NL294850A - - Google Patents

Info

Publication number
NL294850A
NL294850A NL294850DA NL294850A NL 294850 A NL294850 A NL 294850A NL 294850D A NL294850D A NL 294850DA NL 294850 A NL294850 A NL 294850A
Authority
NL
Netherlands
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of NL294850A publication Critical patent/NL294850A/xx

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/09Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)
NL294850D 1962-07-05 NL294850A (xx)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US207681A US3150257A (en) 1962-07-05 1962-07-05 Electron beam aperture plate

Publications (1)

Publication Number Publication Date
NL294850A true NL294850A (xx)

Family

ID=22771562

Family Applications (1)

Application Number Title Priority Date Filing Date
NL294850D NL294850A (xx) 1962-07-05

Country Status (8)

Country Link
US (1) US3150257A (xx)
JP (1) JPS4933209B1 (xx)
BE (1) BE634510A (xx)
CH (1) CH413147A (xx)
DE (1) DE1248182B (xx)
FR (1) FR1362285A (xx)
GB (1) GB1057684A (xx)
NL (1) NL294850A (xx)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1299498B (de) * 1964-07-24 1969-07-17 Steigerwald Strahltech Vorrichtung zur UEberwachung des Strahlauftreffbereichs in Korpuskularstrahl-Bearbeitungsgeraeten
DE2326279A1 (de) * 1973-05-23 1974-12-19 Siemens Ag Ionenstrahlschnellschaltung zur erzielung definierter festkoerperdotierungen durch ionenimplantation
FR2321976A1 (fr) * 1975-08-26 1977-03-25 Commissariat Energie Atomique Vanne d'isolement pour machine de soudage par bombardement electronique et machines munies d'une telle vanne
US4445041A (en) * 1981-06-02 1984-04-24 Hewlett-Packard Company Electron beam blanker
JP6500009B2 (ja) * 2013-03-15 2019-04-10 グレン レイン ファミリー リミテッド ライアビリティ リミテッド パートナーシップ 調節可能な質量分析アパーチャ

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2877353A (en) * 1954-07-14 1959-03-10 Gen Electric X-ray microscope
US3038993A (en) * 1958-05-21 1962-06-12 Masuda Tatsunosuke Aperture system for electron optical instrument
DE1850497U (de) * 1958-05-21 1962-04-26 Akashi Seisakusho Vorrichtung zum reinigen der blende von elektronen-mikroskopen bzw. elektronen-beugungsgeraeten.

Also Published As

Publication number Publication date
FR1362285A (fr) 1964-05-29
US3150257A (en) 1964-09-22
CH413147A (de) 1966-05-15
JPS4933209B1 (xx) 1974-09-05
BE634510A (xx)
DE1248182B (de) 1967-08-24
GB1057684A (en) 1967-02-08

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