-31 2017-10-10 Microsoft Technology Licensing, Llc Propagating routing awareness for autonomous networks
US10678412B2 (en) 2014-07-31 2020-06-09 Microsoft Technology Licensing, Llc Dynamic joint dividers for application windows
US10254942B2 (en) 2014-07-31 2019-04-09 Microsoft Technology Licensing, Llc Adaptive sizing and positioning of application windows
US9414417B2 (en) 2014-08-07 2016-08-09 Microsoft Technology Licensing, Llc Propagating communication awareness over a cellular network
US9827209B2 (en) 2015-02-09 2017-11-28 Microsoft Technology Licensing, Llc Display system
US10018844B2 (en) 2015-02-09 2018-07-10 Microsoft Technology Licensing, Llc Wearable image display system
US10317677B2 (en) 2015-02-09 2019-06-11 Microsoft Technology Licensing, Llc Display system
US11086216B2 (en) 2015-02-09 2021-08-10 Microsoft Technology Licensing, Llc Generating electronic components

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2702274A (en) * 1951-04-02 1955-02-15 Rca Corp Method of making an electrode screen by cathode sputtering
US3087838A (en) * 1955-10-05 1963-04-30 Hupp Corp Methods of photoelectric cell manufacture
DE1083617B (de) * 1956-07-27 1960-06-15 Gen Motors Corp Verfahren zum Herstellen poroeser Oberflaechen auf chromierten Zylinderbuechsen von Verbrennungsmotoren
GB1054660A (US07223432-20070529-C00017.png) * 1963-09-16
US3361659A (en) * 1967-08-14 1968-01-02 Ibm Process of depositing thin films by cathode sputtering using a controlled grid

Also Published As

Publication number Publication date
CH447760A (de) 1967-11-30
DE1621599C2 (de) 1973-12-06
US3410774A (en) 1968-11-12
NL6613583A (US07223432-20070529-C00017.png) 1967-04-24
FR1501165A (fr) 1967-11-10
DE1621599B1 (de) 1973-05-24
NL154560B (nl) 1977-09-15
GB1157989A (en) 1969-07-09

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