BE623613A - - Google Patents

Info

Publication number
BE623613A
BE623613A BE623613DA BE623613A BE 623613 A BE623613 A BE 623613A BE 623613D A BE623613D A BE 623613DA BE 623613 A BE623613 A BE 623613A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of BE623613A publication Critical patent/BE623613A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/108—Polyolefin or halogen containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Materials For Photolithography (AREA)
BE623613D 1961-10-16 BE623613A (ko)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US145447A US3241973A (en) 1961-10-16 1961-10-16 Photopolymerizable element and process for preparing same

Publications (1)

Publication Number Publication Date
BE623613A true BE623613A (ko)

Family

ID=22513159

Family Applications (1)

Application Number Title Priority Date Filing Date
BE623613D BE623613A (ko) 1961-10-16

Country Status (4)

Country Link
US (1) US3241973A (ko)
BE (1) BE623613A (ko)
DE (1) DE1447028B2 (ko)
GB (1) GB973955A (ko)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE635432A (ko) * 1962-07-26
NL129237C (ko) * 1965-03-11
US3663222A (en) * 1968-06-06 1972-05-16 Asahi Chemical Ind Process for preparing steric block with liquid photopolymerizable composition
US4323636A (en) * 1971-04-01 1982-04-06 E. I. Du Pont De Nemours And Company Photosensitive block copolymer composition and elements
CA1099435A (en) * 1971-04-01 1981-04-14 Gwendyline Y. Y. T. Chen Photosensitive block copolymer composition and elements
US3918393A (en) * 1971-09-10 1975-11-11 Ppg Industries Inc Method of producing flat (non-glossy) films
BE789951A (fr) * 1971-10-14 1973-04-11 Hoechst Co American Procede pour produire des images au moyen d'une couche photosensible
JPS5837532B2 (ja) * 1973-04-02 1983-08-17 帝人株式会社 カンコウセイジユシヨウシジバン
DE2415728A1 (de) * 1973-04-13 1975-01-02 Teijin Ltd Traegerfuer fluessiges lichtempfindliches hharz
US4124395A (en) * 1973-08-10 1978-11-07 Fuji Photo Film Co., Ltd. Subbing layer on polyester film for light-sensitive material
US4356251A (en) * 1975-06-03 1982-10-26 E. I. Du Pont De Nemours And Company Multilayer photosensitive element with solvent-soluble layer
US4316951A (en) * 1975-06-03 1982-02-23 E. I. Du Pont De Nemours And Company Multilayer photosensitive element with solvent-soluble layer
US4053313A (en) * 1975-06-03 1977-10-11 E. I. Du Pont De Nemours And Company Process for image reproduction using multilayer photosensitive solvent processable elements
US4376158A (en) * 1977-05-09 1983-03-08 Keuffel & Esser Company Color-proofing method
DE2861268D1 (en) 1977-11-29 1982-01-07 Bexford Ltd Photopolymerisable elements and a process for the production of printing plates therefrom
CA1123649A (en) * 1978-06-22 1982-05-18 Norman E. Hughes Printing plates produced using a base layer with polymerization rate greater than that of the printing layer
US4250242A (en) * 1978-10-31 1981-02-10 American Hoechst Corporation Uniform exposure of positive-acting diazo type materials through support
US4423135A (en) * 1981-01-28 1983-12-27 E. I. Du Pont De Nemours & Co. Preparation of photosensitive block copolymer elements
US4582777A (en) * 1983-05-18 1986-04-15 W. R. Grace & Co. Compressible printing plate
US5213949A (en) * 1986-11-12 1993-05-25 Asahi Kasei Kogyo Kabushiki Kaisha Method for selectively curing a liquid photosensitive resin by masking exposure
DE3704694A1 (de) * 1987-02-14 1988-08-25 Basf Ag Verfahren zum beschichten von formzylindern oder formzylinder-huelsen mit einer druchgehenden lichtempfindlichen aufzeichnungsschicht
US5342731A (en) * 1990-11-21 1994-08-30 Polaroid Corporation Laminar thermal imaging medium actuatable in response to intense image-forming radiation utilizing polymeric hardenable adhesive layer that reduces tendency for delamination
US5229247A (en) * 1991-11-27 1993-07-20 Polaroid Corporation Method of preparing a laminar thermal imaging medium capable of converting brief and intense radiation into heat
US5275914A (en) * 1992-07-31 1994-01-04 Polaroid Corporation Laminar thermal imaging medium comprising an image-forming layer and two adhesive layers
US5552259A (en) * 1993-09-23 1996-09-03 Polaroid Corporation Adhesive composition, and imaging medium comprising this adhesive composition

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB574244A (en) * 1958-07-25 1945-12-28 Sparklets Ltd Improvements in or relating to means for producing a spray of atomised liquid
GB864041A (en) * 1944-01-20 1961-03-29 Du Pont Improvements relating to photopolymerisable elements and their production
NL87862C (ko) * 1951-08-20
US2964401A (en) * 1957-02-18 1960-12-13 Du Pont Photopolymerizable elements and processes
GB841454A (en) * 1957-09-16 1960-07-13 Du Pont Improvements in or relating to photopolymerisable elements

Also Published As

Publication number Publication date
DE1447028B2 (de) 1972-03-16
US3241973A (en) 1966-03-22
DE1447028A1 (de) 1970-08-13
GB973955A (en) 1964-11-04

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