BE588325A - - Google Patents

Info

Publication number
BE588325A
BE588325A BE588325DA BE588325A BE 588325 A BE588325 A BE 588325A BE 588325D A BE588325D A BE 588325DA BE 588325 A BE588325 A BE 588325A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of BE588325A publication Critical patent/BE588325A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/56—Organic absorbers, e.g. of photo-resists
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/02—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
    • C08G63/12—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from polycarboxylic acids and polyhydroxy compounds
    • C08G63/52—Polycarboxylic acids or polyhydroxy compounds in which at least one of the two components contains aliphatic unsaturation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/60—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which all the silicon atoms are connected by linkages other than oxygen atoms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing
    • Y10S430/123—Sulfur in heterocyclic ring
BE588325D 1959-03-24 BE588325A (xx)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR790266A FR1238262A (fr) 1959-03-24 1959-03-24 Nouveau procédé de reproduction photographique et produit pour sa mise en oeuvre
FR793076A FR75624E (fr) 1959-03-24 1959-04-24 Nouveau procédé de reproduction photographique et produit pour sa mise en oeuvre
US813871A US3173787A (en) 1959-03-24 1959-05-18 Photosensitive element comprising a hydrophobic support, a hydrophilic layer thereonand a light-sensitive resin overcoat layer and photomechanical processes therewith

Publications (1)

Publication Number Publication Date
BE588325A true BE588325A (xx)

Family

ID=27245245

Family Applications (1)

Application Number Title Priority Date Filing Date
BE588325D BE588325A (xx) 1959-03-24

Country Status (5)

Country Link
US (1) US3173787A (xx)
BE (1) BE588325A (xx)
DE (1) DE1229388B (xx)
FR (2) FR1238262A (xx)
GB (1) GB951928A (xx)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1522361A1 (de) * 1966-03-08 1969-07-24 Agfa Gevaert Ag Sensibilisierung lichtempfindlicher Polymerer
US3528814A (en) * 1966-04-29 1970-09-15 Agfa Gevaert Ag Sensitization of light-sensitive polymers
US3647447A (en) * 1969-03-03 1972-03-07 Eastman Kodak Co Dyed photoresist compositions
US4486526A (en) * 1969-05-29 1984-12-04 Richardson Graphics Company Lithographic plate and photoresist having photosensitive layers of diazo and cinnamoylated phenol-blocked isocyanate polyurethane materials
US4330611A (en) * 1969-05-29 1982-05-18 Richardson Graphics Company Lithographic plate and photoresist having photosensitive layers of diazo and cinnamoylated polyvinyl alcohol materials
US3808004A (en) * 1969-05-29 1974-04-30 Richardson Graphic Co Lithographic plate and photoresist having two photosensitive layers
US4133685A (en) * 1969-05-29 1979-01-09 Richardson Chemical Company Lithographic plate and photoresist having photosensitive layers of diazo and cinnamoylated polyvinyl alcohol materials
US4247615A (en) * 1980-03-06 1981-01-27 Eastman Kodak Company Continuous-tone dyed diazo imaging process
US4374194A (en) * 1980-12-08 1983-02-15 Eastman Kodak Company Dye imbibition photohardenable imaging material and process for forming positive dye images
JPS5858546A (ja) * 1981-10-02 1983-04-07 Kimoto & Co Ltd 製版用感光性マスク材料
EP0169492B1 (de) * 1984-07-25 1991-02-06 Hoechst Japan Kabushiki Kaisha Verfahren und Material zur Herstellung mehrfarbiger Reproduktionen
JP2552550B2 (ja) * 1989-07-24 1996-11-13 富士写真フイルム株式会社 感光性組成物
EP0441638B1 (en) 1990-02-08 1999-10-13 Konica Corporation Light sensitive litho printing plate
US5279917A (en) * 1991-05-09 1994-01-18 Konica Corporation Light-sensitive composition comprising a fluorine copolymer surfactant
US5258263A (en) * 1991-09-10 1993-11-02 Polaroid Corporation Printing plate and methods of making and use same
US5955244A (en) * 1996-08-20 1999-09-21 Quantum Corporation Method for forming photoresist features having reentrant profiles using a basic agent
NL1004757C2 (nl) * 1996-12-12 1998-06-15 Av Flexologic Bv Systeem en werkwijze voor het verschaffen van fotodrukplaten en dergelijke.
US7527108B2 (en) * 2004-08-20 2009-05-05 Tetra Corporation Portable electrocrushing drill
US8789772B2 (en) 2004-08-20 2014-07-29 Sdg, Llc Virtual electrode mineral particle disintegrator
US10060195B2 (en) 2006-06-29 2018-08-28 Sdg Llc Repetitive pulsed electric discharge apparatuses and methods of use
US10407995B2 (en) 2012-07-05 2019-09-10 Sdg Llc Repetitive pulsed electric discharge drills including downhole formation evaluation
CA2962002C (en) 2013-09-23 2021-11-09 Sdg Llc Method and apparatus for isolating and switching lower-voltage pulses from high voltage pulses in electrocrushing and electrohydraulic drills

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2312854A (en) * 1940-07-20 1943-03-02 Toland William Craig Light-sensitive element
FR955267A (xx) * 1943-03-22 1950-01-11
US2568503A (en) * 1949-02-09 1951-09-18 Eastman Kodak Co Cellulose ester lithographic printing process
BE507657A (xx) * 1950-12-06
US2670287A (en) * 1951-01-20 1954-02-23 Eastman Kodak Co Photosensitization of polymeric cinnamic acid esters
US2764085A (en) * 1952-01-10 1956-09-25 Dick Co Ab Masters for planographic printing
NL80290C (xx) * 1952-04-01
US2787543A (en) * 1952-10-09 1957-04-02 Eastman Kodak Co Photographic color reproduction process
US2756143A (en) * 1953-12-24 1956-07-24 Eastman Kodak Co Photographic reproduction process
US2816091A (en) * 1955-05-26 1957-12-10 Eastman Kodak Co Polymeric chalcones and their use as light-sensitive polymers
US2801233A (en) * 1955-07-29 1957-07-30 Eastman Kodak Co Ethylene-vinyl cinnamate copolymers
US2956878A (en) * 1956-11-13 1960-10-18 Eastman Kodak Co Photosensitive polymers and their applications in photography
US2852371A (en) * 1956-11-20 1958-09-16 Eastman Kodak Co Photographic duplicating process
US2983606A (en) * 1958-07-14 1961-05-09 Polaroid Corp Processes and products for forming photographic images in color
US2975053A (en) * 1958-10-06 1961-03-14 Azoplate Corp Reproduction material

Also Published As

Publication number Publication date
FR1238262A (fr) 1960-08-12
FR75624E (fr) 1961-07-21
GB951928A (en) 1964-03-11
DE1229388B (de) 1966-11-24
US3173787A (en) 1965-03-16

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