BE634510A - - Google Patents

Info

Publication number
BE634510A
BE634510A BE634510DA BE634510A BE 634510 A BE634510 A BE 634510A BE 634510D A BE634510D A BE 634510DA BE 634510 A BE634510 A BE 634510A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of BE634510A publication Critical patent/BE634510A/xx

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/09Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)
BE634510D 1962-07-05 BE634510A (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US207681A US3150257A (en) 1962-07-05 1962-07-05 Electron beam aperture plate

Publications (1)

Publication Number Publication Date
BE634510A true BE634510A (nl)

Family

ID=22771562

Family Applications (1)

Application Number Title Priority Date Filing Date
BE634510D BE634510A (nl) 1962-07-05

Country Status (8)

Country Link
US (1) US3150257A (nl)
JP (1) JPS4933209B1 (nl)
BE (1) BE634510A (nl)
CH (1) CH413147A (nl)
DE (1) DE1248182B (nl)
FR (1) FR1362285A (nl)
GB (1) GB1057684A (nl)
NL (1) NL294850A (nl)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1299498B (de) * 1964-07-24 1969-07-17 Steigerwald Strahltech Vorrichtung zur UEberwachung des Strahlauftreffbereichs in Korpuskularstrahl-Bearbeitungsgeraeten
DE2326279A1 (de) * 1973-05-23 1974-12-19 Siemens Ag Ionenstrahlschnellschaltung zur erzielung definierter festkoerperdotierungen durch ionenimplantation
FR2321976A1 (fr) * 1975-08-26 1977-03-25 Commissariat Energie Atomique Vanne d'isolement pour machine de soudage par bombardement electronique et machines munies d'une telle vanne
US4445041A (en) * 1981-06-02 1984-04-24 Hewlett-Packard Company Electron beam blanker
JP6500009B2 (ja) * 2013-03-15 2019-04-10 グレン レイン ファミリー リミテッド ライアビリティ リミテッド パートナーシップ 調節可能な質量分析アパーチャ

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2877353A (en) * 1954-07-14 1959-03-10 Gen Electric X-ray microscope
DE1850497U (de) * 1958-05-21 1962-04-26 Akashi Seisakusho Vorrichtung zum reinigen der blende von elektronen-mikroskopen bzw. elektronen-beugungsgeraeten.
US3038993A (en) * 1958-05-21 1962-06-12 Masuda Tatsunosuke Aperture system for electron optical instrument

Also Published As

Publication number Publication date
CH413147A (de) 1966-05-15
JPS4933209B1 (nl) 1974-09-05
US3150257A (en) 1964-09-22
GB1057684A (en) 1967-02-08
DE1248182B (de) 1967-08-24
FR1362285A (fr) 1964-05-29
NL294850A (nl)

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