BE683188A - - Google Patents

Info

Publication number
BE683188A
BE683188A BE683188DA BE683188A BE 683188 A BE683188 A BE 683188A BE 683188D A BE683188D A BE 683188DA BE 683188 A BE683188 A BE 683188A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE683188A publication Critical patent/BE683188A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/685—Compositions containing spiro-condensed pyran compounds or derivatives thereof, as photosensitive substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Structure Of Transmissions (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
BE683188D 1965-06-28 1966-06-27 BE683188A ( )

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US46725765A 1965-06-28 1965-06-28

Publications (1)

Publication Number Publication Date
BE683188A true BE683188A ( ) 1966-12-27

Family

ID=23854995

Family Applications (1)

Application Number Title Priority Date Filing Date
BE683188D BE683188A ( ) 1965-06-28 1966-06-27

Country Status (6)

Country Link
JP (1) JPS446413B1 ( )
BE (1) BE683188A ( )
DE (2) DE1550705B2 ( )
GB (1) GB1154716A ( )
NL (1) NL151808B ( )
SE (1) SE347824B ( )

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2211673B1 ( ) * 1972-12-22 1976-04-23 Robillard Jean
DE2740991C3 (de) * 1977-09-12 1982-03-25 Voith Getriebe Kg, 7920 Heidenheim Hydrodynamisches Wendegetriebe
US4225661A (en) * 1978-05-10 1980-09-30 The Richardson Company Photoreactive coating compositions and photomechanical plates produced therewith
US4334003A (en) * 1979-06-01 1982-06-08 Richardson Graphics Company Ultra high speed presensitized lithographic plates
DE3602215A1 (de) * 1986-01-25 1987-07-30 Hoechst Ag Photopolymerisierbares gemisch und dieses enthaltendes photopolymerisierbares aufzeichnungsmaterial
US4863827A (en) * 1986-10-20 1989-09-05 American Hoechst Corporation Postive working multi-level photoresist
DE3834300A1 (de) * 1988-10-08 1990-04-12 Hoechst Ag Strahlungsempfindliches gemisch und hiermit hergestelltes strahlungsempfindliches kopiermaterial
JP4396443B2 (ja) 2004-08-18 2010-01-13 コニカミノルタエムジー株式会社 感光性平版印刷版の製造方法及び使用方法
EP1767988A1 (de) * 2005-03-31 2007-03-28 AgfaPhoto GmbH Sicherheitsmaterial mit reversiblen und irreversiblen photochemischen Funktionskomponenten und Beschichtungsverfahren
CN101316721A (zh) 2005-11-01 2008-12-03 柯尼卡美能达医疗印刷器材株式会社 平版印刷版材料、平版印刷版、平版印刷版的制备方法和平版印刷版的印刷方法
JPWO2008096618A1 (ja) 2007-02-09 2010-05-20 コニカミノルタエムジー株式会社 インクジェットヘッド、インクジェットプリンタ、インクジェット記録方法
JP2010115791A (ja) 2008-11-11 2010-05-27 Konica Minolta Ij Technologies Inc 画像形成装置
WO2012077736A1 (ja) 2010-12-10 2012-06-14 コニカミノルタホールディングス株式会社 インクジェット記録装置
US9243007B2 (en) 2011-03-30 2016-01-26 Asahi Kasei Chemicals Corporation Organopolysiloxane, method for producing the same, and curable resin composition containing the organopolysiloxane
JP5954317B2 (ja) 2011-04-27 2016-07-20 コニカミノルタ株式会社 インクジェット記録装置
CN104144788B (zh) 2012-03-01 2016-06-29 柯尼卡美能达株式会社 喷墨记录方法
EP2845733B1 (en) 2012-05-01 2017-06-21 Konica Minolta, Inc. Image formation device
JP6941280B2 (ja) 2018-06-26 2021-09-29 株式会社オートネットワーク技術研究所 車載用の温度検出回路

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE896757C (de) * 1935-12-31 1953-11-16 Zeiss Ikon Ag Verfahren zur Herstellung von ausloeschbaren Lichtbildern

Also Published As

Publication number Publication date
DE1572207B1 (de) 1971-03-11
NL6608487A ( ) 1966-12-29
GB1154716A (en) 1969-06-11
DE1550705B2 (de) 1975-05-22
NL151808B (nl) 1976-12-15
JPS446413B1 ( ) 1969-03-19
DE1550705A1 (de) 1969-07-17
SE347824B ( ) 1972-08-14

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Legal Events

Date Code Title Description
RE Patent lapsed

Owner name: MINNESOTA MINING AND MFG. CY

Effective date: 19850627